分子发射光谱法测量微波等离子体气体温度

通过OH自由基A2Σ+→X2Π_r电子带系分子发射光谱测温法,实现了对氩气、氮气、空气三种大气压微波等离子体气体温度的测量。探究了不同微波功率、不同气体流量下气体温度的变化规律,测量了氮气、空气微波等离子体羽流的轴向温度分布。实验结果表明,不同工作条件下微波等离子体核心温度普遍超过2 000 K,空气微波等离子体可超过6 000 K;同样工作条件下三种微波等离子体气体温度满足：T_Ar<T_N2<T_Air;气体温度总体上随微波功率增加而小幅增加,随气体流量下降而小幅降低;氮气与空气等离子体羽流温度沿轴向迅速降低。为验证分子发射光谱测温法的准确性,以热电偶测温作为比对,对温度较低的介质阻挡放电氩气等离子体进行了温度测量,实验表明,分子发射光谱法与热电偶所测结果十分接近。     

Temperature Distributions Across the Plasma Layer of Planar Low Pressure Microwave Plasmas — A Comparative Investigation by Optical Emission Spectroscopy

Nowadays low temperature non-equilibrium plasmas received considerable attention in very different fields of plasma processing. The subject of the present paper is the comparative measurement of neutral gas temperature and optical excitation temperature to analyze the temperature distributions across the plasma layer of H₂ non-equilibrium plasmas (p = 0.2 – 1.5 kPa) with small admixtures of hydrocarbons in a novel planar microwave plasma source (2.45 GHz) used for plasmachemical deposition purposes by means of optical emission spectroscopy. Typical microwave power flux densities into the plasma lie within a range of 2 W cm^?2 to 20 W cm^?2. Results of neutral gas temperature measurements derived from H_α line Doppler profiles are compared with rotational temperatures of H₂ and N₂ molecules. The neutral gas temperature (800–1700 K) corresponds to the rotational temperature of the H₂ molecules (Fulcher band, R 0–0 branch) but shows a more distinct spatial gradient. The rotational temperature of admixtured N₂ molecules (2000–3000 K) is much more higher although Boltzmann distribution was ensured. The spatially resolved measured excitation temperature (1–3 eV) determined with the help of line intensity ratios of admixtured Ar well agrees with Langmuir probe measurements. The reported measurements as a whole demonstrate the feasibility of comparative investigations of different optically determined temperatures for expressive characterization of low pressure microwave plasmas.     

Characteristics of an argon rf plasma: Active discharge and laminar sonic flow region

The electron density, the excitation and the gas temperatures have been obtained from optical spectrometric, microwave interferometric and thermocouple measurements in an argon rf plasma. The investigation was carried out in an active discharge and a channel region characterized by sonic laminar flow. Optical measurements of the excitation temperature were made in the 4000–5000 Å range for discharge pressures of ∼ 63–644 torr and input rf power of 42–60 kW. Excitation temperatures in the discharge ranged between ∼ 7000–10,000 K. Electron densities measured by optical and microwave techniques showed good agreement. Thermocouple measurements in the channel and N₂ rotational spectra from traces of N₂ injected in the argon, as well as gas dynamic considerations, indicated that the gas temperature in the discharge and the channel regions were 2900–4400K and 1900–3300K, respectively. These values were substantially lower than the excitation temperatures corresponding to these regions, indicating that the plasma was in a two-temperature state in both regions. Standard tests for local thermal equilibrium (LTE) showed that the first excited level of argon constituted the bottleneck level.     

The atmospheric-pressure plasma jet: a review and comparison toother plasma sources

Atmospheric-pressure plasmas are used in a variety of materials processes. Traditional sources include transferred arcs, plasma torches, corona discharges, and dielectric barrier discharges. In arcs and torches, the electron and neutral temperatures exceed 3000°C and the densities of charge species range from 10¹⁶-10¹⁹ cm^-3. Due to the high gas temperature, these plasmas are used primarily in metallurgy. Corona and dielectric barrier discharges produce nonequilibrium plasmas with gas temperatures between 50-400°C and densities of charged species typical of weakly ionized gases. However, since these discharges are nonuniform, their use in materials processing is limited. Recently, an atmospheric-pressure plasma jet has been developed, which exhibits many characteristics of a conventional, low-pressure glow discharge. In the jet, the gas temperature ranges from 25-200°C, charged-particle densities are 10 ¹¹-10¹² cm^-3, and reactive species are present in high concentrations, i.e., 10-100 ppm. Since this source may be scaled to treat large areas, it could be used in applications which have been restricted to vacuum. In this paper, the physics and chemistry of the plasma jet and other atmospheric-pressure sources are reviewed     

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设计建立了同轴圆柱介质阻挡放电线状射流装置,并利用其实现了宽度为50mm的大尺度线状射流,并对射流长度随放电参数的变化进行了研究.研究发现,随气压、流量的增加,射流长度呈先增加后达到饱和;随激励电压的增加,射流长度增加.对氮气射流等离子体进行发射光谱诊断,表明氮气等离子体中主要是氮分子和少量氮原子,并利用光谱拟合得出射流的温度范围为290～350K.     

