Defects formation in the dual B+ and N+ ions implanted silicon

Silicon wafers were implanted with 40 keV B⁺ ions (to doses of 1.2×10¹⁴ or 1.2×10¹⁵ cm^–2) and 50 or 100 keV N⁺ ions (to doses from 1.2×10¹⁴ to 1.2×10¹⁵ cm^–2). After implantations, the samples were furnace annealed at temperatures from 100 to 450 °C. The depth profiles of the radiation damages before and after annealing were obtained from random and channeled RBS spectra using standard procedures. Two damaged regions with different annealing behaviour were found for the silicon implanted with boron ions. Present investigations show that surface disordered layer conserves at the annealing temperatures up to 450 °C. The influence of preliminary boron implantation on the concentration of radiation defects created in subsequent nitrogen implantation was studied. It was shown that the annealing behaviour of the dual implanted silicon layers depends on the nitrogen implantation dose.The authors would like to thank the members of the INP accelerator staff for the help during the experiments. The work of two authors (V.H. and J.K.) was partially supported by the Internal Grant Agency of Academy of Science of Czech Republic under grant No. 14805.     

Iodine laser production of highly charged Ta ions

The results of systematic studies of multiply charged Ta ion production with the fundamental frequency of an iodine laser (=1.315m), and its 2nd (0.657m) and 3rd (0.438m) harmonics are summarized and discussed. Short laser pulse (350 ps) and a focus spot diameter of 100m allowed for the laser power densities in the range of 5×10¹³–1.5×10¹⁵ W/cm². Corpuscular diagnostics were based on time-of-flight methods; two types of ion collectors and a cylindrical electrostatic ion energy analyzer were used. The Ta ions with charge state up to 55+ were registered in the distance of 210 cm; the maximum amplitude of the signal of a high energy ion group was found to belong to the ions with the charge state around 43+, depending on the laser power density. The ion energy distribution was measured for all three wavelengths, however, in a different energy range; the maximum registered ion energy was 8.8 MeV. The occurrence of highly charged ions in the far expansion zone is discussed in view of the mechanism of charge distribution freezing during two-temperature isothermal plasma expansion.The work was performed in a partial fulfillment of the research grant project No. A1010525 sponsored by the Academy of Sciences of the Czech Republic and grant project No. 202/95/0039 sponsored by the Grant Agency of the Czech Republic.     

Oxygen incorporation in polyethylene and polypropylene implanted with F+, As+ and I+ ions at high dose

Samples of PolyPropylene (PP) and PolyEthylene (PE) implanted with 150 keV F⁺, As⁺ and I⁺ ions with a dose of 1×10¹⁵ cm^–2 were studied using standard Rutherford Back Scattering (RBS) technique. No fluorine atoms above the present RBS detection limit were observed in the ion-implanted polymers. The measured depth profiles of As and I atoms are significantly broader than those predicted by the TRIM code for pristine polymers. The differences can be explained by stepwise polymer degradation due to ion bombardment. Massive oxidation of the ion-implanted polymers is observed. The oxidation rate and the resulting oxygen depth profile depend strongly on the polymer type and implanted ion mass. In the samples implanted with F⁺ ions, an uniformly oxidized layer is built up with a mean oxygen concentration of 15 at.%. In the samples implanted with As⁺ and I⁺ ions, a non-uniform oxygen depth distribution is observed with two concentration maxima on the sample surface and in a depth correlated with implanted ion range.     

Quadrupole interaction studies of Hg in Sb

Time differential perturbed angular correlation and nuclear orientation studies of the electric quadrupole interaction for Hg in Sb have been performed. The effective field gradients |V _zz ^eff (HgSb)|=1.43(18)×10¹⁷V cm^–2 at room temperature andV _zz ^eff (HgSb)=+1.8(2) × 10¹⁷V cm^–2 below 0.05 K have been derived. These two values are no indication for an anomalous temperature dependence of the effective field gradient for Hg in Sb. The value of the electric field gradient fits well into the systematics for Hg in other hosts. It is shown that the electronic enhancements of the field gradients are correlated to the valence of the impurities and are rather insensitive to the host properties.On leave of absence from: University of Lisboa, Portugal     

