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介绍了13.9 nm马赫贞德干涉仪用软X射线分束镜的设计、制备与性能检测。基于分束镜反射率和透过率乘积最大的评价标准,设计了13.9 nm软X射线激光干涉实验用多层膜分束镜。采用磁控溅射方法在有效面积为10 mm×10 mm、厚度为100 nm的Si3N4基底上镀制了Mo/Si多层膜,制成了多层膜分束镜。利用X射线掠入射衍射的方法测量了Mo/Si多层膜的周期。用扩束He-Ne激光束进行的投影成像方法定性分析了分束镜的面形精度,利用光学轮廓仪完成了分束镜面形精确测量。利用北京同步辐射装置测量了分束镜反射率和透射率,在13.9 nm处,分束镜反射率和透过率乘积达4%。使用多层膜分束镜构建了软X射线马赫贞德干涉仪,并应用于13.9 nm软X射线激光干涉实验中,获得了清晰的含有C8H8等离子体电子密度信息的动态干涉条纹。 相似文献
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激光等离子体光源软X射线反射率计 总被引:7,自引:0,他引:7
介绍了所研制的激光等离子体光源软X射线反射率计,该反射率计由激光等离子体光源、掠入射光栅单色仪、样品室、真空系统、样品台、光电探测系统和计算机控制系统组成,工作波段8~30 nm,测量样品的最大尺寸为130 mm×120 mm×120 mm(长×宽×高),可以利用这台反射率计对软X射线波段光栅、滤光片和多层膜反射镜等光学元件进行测量和评估。为检验反射率计的性能指标,利用该反射率计对本室研制的软X射线多层膜反射镜的反射率进行了测量,测量结果与理论计算结果符合较好,反射率测量重复性为±0.6%。 相似文献
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研究X射线二极管(XRD)时间特性.XRD 是构成软X射线能谱仪的主要部件,它用于激光等离子体发射软X射线谱测量.实验利用激光聚变研究中心的200TW激光器(激光能量~6J,脉冲宽度~30fs)打金箔靶产生的X射线发射谱,用滤片(Al)-XRD探测系统测量,探测信号由高频电缆(SUJ-50-10)传输和宽带示波器(TDS694C和TDS6604B)记录.实验数据进行了线性拟合和比对分析.
关键词:
X射线二极管
时间特性
软X射线能谱仪
数据处理 相似文献
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Two groups of Mo/Si films were deposited on surface of Si(1 0 0) crystal. The first group of the samples was prepared by both ion beam assisted deposition (IBAD) and metal vapor vacuum arc (MEVVA) ion implantation technologies under temperatures from 200 to 400 °C. The deposited species of IBAD were Mo and Si, and different sputtering Ar ion densities were selected. The mixed Mo/Si films were implanted by Mo ion with energy of 94 keV, and fluence of Mo ion was 5 × 1016 ions/cm2. The second group of the samples was prepared only by IBAD under the same test temperature range. The Mo/Si samples were analyzed by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), sheet resistance, nanohardness, and modulus of the Mo/Si films were also measured. For the Mo/Si films implanted with Mo ion, XRD results indicate that phase of the Mo/Si films prepared at 400 and 300 °C was pure MoSi2. Sheet resistance of the Mo/Si films implanted with Mo ion was less than that of the Mo/Si films prepared without ion implantation. Nanohardness and modulus of the Mo/Si films were obviously affected by test parameters. 相似文献
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月球表面环境对Mo/Si多层膜光学特性的影响 总被引:1,自引:0,他引:1
研究了月球表面高温、强辐射的空间环境下Mo/Si多层膜的热稳定性和辐照稳定性。Mo/Si多层膜采用磁控溅射法镀制,将制备好的多层膜在100℃和200℃高温下加热,利用激光等离子体反射率计和X射线衍射仪(XRD)对加热前后的多层膜进行了测量。结果显示在200℃以内,多层膜反射率和中心波长没有显著变化,表现出良好的热稳定性。利用Monte Carlo方法模拟了质子在多层膜内造成的缺陷的分布和浓度分布。模拟显示,能量大的质子沉积在多层膜内部,造成的缺陷也集中在多层膜内部。用能量为60keV,剂量分别为3×1012 cm-2和3×1014 cm-2的质子对Mo/Si多层膜进行辐照实验。发现多层膜内部出现了烧蚀损伤缺陷及节瘤缺陷。结果表明能量相同时,辐照剂量越大对多层膜反射率影响越大。 相似文献
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A series of Mo/Si multilayers with the same periodic length and different periodic number were prepared by magnetron sputtering, whose top layers were respectively Mo layer and Si layer. Periodic length and interface roughness of Mo/Si multilayers were determined by small angle X-ray diffraction (SAXRD).Surface roughness change curve of Mo/Si multilayer with increasing layer number was studied by atomic force microscope (AFM). Soft X-ray reflectivity of Mo/Si multilayers was measured in National Synchrotron Radiation Laboratory (NSRL). Theoretical and experimental results show that the soft X-ray reflectivity of Mo/Si multilayer is mainly determined by periodic number and interface roughness, surface roughness has little effect on reflectivity. 相似文献
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T. Leisegang D.C. Meyer A.A. Levin S. Braun P. Paufler 《Applied Physics A: Materials Science & Processing》2003,77(7):965-972