Emission spectroscopy of atmospheric pressure plasmas for bio-medical and environmental applications

The paper demonstrates several ways of use of the UV-vis optical emission spectroscopy of medium resolution for the diagnostics of atmospheric pressure air and nitrogen plasmas relevant to bio-medical and environmental applications. Plasmas generated by DC discharges (streamer corona, transient spark, and glow discharge), AC microdischarges in porous ceramics, and microwave plasma were investigated. Molecular (OH, NO, CN) and atomic (H, O, N) radicals, and other active species, e.g. N₂ (C, B, A), (B), were identified. The composition of the emission spectra gives insight in the ongoing plasma chemistry. Rotational, i.e. gas, and vibrational temperatures were evaluated by fitting experimental with simulated spectra. Streamer corona, transient spark and microdischarges generate cold, strongly non-equilibrium plasmas (300-550 K), glow discharge plasma is hotter, yet non-equilibrium (1900 K), and microwave plasma is very hot and thermal (∼3000-4000 K). Electronic excitation temperature and OH radical concentration were estimated in the glow discharge assuming the chemical equilibrium and Boltzmann distribution (9800 K, 3 × 10¹⁶ cm⁻³). Optical emission also provided the measurement of the active plasma size of the glow discharge, and enabled calculating its electron number density (10¹² cm⁻³).     

悬浮型微波共振探针在电负性容性耦合等离子体中电子密度的测量

本文首先利用悬浮型微波共振探针测量了Ar等离子体的电子密度,并与朗缪尔双探针的测量结果进行了比较,表明了微波共振探针在低密度等离子体测量的可行性.对40.68 MHz单射频容性耦合Ar/SF₆和SF₆/O₂等离子体的测量结果表明:电负性气体SF₆掺入Ar等离子体显著降低了等离子体电子密度,但随着增加SF₆的流量,电子密度表现为缓慢下降;而O₂掺入SF₆等离子体中,电子密度则随着O₂流量的增加表现为持续的下降.另外,40.68 MHz/13.56 MHz双频激发的SF₆/O₂容性耦合离子体的电子密度并不随低频功率的变化而变化.本文对上述的实验现象进行了初步的解释.     

一种新型大气压毛细管介质阻挡放电冷等离子体射流技术

介绍一种结构设计简单、操作运行方便的新型毫米量级大气压冷等离子体射流发生技术.这种射流可以在大气压条件下，利用多种工作气体(如Ar,He,N₂)，通过毛细管介质阻挡放电(DBD)的方式实现.使用频率为33kHz，峰值电压为1—12kV的双向脉冲电源，利用Ar,He,N₂等工作气体，在毛细管内形成了稳定的冷等离子体射流.放电区域的光辐射空间分布利用商用CCD摄像机记录，从中研究放电形态和空间分布，观察到了在DBD区域的流动气体放电和在毛细管出口处形成的等离子体射流 关键词： 冷等离子体射流 毛细管介质阻挡放电 射流射程 射流激发温度     

Nonequilibrium volume plasma chemical processing

A review is presented of plasma chemical processes occurring in the volume part of electrical nonequilibrium discharges. The role of energetic electrons as initiators of chemical reactions in a cold background gas is discussed. Different discharge types of (glow, corona, silent, RF, and microwave discharges) are investigated with respect to their suitability for plasma processing. Emphasis is placed on the requirements of initiating and maintaining the discharge and, at the same time, optimizing plasma parameters for the desired chemical process. Using large-scale industrial ozone production as an example, the detailed process of discharge optimization is described. Other applications of volume plasma processing include other plasma chemical syntheses as well as decomposition processes such as flue gas treatment and hazardous waste disposal. The author only deals with plasmas which are not in equilibrium     

Corona discharge processes

Applications of corona discharge induced plasmas and unipolar ions are reviewed. Corona process applications emphasize one of two aspects of the discharge: the ions produced or the energetic electrons producing the plasma. The ion identities depend on the polarity of the discharge and the characteristics of the gas mixture, specifically on the electron attaching species. The electron energies depend on the gas characteristics and on the method of generating the corona. In general, in an application using ions, the corona induced plasma zone will occupy a small fraction of the total process volume, while a process using the electrons will fill most of the volume with the plasma. Current state-of-the knowledge of ionized environments and the function of corona discharge processes are discussed in detail     