Investigation of laser-annealed antimony implanted Si by ion backscattering and channeling and structure analysis

Rutherford backscattering (RBS), ion channeling and surface studies were done to investigate diffusion of ion implanted Sb in Si. Clean and polished Si was implanted by 190KeV Sb⁺ ions to a dose of 2.3×10¹⁵cm^–2. Laser annealing was carried out by a single 10 J/cm² laser pulse from a Nd: glass (7 ns FWHM) laser. Concentration profiles of Sb as a function of depth and dopant substitutionalities were measured by helium-ion backscattering and channeling. The laser shot resulted in melting of the central portion of the spot. A honey comb type surface morphology was found by SEM analysis. Dektak surface profiles showed a crater of 600 nm depth. One-dimensional heating calculations show that dopant diffusion depths, after consideration of simultaneous evaporation, can be 400 nm, whereas experiments indicate larger depths (1 m). Calculated crater depth is roughly twice the experimental value. Measured depths are much larger than calculated by heat diffusion and indicate that regrowth and distribution of Sb has been modified by convection in the melt. We estimate good substitutionality up to 4 J/cm² and discuss energy density dependence for such high-energy density laser pulses.     

Laser annealing of GaAs dual implanted with Si and P ions

Laser annealing of SI(100) GaAs:Cr implanted either with Si⁺ ions (150 keV, 6×10¹³-1×10¹⁵cm^–2) or dual implanted with Si⁺ ions (150 keV, 6×10¹⁴–1×10¹⁵cm^–2) and P⁺ ions (160 keV, 1×10¹⁴–1×10¹⁵cm^–2) has been examined using backscatteringchannelling technique and via electrical measurement of Hall effect. It has been found that at laser energy densities 0·8 J cm^–2 a full recovery of the sample surface occurs. In dual implanted samples (1×10¹⁵ Si⁺ cm^–2+1×10¹⁵P⁺cm^–2) up to 46% of Si atoms become electrically active after the laser annealing. Resultant Hall mobility of carriers is, however,lower than that obtained after common thermal annealing.The authors are pleased to take the opportunity of thanking Professor M. Kubát for his encouragement and continuous support. Accelerator staff is gratefully acknowledged for its assistance in the course of experiments.     

Poly(organylsilylene)s — perspective materials for optoelectronics

Poly(organylsilylene)s with their uninterrupted chains of silicon atoms are a new class of materials with significant delocalization of electrons along the polymer chain. Their electronic structure, optical properties, photoconductivity, electroluminescence, and photorefractivity are discussed on the model compound poly[methyl(phenyl)silylene]. Their unusual electrical and optical properties, such as high quantum generation efficiency, high charge-carrier mobility, efficient luminescence, and optical non-linearity, can be utilized in some optoelectronic devices. Presented at the 1st Czech-Chinese Workshop “Advanced Materials for Optoelectronics”, Prague, Czech Republic, June 13–17, 1998. This work was suported by the Grant Agency of the Academy of Sciences of the Czech Republic (grant No. A1050901) and by the Grant Agency of the Czech Republic (grant No. 106/98/0700).     

STM study of nucleation of Ag on Si(111)−(7 × 7) surface

Initial stages of Ag on Si(111)−(7 × 7) surface nucleation were studied at submonolayer coverage. Samples were prepared by thermal evaporation of Ag from tungsten wire under UHV conditions (p<2.5 × 10⁻⁸ Pa). Various deposition rates (0.002–0.1 ML s⁻¹) were used to prepare Ag island films with coverages (0.002–2) ML (1 ML ≈ 7.58 × 10¹⁴ atoms cm⁻²) at room temperature. We observed preferential growth on faulted half unit cells (F cells). At constant coverage both the island density and ratio of occupied F and U (unfaulted) cells are independent of the deposition rate, which is an evidence for dominant influence of substrate structure. The preference of nucleation in the F cells against U cells decreases with the coverage until the ratio is 1:1 for 1 ML Ag film. We have observed that presence of an Ag island in any type of the half unit cell (F or U) considerably reduces nucleation probability in neighbouring cells. This results in forming of structural patterns observed among randomly grown Ag-islands which is a new feature found for Ag/Si(111)−(7 × 7) system. Presented at the VIII-th Symposium on Surface Physics, Třešt’ Castle, Czech Republic, June 28 – July 2, 1999. This work was supported by the Grant Agency of Charles University — projects GAUK 34/97 and 147/99, by the Grant Agency of Czech Republic — project GAČR 202/97/1109 and by the Ministry of Education grant VS 97116.     

