Hydrogen Passivation Effect on Enhanced Luminescence from Nanocrystalline Si/SiO2 Multilayers

Nanocrystalline Si/SiO2 multilayers are prepared by thermally annealing amorphous Si/SiO2 stacked structures. The photoluminescence intensity is obviously enhanced after hydrogen passivation at various temperatures. It is suggested that the hydrogen trapping and detrapping processes at different temperatures strongly influence the passivation effect. Direct experimental evidence is given by electron spin resonance spectra that hydrogen effectively reduces the nonradiative defect states existing in the Si nanocrystas/SiO2 system which enhances the radiative recombination probability. The luminescence characteristic shows its stability after hydrogen passivation even after aging eight months.     

Si／SiNx／SiO2多层膜的光致发光

采用射频磁控溅射法,制备了具有强光致可见发光的纳米Si/SiNx/SiO2多层膜,利用傅立叶红外吸收(FTIR)谱,光致发光(PL)谱对其进行了研究。用260nm光激发得到的PL谱中观察到高强度的392nm(3.2eV)和670nm(1.9eV)光致发光峰,分析认为它们分别来自于缺陷态≡Si-到价带顶和从导带底到缺陷态≡Si-的辐射跃迁而产生的光致激发辐射复合发光。PL谱中只有370nm(3.4eV)处发光峰的峰位会受退火温度的影响,结合FTIR谱认为370nm发光与低价氧化物—SiOx(x<2.0)结合体有密不可分的关系。当SiO2层的厚度增大时,发光强度有所增强,800℃退火后出现最强发光,认为具有较大SiO2层厚度的Si/SiNx/SiO2结构多层膜更有利于退火后形成Si—N网络,能够得到更高效的光致发光。用量子限制-发光中心(QCLC)模型解释了可能的发光机制,并建立了发光的能隙态(EGS)模型。     

原位等离子体逐层氧化a-Si:H/SiO2多层膜的光致发光研究

采用在等离子体增强化学汽相沉积系统中沉积a-Si:H和原位等离子体逐层氧化的方法制备a-Si:H/SiO2多层膜.改变a-Si:H层的厚度，首次在室温下观察到来自a-Si:H/SiO2多层膜较强的蓝色光致发光和从465到435nm的蓝移.x射线能谱证明，SiO2层是化学配比的SiO2；C-V特性表明，a-Si:H/SiO2界面得到了很好的钝化；透射电子显微镜表明，样品形成了界面陡峭的多层结构.结合光吸收谱和光致发光谱的研究，对其发光机理进行了讨论.用一维量子限制模型对光致发光峰随着a-Si:H层厚度的减小 关键词： a-Si:H/SiO2多层膜 光致发光     

a-SiCx:H/nc-Si:H多层薄膜的室温时间分辨光致可见发光

在等离子体增强化学气相沉积(PECVD)系统中,通过控制进入反应室的气体种类逐层沉积非晶SiCx：H(a-SiCx：H)和非晶Si：H(a-Si：H)薄膜,然后经过高温热退火处理,成功制备了晶化纳米a-SiCx：H／nc-Si：H(多晶SiC和纳米Si)多层薄膜。利用截面透射电子显微镜技术分析了a-SiCx：H／nc-Si：H多层薄膜的结构特性。通过对晶化样品的时间分辨光致发光谱的研究,结果表明：随着退火温度的升高,发光峰位置开始出现一些红移现象：当退火温度为900℃时,样品的发光强度和发光衰减时间分别达到最大值和最小值;随着退火温度的继续升高,发光峰位置又开始出现蓝移现象。由此探讨纳米a-SiCx：H／nc-Si：H多层薄膜的发光特性和发光机理。     

a-SiC_x:H/nc-Si:H多层薄膜的室温时间分辨光致可见发光

在等离子体增强化学气相沉积(PECVD)系统中,通过控制进入反应室的气体种类逐层沉积非晶SiCx∶H(a SiCx∶H)和非晶Si∶H(a Si∶H)薄膜,然后经过高温热退火处理,成功制备了晶化纳米a SiCx∶H/nc Si∶H(多晶SiC和纳米Si)多层薄膜。利用截面透射电子显微镜技术分析了a SiCx∶H/nc Si∶H多层薄膜的结构特性。通过对晶化样品的时间分辨光致发光谱的研究,结果表明:随着退火温度的升高,发光峰位置开始出现一些红移现象;当退火温度为900℃时,样品的发光强度和发光衰减时间分别达到最大值和最小值;随着退火温度的继续升高,发光峰位置又开始出现蓝移现象。由此探讨纳米a SiCx∶H/nc Si∶H多层薄膜的发光特性和发光机理。     