Characterization of an atmospheric pressure plasma jet for surface modification and thin film deposition

In this paper, an experimental study is presented to characterize a commercially available atmospheric pressure plasma jet (APPJ) kINPen which can be used for local surface modification, e.g. changing the wettability as well as for thin film deposition with silicon-organic and metal-organic precursors to enhance scratch resistance or to lower the gas permeability. Characterization of the jet discharge has been carried out by three methods: (i) measurement of the energy influx from the jet plasma to a substrate by a calorimetric probe, (ii) spatial resolved investigation of the plasma beam by optical emission spectroscopy (OES) and (iii) observation of the plasma jet by video imaging. The deposited SiO _x and AlO _x films were analyzed by XPS measurements.     

Online diagnosis of electron excitation temperature in CH<Subscript>4</Subscript>+H<Subscript>2</Subscript> discharge plasma at atmospheric pressure by optical emission spectra

Methane coupling under low temperature plasmas at atmospheric pressure is a green process by use of renewable sources of energy. In this study, CH₄+H₂ discharge plasma was on-line diagnosed by optical emission spectra so as to characterize the discharge system and to do spade work for the optimization of the technical parameters for future commercial production of methane coupling under plasmas. The study was focused on a calculation method for the online diagnosis of the electron excitation temperature in CH₄+H₂ discharge plasma at atmospheric pressure. The diagnostic method is easy, efficient and fairly precise. A serious error in a literature was corrected during the reasoning of its series of equations formerly used to calculate electron temperatures in plasmas. Supported by the National Natural Science Foundation of China (Grant Nos. 29776037 and 10675028) and the Science and Technology Development Foundation of SINOPEC (Grant No. X500005)     

Diagnosis of a low pressure capacitively coupled argon plasma by using a simple collisional-radiative model

This paper proposes a simple collisional-radiative model to characterise capacitively coupled argon plasmas driven by conventional radio frequency in combination with optical emission spectroscopy and Langmuir probe measurements. Two major processes are considered in this model, electron-impact excitation and the spontaneous radiative decay. The diffusion loss term, which is found to be important for the two metastable states (4s[3/2]₂, 4s'[1/2]₀), is also taken into account. Behaviours of representative metastable and radiative states are discussed. Two emission lines (located at 696.5 nm and 750.4 nm) are selected and intensities are measured to obtain populated densities of the corresponding radiative states in the argon plasma. The calculated results agree well with that measured by Langmuir probe, indicating that the current model combined with optical emission spectroscopy is a candidate tool for electron density and temperature measurement in radio frequency capacitively coupled discharges.     

The role of vibrational temperature variations in a pulsed dielectric barrier discharge plasma device

The use of dielectric barrier discharge (DBD) plasmas has become a practical way to carry out surface treatment where precise control of the plasma parameters, such as rotational and vibrational temperatures (T_rot and T_vib), is required. As the T_vib of an atmospheric pressure plasma jet appears to be the most important parameter related to the improvement of surface treatments, in this work, we analysed two methods to increase the values of T_vib in a DBD plasma jet device. One of the methods is to reduce the exit size (ø) of the DBD reactor, which results in an increase in the measured T_vib values, due to an increase in the pressure inside the reactor. The other method is to change the gas flow rate (GFR) used to produce the plasma jets. This leads to a T_vib reduction when the GFR is increased in the case of using helium or nitrogen as the working gas, but the opposite happens (an increase in the T_vib values) when argon is used, with different phenomena causing the variation of T_vib in each situation.     

Behaviour of fully ionized seed plasma excited by microwave

Nonequilibrium plasmas with cesium metal vapor ionization in helium and argon gases at moderate pressures are excited with microwave power. The structures and behaviour of the seeded plasmas are experimentally examined, particularly under the condition of Full seed (cesium atoms) ionization. By cesium seeding, the minimum power sustaining the plasma is reduced markedly, and both a broad plasma observed in pure helium and unsteady filament-like plasmas in pure argon change to the steady and broad plasma locating close to the inner surface of a discharge tube, it is revealed from the electron temperature measurements that the plasma can be in the regime of full seed ionization for suitable microwave powers, where the electron density is kept almost constant. The thickness of the fully ionized seed (FIS) plasma decreases with increasing the mole fraction of cesium vapor, and is almost independent of noble gas pressure. The thickness almost coincides with the skin depth determined from the electrical conductivity almost uniform in the FIS plasma. These facts suggest that the FIS plasma will be easily produced and maintained as long as the microwave power is consumed to the electron heating     