TDPAC studies on181Hf implanted into diamond

¹⁸¹Hf ions were implanted at (900±10)K into (100) cleaved single crystal diamonds. After subsequent annealing residence site parameters were determined for the implanted ions employing the (133 keV)–(482 keV) cascade in¹⁸¹Ta in TDPAC technique. Fractions of 5% each were determined that experience axially symmetric electric field gradients (EFG) V_zz(1)=5.5×10¹⁷ V cm^–2 and V_zz(2)=9.6×10¹⁷ V cm^–2, respectively. The bulk of the ions are strongly disturbed by still higher electric field gradients.     

Ion beam mixing and sputtering of Kr-irradiated TiN films measured with RBS,RNRA, and PIXE

Thin titanium nitride films of 10–300 nm thickness were irradiated with ⁸⁴Kr ions of 80–700 keV energy and fluences ranging from 10¹⁶ cm² to 2×10¹⁷ cm². Sputter yields (Y=0.4–1.0) and mixing rates (k=0.05–0.5 nm⁴) were determined using the depth profiling methods RBS, RNRA, and PIXE. While the sputter yields agree well with the modified Sigmund theory, the energy dependence of the mixing rates cannot be explained by standard models.     

CEMS study of silicon implanted iron

Thin layers of iron-rich Fe-Si alloys were formed by silicon implantation into iron at room temperature with different energies (100, 200, and 300 keV) and ion doses (2 × 10¹⁷ to 1×10¹⁸ cm^–2). The produced layers were investigated by⁵⁷Fe conversion electron Mössbauer spectroscopy (CEMS) to identify the phases formed by the ion implantation. Auger electron spectroscopy (AES) was used to measure the concentration depth profiles of the implanted silicon. Depending on the implantation parameters different disordered Fe-Si structures were detected. At low doses only magnetic phases were formed while at high doses a non-magnetic phase with a hitherto unknown structure appeared. Annealing of the samples resulted first in the formation of a D0₃-like short-range order and a slow decrease of the non-magnetic phase, and subsequently in the migration of Si out of the investigated depth range.     

Model of free charge generation in polymers

A time solution of the excimer-ion pair system is presented here with a special attention to the time asymptote. Presented at the Czech-Israeli-German Symposium “Dynamical Processes in Condensed Molecular Systems”, Prague, Czech Republic, 26–30 May 1997. This work was supported by the grant No. C 1050601 of the Grant Agency of the Academy of Sciences of the Czech Republic.     

Nanocrystalline titanium carbide thin films deposited by reactive magnetron sputtering

We investigated the structure and composition of titanium carbide thin films deposited by the reactive magnetron sputter ion plating process as a function of deposition parameters. The films were sputtered onto unheated glass substrates by means of an unbalanced planar d.c. magnetron equipped with a titanium target using a mixture of argon and methane. The deposition parameters ranged from 0.05 Pa to 2 Pa for total working gas pressurep _T, from 10% to 60% (volume) for relative methane concentration in the working gas mixture, from 45 mm to 85 mm for the substrate-to-target distanced _s-t and from −50V to −800V for the substrate biasU _S. It was found that the crystallinity of the thin films strongly decreases with increasingp _T,d _s-t andU _S. The experiments described show the conditions necessary to obtain sputter-deposited nanocrystalline titanium carbide films. This work has been partially supported by the Grant Agency of the Czech Republic under Grant No. 106/96/K245 and by the Ministry of Education of the Czech Republic under Grant No. VS96 059.     

