Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode

We report on recent developments of an “at wavelength” full-field imaging technique for defect inspection of multilayer mask blanks for extreme ultraviolet lithography (EUVL). Our approach uses photoemission electron microscopy (PEEM) in a near normal incidence mode at 13.5 nm wavelength to image the photoemission induced by the EUV wave field on the multilayer blank surface. We analyze buried defects on Mo/Si multilayer samples down to a lateral size of 50 nm and report on first results obtained from a six inches mask blank prototype as prerequisite for industrial usage.     

Preventing carbon contamination of optical devices for X‐rays: the effect of oxygen on photon‐induced dissociation of CO on platinum

Platinum is one of the most common coatings used to optimize mirror reflectivity in soft X‐ray beamlines. Normal operation results in optics contamination by carbon‐based molecules present in the residual vacuum of the beamlines. The reflectivity reduction induced by a carbon layer at the mirror surface is a major problem in synchrotron radiation sources. A time‐dependent photoelectron spectroscopy study of the chemical reactions which take place at the Pt(111) surface under operating conditions is presented. It is shown that the carbon contamination layer growth can be stopped and reversed by low partial pressures of oxygen for optics operated in intense photon beams at liquid‐nitrogen temperature. For mirrors operated at room temperature the carbon contamination observed for equivalent partial pressures of CO is reduced and the effects of oxygen are observed on a long time scale.     

Limit analysis for laser removal of micron contaminant colloidal silicon dioxide particles from the super-smooth optical glass substrate by pulse Nd:YAG laser

Multimode Nd:YAG pulse laser was applied to remove micron and submicron particles by vaporizing a thin paint film pre-coated on super-smooth optical substrate surface. By analyzing the poor absorption of the optical glass substrate to the irradiative Nd:YAG pulse laser, the removal mechanism of contaminated colloidal particles from the super-smooth surface through vaporization of a volatile solid film is described. A limit analysis was proposed to determine the lower and the upper threshold of laser fluence for cleaning the SiO₂ contaminants from super-smooth K8 optical substrate. Relevant experiments on laser cleaning of micron-polishing particles from super-smooth K8 optical substrate confirmed the usefulness of this method in assisting the selection of effective cleaning fluence for accomplishing high cleanliness, which was in a range of 80–90% of the predicted upper threshold.