Mo/Si multilayer (ML) systems were deposited on Si(100) substrate by DC magnetron sputtering. The MLs were annealed at temperatures up to 440 °C under high-vacuum conditions, both with and without the influence of external mechanical stress, and characterized before and after thermal treatment by means of X-ray reflectometry, wide-angle X-ray scattering and optical microscopy. Two ML configurations were compared, one composed of pure Mo and Si layers and another with additional B4C and C interlayers at the Mo/Si interfaces, respectively. The external mechanical stress applied caused bending of the substrate and adherent ML, with an accompanied internal stress of approximately 60 GPa. An important outcome of the investigation was that dedicated release bending of MLs can reduce/compensate the influences of the internal stressed states. Thermal stability could be increased for both ML systems during sample annealing. For ML samples with additional B4C and C layers at the Mo/Si interfaces, the influence of external stress was more significant compared to that for pure Mo/Si MLs. This indicates that the additional layers mainly act as diffusion barriers and additionally as stress-relaxing buffers. PACS 68.60.Dv; 68.65.Ac; 42.79.Bh 相似文献
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利用透射电子显微镜对质子辐照前后空间太阳望远镜Mo/Si多层膜的微观结构进行了表征, 并对其辐照前后反射率的变化进行了测量.研究表明, Mo/Si多层膜经质子辐照后形成了一些缺陷结构,局部区域Mo/Si的周期性遭到破坏, Mo层与Si层的宽度发生了变化,多层膜层与层之间的界面也比辐照前更为粗糙,部分层状结构由于质子辐照发生了明显的扭曲和折断等现象;此外,质子辐照导致了Mo/Si多层膜反射率的下降,这些微观缺陷的形成是光学性能降低的直接诱因.
关键词:
空间太阳望远镜
Mo/Si多层膜
微观结构
反射率 相似文献
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L.J. Zhuge X.M. Wu W.B. Wang X.H. Liu 《Journal of Physics and Chemistry of Solids》2006,67(7):1394-1398
Hafnium films were deposited onto the molybdenum grids by radio-frequency magnetron sputtering from an Hf target in argon gas. Emission current of Mo grids coated with and without Hf film during the lifetime testing, which were contaminated by active electron-emission substances (i.e. Ba or BaO) from the cathode, were measured using an analogous-diode method. The results show that emission current from the Mo grid coated with Hf film is much less than that from the Mo grid without Hf film. The BaO layer was deposited on Hf/Mo substrates by chemical method in order to simulate the working conditions of the grids contaminated by electron-emission substances from the cathode. The suppression mechanism of electron emission from the Mo grid coated with Hf film is discussed according to the experimental results and the calculation of the reaction free energy. 相似文献
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S. Raud J. -S. Chen M-A. Nicolet 《Applied Physics A: Materials Science & Processing》1991,52(2):151-154
The annealing behaviour of the Cu/Mo/Au metallization system is investigated. Backscattering spectrometry reveals a rapid diffusion of Cu and Au across the Mo film and the formation of AuCu after annealing at 600°C for 30 min in vacuum, but only when no impurity is detected in the as-deposited polycrystalline Mo layer. The Au-Cu interaction is impeded when 5.5 at% of oxygen is introduced in the as-deposited Mo layer. The thin film microstructures are analyzed using X-ray diffraction and transmission electron microscopy. The thermal stability difference between the samples with a pure Mo layer and a contaminated Mo layer is discussed in terms of fast diffusion process inhibited by a grain boundary decoration with oxygen atoms. 相似文献
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V. Nagirnyi L. Jnsson M. Kirm A. Kotlov A. Lushchik I. Martinson A. Watterich B. I. Zadneprovski 《Radiation measurements》2004,38(4-6):519-522
ZnWO4, ZnWO4:Fe and ZnWO4:Mo crystals were investigated by the methods of time-resolved spectroscopy in the temperature range of 4.2–300 K. It is shown that the Mo and Fe impurities significantly reduce the light yield of ZnWO4. The main 2.5 eV emission of ZnWO4 and the 1.77 eV emission band of ZnWO4:Mo are shown to originate from the triplet excited state of the WO6 and MoO6 complex, respectively. In ZnWO4:Fe,Mo the MoO6 emission band is shifted to lower energies due to the perturbing influence of the iron impurity. No perturbing effect of Fe or Mo ions was observed for the main emission of ZnWO4:Fe and ZnWO4:Mo. The creation spectrum of self-trapped holes was measured for ZnWO4, ZnWO4:Fe and ZnWO4:Mo crystals in the energy region of 4–30 eV. 相似文献