a-Si/SiO2多量子阱材料制备及其晶化和发光

本文研究用等离子体增强化学气相淀积(PECVD)方法淀积SiO2和非晶硅(a-Si)时淀积速率和薄膜折射率与淀积条件的关系。选择合适的淀积条件制备了a-Si/SiO2多量子阱结构材料。用激光扫描退火方法使其晶化,当a-Si和SiO2层厚度分别为4nm和6nm时,形成了颗粒大小为3.8nm的硅晶粒。晶化后的样品在10K下可以观察到较强的光荧光发射,三个峰值波长分别为810、825和845nm.     

SiO2的赝晶化及AIN/SiO2纳米多层膜的超硬效应

采用反应磁控溅射法制备了一系列不同SiO2 层厚度的A1N/SiO2 纳米多层膜,利用X射线衍射仪、高分辨透射电子显微镜和微力学探针表征了多层膜的微结构和力学性能,研究了SiO2 层在多层膜中的晶化现象及其对多层膜生长方式及力学性能的影响.结果表明,由于受AIN六方晶体结构的模板作用,溅射条件下以非晶态存在的SiO2层在其厚度小于0.6 nm时被强制晶化为与AlN相同的六方结构赝晶体并与AlN形成共格外延生长.由于不同模量的两调制层存在晶格错配度,多层膜中产生了拉、压交变的应力场,使得多层膜产生硬度升高的超硬效应.SiO2随层厚的进一步增加又转变为以非晶态生长,多层膜的外延生长结构受到破坏,其硬度也随之降低.     

ZrO2/SiO2多层膜中膜厚组合周期数及基底材料对残余应力的影响

ZrO2/SiO2多层膜由相同沉积条件下的电子束蒸发方法制备而成,通过改变多层膜中高(ZrO2)、低(SiO2)折射率材料膜厚组合周期数的方法,研究了沉积在熔石英和BK7玻璃基底上多层膜中残余应力的变化.用ZYGO光学干涉仪测量了基底镀膜前后曲率半径的变化,并确定了薄膜中的残余应力.结果发现,该多层膜中的残余应力为压应力,随着薄膜中膜厚组合周期数的增加,压应力值逐渐减小.而且在相同条件下,石英基底上所沉积多层膜中的压应力值要小于BK7玻璃基底上所沉积多层膜中的压应力值.用x射线衍射技术测量分析了膜厚组合周期数不同的ZrO2/SiO2多层膜微结构,发现随着周期数增加,多层膜的结晶程度增强.同时多层膜的微结构应变表现出了与所测应力不一致的变化趋势,这主要是由多层膜中,膜层界面之间复杂的相互作用引起的.     

TiN/SiO2纳米多层膜的晶体生长与超硬效应

高硬度的含氧化物纳米多层膜在工具涂层上具有重要的应用价值.研究了TiN/SiO2纳米多层膜的晶体生长特征和超硬效应.一系列具有不同SiO2和TiN调制层厚的纳米多层膜采用多靶磁控溅射法制备;采用x射线衍射、x射线能量色散谱、高分辨电子显微镜和微力学探针表征了多层膜的微结构和力学性能.结果表明,虽然以单层膜形式存在的TiN和SiO2分别形成纳米晶和非晶结构,它们组成多层膜时会因晶体生长的互促效应而呈现共格外延生长的结构特征.在SiO2调制层厚度约小于1 nm时,多层膜呈现强烈的(111)织构,并伴随着硬度和弹性模量的显著上升,最高硬度和弹性模量分别达到44.5和473 GPa.进一步增加SiO2层的厚度,由于SiO2层呈现非晶态,多层膜的共格外延生长受到抑制,硬度也相应降低.TiN调制层厚度的改变虽对多层膜的生长结构和力学性能也有影响,但并不明显.     