Supersaturated Si-As alloy formation by ion implantation and pulsed electron beam annealing

Supersaturated surface alloys produced by very high dose (0.8–2.6×10¹⁷cm^–2) implantation of As-ions into silicon and subsequent pulsed electron-beam annealing have been investigated by means of the channeling technique. The maximum solubility limit of 7×10²¹ As/cm³ has been determined. It exceeds the equilibrium solubility limit by more than a factor of 4. Angular scan measurements indicated that for doses above 1×10¹⁷cm^–2 As atoms are displaced by about 0.12 Å from the regular lattice sites.     

Impurity lattice location and recovery of structural defects in semiconductors studied by emission channeling

Doping of semiconductors by ion implantation usually requires implantation doses below 10¹³ cm^–2 to obtain typical impurity concentrations of <10¹⁸ cm^–3. The lattice location of impurities as well as the defect recovery after such low dose implantations can be studied using the emission channeling technique. In this technique, single crystals are doped with radioactive probe atoms and the channeling effects of electrons, positrons or -particles emitted from these atoms are measured. We present a quantitative analysis of electron emission channeling measurements after heavy-ion implantation into Si and III–V compound semiconductors by comparison with calculated channeling profiles based on the dynamical theory of electron diffraction. For In atoms implanted into Si, complete substitutionality was found after rapid thermal annealing to 1200 K. For lower annealing temperatures, the observed channeling effects indicate small mean displacements (of about 0.2 Å) of the In atoms from substitutional sites, caused by residual implantation defects. For GaAs, GaP and InP implanted at low temperatures with In or Cd isotopes, pronounced recovery stages around 300, 400 and 350 K, respectively, were observed and substitutional fractions close to 100% were derived after annealing above the stage.     

Photoluminescence and Raman studies of Xe ion-implanted diamonds: Dependence on implantation dose

We report on photoluminescence and Raman studies of Xe ion-implanted diamond. Several natural and high-purity artificial diamonds implanted within the wide dose range of 10¹⁰-5×10¹⁴ ion/cm² were studied. The room temperature luminescence of the Xe center consists of two zero phonon lines, at 813 nm (strong) and 794 nm (weak). The dose dependences of photoluminescence and Raman spectra were studied. For doses less than 10¹³ ion/cm², the luminescence intensity grows with the implantation dose linearly. The defect-induced photoluminescence quenching was observed for doses equal or more than 10¹³ ion/cm². Possible models of the Xe center will be discussed. The nature of damages induced by ion implantation at different doses was analyzed using micro-Raman spectroscopy.     

Saturation and isotope mixing during low-temperature implantations of hydrogen into metals

Deuterons of 10 keV energy and protons with the same mean projected range have been implanted into several metals at a temperature of approximately 35 K and at dose rates of approximately 2 × 10¹⁴ cm^–2 s^–1. The amount of retained deuterium saturates at fluences larger than roughly 2 × 10¹⁸ cm^–2. After implantation of deuterons and subsequent bombardment with protons, the deuteron depth profiles show characteristic double peak structures, which indicate a replacement process. The experimental data are in good agreement with a simple model of local saturation and mixing. The possible implications of this model are discussed.     

Time-resolved emission spectra of plasma produced by excimer laser ablation of Pb-Bi-Sr-Ca-Cu-O

Time-resolved emission spectroscopy was employed to detect excited species formed in the laser ablation of superconductor Pb-Bi-Sr-Ca-Cu-O by an excimer laser at various background gas pressures. A simple model has been created to explain the chemical kinetics of reactions in a plasma plume by its expansion. We explained the time dependence of plasma emission on the wavelengths of lead, strontium and their oxides. For the purpose of this paper, we determined reaction rates of lead deexcitation and the rate of recombination of Pb⁺ ion. This work was supported by the Grant Agency of Charles University (Grant No. 28/97) and Grant Agency of Academy of Sciences of the Czech Republic (Grant No. A4040708).