脉冲射频容性耦合氩等离子体的发射探针诊断

利用工作在浮点模式下的发射探针,对500 Hz脉冲调制的27.12 MHz容性耦合氩气等离子体的空间电位和电子温度的时变特性进行了诊断.等离子体空间电位是通过测量强热状态下的发射探针电位获得的,而电子温度则是由发射探针在冷、热状态下的电位差来估算得到.测量结果表明:脉冲开启时,空间电位会快速上升并在300μs内趋于饱和;当脉冲关断后,空间电位经历了快速下降后趋于稳定的过程.电子温度在脉冲开启时存在过冲并趋于稳定的特征;而在脉冲关断期间,电子温度在300μs内则快速下降到0.45 e V后略有上升.无论在脉冲开启或关断期间,空间电位基本上都随功率和气压的变化存在有线性的依赖关系;而放电功率对脉冲开启期间过冲电子温度与稳态电子温度差异的影响较大.针对空间电位和电子温度在各阶段及不同放电条件下的时变特性,给出了相应的解释.     

Energetic Characteristics of Oxygen Plasma

A low-temperature oxygen plasma is studied using the thermocouple, probe and spectral method in the range of 2–8 Torr pressure, 30–100 mA discharge currents, 0, 5, 10 m/s pumping velocity. The gas temperature, concentrations of electrons and oxygen atoms in the 3 p⁵P state, and the longitudinal electric field are measured. Radial distributions of gas temperature and electron concentration are obtained. Ranges of pressures and currents are found in which considerable increases in electric field, discharge voltage, temperatures of gas and electrons are observed at pumping switched on. An estimate of the rate constant of the steplike ionization through the O₂(a¹Δg) state is given. The concentration of atomic oxygen in the ground state and excitation constant of the triplet O(3p⁵P) by electron impact are obtained from the solution of the balance equations and our experimental data.     

Production of Capacitively Coupled Atmospheric Plasma Jet With Multiring Electrodes for the Medical Plasma Tool

An atmospheric capacitively coupled plasma jet has been developed by using multiring-electrode configurations for medical applications. It was found that the discharge conditions for plasma-jet production expanded with the increase of the number of pairs of multiring electrodes. The length of the plasma jet increased with the increase of the injected power and helium-gas flow rate. The temperature of the plasma jet, measured by a thermocouple, decreased with the increase of gas flow rate and was then attained to be around 50 $^{circ}hbox{C}$ at a helium flow rate of 30 L/min. Optical measurements of plasma-jet emission showed various optical emissions from helium atoms, nitrogen atoms, hydroxyl radicals, and metal atoms originating from the electrode material.      

Current analysis of DC negative corona discharge in a wire-cylinder configuration at high ambient temperatures

To study the characteristics of DC negative corona discharge in a wire-cylinder configuration at an ambient temperature range of 350–850 °C, the I–V characteristics and the current composition are analyzed under different conditions. A simple method is proposed to determine the DC corona onset threshold voltage. At high ambient temperatures, in the DC negative corona discharge gap, some electrons are not attached to the electronegative gas molecules and move to the anode tube. Thus, these electrons form an electron current, which may account for most of the total discharging current. The ratio of the electron current to the total discharging current increases with increasing temperature. In a mixture of O₂ and N₂ and a mixture of CO₂ and N₂, the ratio of electron current increases with increasing N₂ content in the mixtures. The cathode material has little influence on the corona discharge characteristics at high ambient temperatures.     

Optical Emission Diagnostic of a Low Pressure Planar Microwave Discharge for Plasmachemical Deposition

Low pressure microwave plasmas are of growing interest for plasmachemical applications since they have special and in some cases unique advantages with respect to other plasma excitation methods. Subject of this paper are spatially resolved measurements of the optical emission of a special planar microwave plasma source utilized to investigate different plasmachemical processes. The optical emission spectroscopy (OES) is used as a tool to get information concerning the spatially distribution of reactive atom and molecule concentration by actinometry and concerning the neutral gas temperature by measurements of Doppler line broadening. The results refer to hydrocarbon containing hydrogen plasmas which gas pressures above 100 Pa. Surprisingly measurements confirm an earlier developed simplified two layer model consisting of a preferentially physically active plasma layer near the microwave window followed by a preferentially chemically active decaying region. They give evidence that this model is more adequate to the real physical situation as assumed until now.