Strong pinning of triple junction migration for robust high strain nanostructures

The universality of a key recovery mechanism: triple junction migration in high strain nanostructures is revealed herein. This migration is the only means to uniformly coarsen deformed lamellar microstructures. Migration of medium to high angle geometrically necessary boundaries at triple junctions is resisted by strong pinning phenomena. Pinning by low angle dislocation boundaries is the novel mechanism that greatly adds to the solute drag of these higher angle boundaries during migration at triple junctions. Solutes furthermore cause a significant increase in the dislocation density of the low angle boundaries formed during deformation and thus greatly enhance the observed pinning. Boundary pinning by dislocation boundaries and solute drag is analysed for deformed Ni of different purities via in and ex situ electron microscopy. A kinetic model is utilised to obtain activation energies that quantitatively demonstrate the strength of this pinning. A new strategy for achieving robust nanostructured metals is developed based on solute and dislocation pinning of triple junction migration – a universal recovery mechanism in deformed lamellar microstructures.     

Low-porosity porous silicon nanostructures on monocrystalline silicon solar cells

In this work we present a study of low-porosity porous silicon (PS) nanostructures stain etched on monocrystalline silicon solar cells. The PS layers reduce the reflectance, improve the diffusion of dopants by rapid thermal processes, and increase the homogeneity of the sheet resistance. Some samples were subjected to chemical oxidation in HNO₃ to reduce the porosity of the surface layer. After the diffusion process, deposition of a SiN_x antireflection layer, and screen printing of the samples, an efficiency of 15.5% is obtained for low-porosity PS solar cells, compared with an efficiency of 10.0% for standard PS cells and 14.9% for the reference Cz cells.     

硅p-n结太阳电池对DF激光的响应

对硅p-n结太阳电池在DF激光辐照下的响应进行了理论和实验研究。推导了p-n结反向饱和电流随温度的近似变化关系。根据该近似关系,计算了太阳电池在DF激光辐照过程中输出电压的变化曲线。计算结果和实验结果之间取得了比较好的一致性。     

硅p-n结太阳电池对DF激光的响应

 对硅p-n结太阳电池在DF激光辐照下的响应进行了理论和实验研究。推导了p-n结反向饱和电流随温度的近似变化关系。根据该近似关系，计算了太阳电池在DF激光辐照过程中输出电压的变化曲线。计算结果和实验结果之间取得了比较好的一致性。     

非晶硅光伏电池表面高效光陷阱结构设计

提出一种应用于非晶硅光伏电池表面的光陷阱结构,该结构主要由衍射光栅、低折射率MgF₂膜层、高折射率ZnS膜层及金属Ag反射镜组成.在标准测试条件(AM1.5,100 mW/cm²和25 ℃)下,运用严格耦合波理论,通过计算400-1000 nm波段内的1 μm厚非晶硅光伏电池的吸收光子数加权平均ξ_AM1.5,优化光陷阱结构的设计参数.结果表明:对于电池前表面减反射结构,在衍射光栅周期为800 nm、高度为160 关键词： 光陷阱结构 衍射光栅 减反射膜 非晶硅光伏电池     

Electroacoustics in a silicon solar cell

We present electroacoustic measurements of a p/n⁺ silicon solar cell as a function of the stimulating potential modulation frequency, gaining information on the different power dissipation sources within the device by means of thermal depth profiling. Theoretical calculations of the electroacoustic signal based on a reinterpretation of the Rosencwaig and Gersho model have also been performed, and the results of these calculations have been compared to the experimental data.     

Silicon nitride/silicon oxide interlayers for solar cell passivating contacts based on PECVD amorphous silicon

This Letter demonstrates improved passivating contacts for silicon solar cells consisting of doped silicon films together with tunnelling dielectric layers. An improvement is demonstrated by replacing the commonly used silicon oxide interfacial layer with a silicon nitride/silicon oxide double interfacial layer. The paper describes the optimization of such contacts, including doping of a PECVD intrinsic a‐Si:H film by means of a thermal POCl₃ diffusion process and an exploration of the effect of the refractive index of the SiN_x. The n⁺ silicon passivating contact with SiN_x /SiO_x double layer achieves a better result than a single SiN_x or SiO_x layer, giving a recombination current parameter of ～7 fA/cm² and a contact resistivity of ～0.005 Ω cm², respectively. These self‐passivating electron‐selective contacts open the way to high efficiency silicon solar cells. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