反应溅射VN/SiO2纳米多层膜的微结构与力学性能

采用 V 和 SiO2 靶通过反应溅射方法制备了一系列具有不同 SiO2 和 VN 调制层厚的 VN/SiO2 纳米多层膜.利用X射线衍射、X射线能量色散谱、高分辨电子显微镜和微力学探针表征了多层膜的微结构和力学性能.结果表明:在Ar,N2混和气体中,射频反应溅射的SiO2薄膜不会渗氮.单层膜时以非晶态存在的SiO2,当其厚度小于1 nm时,在多层膜中因VN晶体层的模板效应被强制晶化,并与VN层形成共格外延生长.相应地,多层膜的硬度得到明显提高,最高硬度达34 GPa.随SiO2层厚度的进一步增加,SiO2层逐渐转变为非晶态,破坏了与VN层的共格外延生长结构,多层膜硬度也随之降低.VN调制层的改变对多层膜的生长结构和力学性能也有影响,但并不明显.     

Electroluminescence of Si Nanocrystal-Doped SiO2

We perform a comparative st udy on the electroluminescence （EL） and photoluminescence （PL） of Si nanocrystaldoped SiO2 （nc-Si：SiO2） and SiO2, and clarify whether the contribution from Si nanocrystals in the EL of nc-Si：SiO2 truly exists. The results unambiguously indicate the presence of EL of Si nanocrystals. The difference of peak positions between the EL and PL spectra are discussed. It is found that the normal method of passivation to enhance the PL of Si nanocrystals is not equally effective for the EL, hence new methods need to be explored to promote the EL of Si nanocrystals.[第一段]     

Time-Resolved Photoluminescence Spectroscopy： A Novel Technique for Determination of Luminescence of Quantum Dots

The time-resolved photoluminescence （PL） spectroscopy measured by the gradually increasing start delay time is utilized as a tool for the determination of the luminescence of quantmn dots （QDs）. The luminescence evolution of self-assembled CdSe QDs during the luminescence decay is fully revealed in terms of the experiment technique. The characteristic narrow luminescence lines of self-assembled CdSe QDs are obtained with increasing start delay time.     

Broadband Infrared Luminescence from Bismuth-Doped GeS2--Ga2S3 Chalcogenide Glasses

Near-infrared luminescence is observed from bismuth-doped GeS2-Ga2Sa chalcogenide glasses excited by an 808 nm laser diode. The emission peak with a maximum at about 1260 nm is observed in 80GeS2-2OGa2 Sa：O.fBi glass and it shifts toward the long wavelength with the addition of Bi gradually. The full width of half maximum （FWHM） is about 200 nm. The broadband infrared luminescence of Bi-doped GeS2-Ga2Sa chalcogenide glasses may be predominantly originated from the low valence state of Bi, such as Bi＋. Raman scattering is also conducted to claxify the structure of glasses. These Bi-doped GeS2 Ga2Sa chalcogenide glasses can be applied potentially in novel broadband optical fibre amplifiers and broadly tunable laser in optical communication system.     

Strong Green Light Emission from Low-Temperature Grown a-SiNx:H Film after Different Oxidation Routes

Room-temperature deposited amorphous silicon nitride （a-SiNx ：H） films exhibit intense green light emission after post-treated by plasma oxidation, thermal oxidation and natural oxidation, respectively. All the photoluminescence （PL） spectra are peaked at around 500nm, independent of oxidation method and excitation wavelength. Compared with the PL results from oxidized a-Si：H and as-deposited a-SiNx：H samples, it is indicated that not only oxygen but also nitrogen is of an important role in enhancing light emission from the oxidized a-SiNx：H. Combining the PL results with the analyses of the bonding configurations as well as chemical compositions of the films, the strong green light emission is suggested to be from radiative recombination in luminescent centres related to N Si-O bonds.     

Effects of Electric Field on Electronic States in a GaAs/GaAlAs Quantum Dot with Different Confinements

Binding energies of shallow hydrogenic impurity in a GaAs/GaAlAs quantum dot with spherical confinement, parabolic confinement and rectangular confinement are calculated as a function of dot radius in the influence of electric field. The binding energy is calculated following a variational procedure within the effective mass approximation along with the spatial depended dielectric function. A finite confining potential well with depth is determined by the discontinuity of the band gap in the quantum dot and the cladding. It is found that the contribution of spatially dependent screening effects are small for a donor impurity and it is concluded that the rectangulax confinement is better than the parabolic and spherical confinements. These results are compared with the existing literature.     