基于graphene条带的硅纳米结构

采用分子动力学模拟方法研究了graphene条带上生长硅纳米结构的过程,分析了不同温度下硅原子在graphene条带边沿生成的新型纳米结构.研究表明,随机分布的硅原子吸附到锯齿型graphene条带边沿在不同的温度T下可生成不同类型的硅纳米结构：300K≤T<2000K时形成无规则的团簇,2000K≤T≤2800K时形成单原子链结构,2800K<T<3900K时形成含缺陷的硅链结构,T≥3900K时硅原子逐渐替代条带边沿的碳原子直至graphene条带破坏.而硅原子吸附到扶手椅型graphene条带边沿在300K≤T<3000 K内仅能形成非链状的不定型的硅纳米结构. 关键词： graphene 硅 纳米结构 分子动力学模拟     

Improved performance of solar cell based on porous silicon surfaces

Porous silicon (PS) surfaces were fabricated by electrochemical etching for both sides of the Si wafer. The objective of the present study is to investigate the PS effect on performance of silicon solar cells. Moreover, enhancement of solar cell efficiency can be obtained by manipulating of the reflected mirrors, and the process is very promising for solar cells manufacturing due to its simplicity, lower cost and suitability for mass production. The surface of PS is observed to have been discrete pores with smooth walls, and with short branches pores for the polished wafer side. In contrast, the etched backside of the wafer was observed to have bigger pore size than the etched polished side, and pores on the surface are in random location. PS formed on the both sides has lower reflectivity value in comparison to the other researcher group. The increase in efficiency of solar cell fabricated with PS formed on both sides of the wafer were extremely observed in comparison to one side PS and bulk silicon solar cells respectively. Solar cell fabricated shows that the conversion efficiency increased to 14.5% in comparison to unetched sample. The porous surface texturing properties could enhance and increased the conversion efficiency of silicon solar cells, these results also showed that the efficiency with this procedure is more promising in comparison to other solar cells, which are fabricated under similar conditions.     

Light emitting devices based on silicon nanostructures

In this paper, we summarize the results of an extensive investigation on the properties of MOS-type light emitting devices based on silicon nanostructures. The performances of crystalline, amorphous and Er-doped Si nanostructures are presented and compared. We show that all devices are extremely stable and robust, resulting in an intense room temperature electroluminescence (EL) at around 900 nm or at 1.54 μm. Amorphous nanostructures may constitute an interesting system for the monolithic integration of optical and electrical functions in Si ULSI technology. In fact, they exhibit an intense room temperature EL with the advantage to be formed at a temperature of only 900 °C, remarkably lower than the temperature needed for the formation of Si nanocrystals (1100 °C or higher). To improve the extraction of the light, we coupled the emitting system with a 2D photonic crystal structure properly fabricated with ULSI technology to reduce the total internal reflection of the emitted light. We demonstrate that the extraction efficiency is increased by a factor of 4. Finally, the light emission from devices based on Er-doped Si nanoclusters has been studied and in particular we have investigated the luminescence quenching processes limiting quantum efficiency in these devices. In fact the carrier injection, that determines the excitation of Er ions through electron–hole recombination, at the same time produces an efficient non-radiative Auger de-excitation with trapped carriers. These data are presented and the implications on the device performances discussed.     

Boron implanted emitter for n-type silicon solar cell

The effects of ion doses on the properties of boron implanted Si for n-type solar cell application were investigated with doses ranging from 5×1014cm-2to 2×1015cm-2and a subsequent two-step annealing process in a tube furnace.With the help of the TCAD process simulation tool, knowledge on diffusion kinetics of dopants and damage evolution was obtained by fitting SIMS measured boron profiles. Due to insufficient elimination of the residual damage, the implanted emitter was found to have a higher saturation current density(J0e) and a poorer crystallographic quality. Consistent with this observation, V oc, J sc, and the efficiency of the all-implanted p+–n–n+solar cells followed a decreasing trend with an increase of the implantation dose. The obtained maximum efficiency was 19.59% at a low dose of 5×1014cm-2. The main efficiency loss under high doses came not only from increased recombination of carriers in the space charge region revealed by double-diode parameters of dark I–V curves, but also from the degraded minority carrier diffusion length in the emitter and base evidenced by IQE data. These experimental results indicated that clusters and dislocation loops had appeared at high implantation doses, which acted as effective recombination centers for photogenerated carriers.     

Magnetoresistance in silicon based ferrite magnetic tunnel junction

We report magnetoresistance for silicon based magnetic tunnel junction. We used cobalt ferrite & cobalt nickel ferrite as free layer and pinned layer. The magnetoresistance measured at room temperature through silicon by fabricating FM/Si/FM magnetic tunnel junction. Magnetoresistance shows a loop type behavior with 3.7%. We have successfully demonstrated spin tunneling through silicon with ferrite junction that opens the door for potential candidate for spintronics devices. The spin-filtering effect for this double spin-filter junction is also discussed.     