Physical and Chemical Properties of TiOxNy Prepared by Low-Temperature Oxidation of Ultrathin Metal Nitride Directly Deposited on SiO2

Physical and chemical properties of titanium oxynitride （TiOxNy ） formed by low-temperature oxidation of titanium nitride （TIN） layer are investigated for advanced metal-oxide-semiconductor （MOS） gate dielectric application. TiOxNy exhibits polycrystalline properties after the standard thermal process for MOS device fabrication, showing the preferred orientation at [200]. Superior electrical properties of TiOxNy can be maintained before and after the annealing, probably due to the nitrogen incorporation in the oxide bulk and at the interface. Naturally formed transition layer between TiOxNy and SiO2 is also confirmed.     

Preparation and Luminescence Characteristics of Ca3Y2（BO3）4：Eu^3＋ Phosphor

Ca3Y2 （BO3）4：Eu^3＋ phosphor is synthesized by high temperature solid-state reaction method, and the Iuminescence characteristics are investigated. The emission spectrum exhibits two strong red emissions at 613 and 621 nm corresponding to the electric dipole ^5 Do- ^7F2 transition of Eu^3＋ under 365 nm excitation, the reason is that Eu^3＋ substituting for Y^3＋ occupies the non-centrosymmetric position in the crystal structure of Ca3 Y2 （BO3）4. The excitation spectrum for 613 nm indicates that the phosphor can be effectively excited by ultraviolet （UV） （254 nm, 365nm and 400nm） and blue （470nm） light. The effect of Eu^3＋ concentration on the emission intensity of Ca3 Y2 （BO3）4 ：Eu^3＋ phosphor is measured, the result shows that the emission intensities increase with increasing Eu^3＋ concentration, then decrease. The CIE colour coordinates of Ca3Y2 （BO3）4：Eu^3＋ phosphor is （0.639, 0.357） at 15mol% Eu^3＋.     

Vacuum Ultraviolet Excited Photoluminescence Properties of Novel Na3Y9O3（BO3）8：Tb^3＋ Phosphor

The novel vacuum ultraviolet （VUV） excited Na3 Y9O3 （BO3）8：Tb^3＋ （NYOB：Tb^3＋） green phosphor is prepared. Strong VUV photoluminescence and high quenching concentration of Tb^3＋ （20 wt%） are observed in NYOB： Tb^3＋ and the strong emission are correlated with the unique layer-type structure of NYOB. All the characteristic 4 f - 5d transitions of Tb^3＋ and the host absorption band in VUV region are identified in the excitation spectrum. Based on the results, the energy levels scheme of Tb^3＋ in NYOB：Tb^3＋ is first established. This newly developed NYOB：Tb^3＋ phosphor shows excellent optical properties when compared with the commercial Zn2SiO4：Mn^2＋ and would be a potential VUV-excited green phosphor.     

Electronic Structure and Optical Properties of La-Doped SrTiO3 and Sr2TiO4 by Density Function Theory

The effect of La doping on the electronic structure and optical properties of SrTiO₃ and Sr₂TiO₄ is investigated by the first-principles calculation of plane wave ultrasoft pseudopotential based on the density function theory (DFT). The calculated results reveal that the electron doping in the case of Sr_0.875La_0.125TiO₃ and Sr_1.875La_0.125TiO₄ can be described within the rigid band model. The La³⁺ ions fully acts as electron donors in Sr_0.875La_0.125TiO₃ and Sr_1.875La_0.125TiO₄ systems and the Fermi level shifts further into the conduction bands (CBs) for Sr_1.875La_0.125TiO₄ compared to Sr_0.875La_0.125TiO₃. The two systems exhibit n-type degenerate semiconductor features. At the same time, the density of states (DOS) of the two systems shift towards low energies and the optical band gaps are broadened. The Sr_1.875La_0.125TiO₄ is highly transparent with the transmittance about 90% in the visible range, which is larger than that of Sr_0.875La_0.125TiO₃(85%). The wide band gap, small transition probability and weak absorption due to the low partial density of states (PDOS) of impurity in the Fermi level result in the optical transparency of the films...