Microwave photoconductivity relaxation time in a bifacial silicon solar cell base in the vicinity of a p-n junction

Microwave photoconductivity relaxation time depending on light intensity is studied in n ⁺-p-p ⁺ silicon solar cells. The results from experiments performed under conditions of open-circuit and short-circuit currents are in agreement with the simulated data. The relaxation times of microwave photoconductivity are found for a part of the base region adjacent to the n ⁺-p junction.     

Electrical and optical properties of nanowires based solar cell with radial p-n junction

In our studies the absorption, transmittance and reflectance spectra for periodic nanostructures with different parameters were calculated by the FDTD (Finite-Difference Time-Domain) method. It is shown that the proportion of reflected light in periodic structures is smaller than in case of thin films. The experimental results showed the light reflectance in the spectral range of 400–900 nm lower than 1% and it was significantly lower in comparison with surface texturing by pyramids or porous silicon.Silicon nanowires on p-type Si substrate were formed by the Metal-Assisted Chemical Etching method (MacEtch). At solar cells with radial p-n junction formation the thermal diffusion of phosphorus has been used at 790 °C. Such low temperature ensures the formation of an ultra-shallow p-n junction. Investigation of the photoelectrical properties of solar cells was carried out under light illumination with an intensity of 100 mW/cm². The obtained parameters of NWs' solar cell were I_sc = 22 mA/cm², U_oc = 0.62 V, FF = 0.51 for an overall efficiency η = 7%. The relatively low efficiency of obtained SiNWs solar cells is attributed to the excessive surface recombination at high surface areas of SiNWs and high series resistance.     

Single-electron tunneling in silicon nanostructures

We present a brief overview on different realizations of single-electron devices fabricated in silicon-on-insulator films. Lateral structuring of highly doped silicon films allows us to observe quasi-metallic Coulomb blockade oscillations in shrunken wires where no quantum dot structure is geometrically defined. Embedding quantum dot structures into the inversion channel of a silicon-on-insulator field-effect transistor Coulomb blockade up to 300 K is observed. In contrast to the quasi-metallic structures, in these devices the influence of the quantum mechanical level spacing inside the dot becomes visible. Suspending highly doped silicon nanostructures leads to a novel kind of Coulomb blockade devices allowing both high-power application as well as the study of electron–phonon interaction. Received: 14 April 2000 / Accepted: 17 April 2000 / Published online: 6 September 2000     

Effect of incidence angle on the electrical parameters of vertical parallel junction silicon solar cell under frequency domain

The effect of incidence angle on the electrical parameters of vertical parallel silicon solar cell under frequency domain was theoretically analyzed. Based on the diffusion-recombination equation, the expression of excess minority carrier density in the base was established according to the modulation frequency and the illumination incidence angle. The excess minority carrier density, the photocurrent density, the photo voltage, series resistance, shunt resistance, electric power and the space charge region capacitance were calculated and plotted. The objective of this work was to show the effects of solar cell modulation frequency and the illumination incidence angle on these electrical parameters, electric power and space charge region capacitance. Plots of solar cell’s electric power with the junction recombination velocity gave the maximum solar cell’s electric power; Pm. Influence of various parameters of incidence angles on the solar cell’s electric power was also studied.     

X-ray photoelectron spectroscopic studies of black silicon for solar cell

The black silicon has been produced by plasma immersion ion implantation (PIII) process. The microstructure and optical reflectance are characterized by field emission scanning electron microscope and spectrophotometer. Results show that the black silicon appears porous or needle-like microstructure with the average reflectance of 4.87% and 2.12%, respectively. The surface state is investigated by X-ray photoelectron spectroscopy (XPS) technique. The surface of the black silicon is composed of silicon, carbon, oxygen and fluorine element. The formation of Si_xO_yF_z in the surface of black silicon can be proved clearly by the O 1s, F 1s and Si 2p XPS spectra. The formation mechanism of the black silicon produced by PIII process can be obtained from XPS results. The porous or needle-like structure of the black silicon will be formed under the competition of SF_x⁺ (x ≤ 5) and F⁺ ions etching effect, Si_xO_yF_z passivation and ion bombardment.     

New optical features to enhance solar cell performance based on porous silicon surfaces

Electrochemical etching is used to fabricate porous silicon (PS) surfaces for both sides of the Si wafer. The effect of PS on performance of Si solar cells is investigated and the reflected mirrors are manipulated to enhance solar cell efficiency. The process is promising for solar cell manufacturing due to its simplicity, lower cost and suitability for mass production. The PS surface has discrete pores and short-branched pores on the polished wafer side. In contrast, the etched backside of the wafer has smaller pore size, with random pores. PS formed on both sides has lower reflectivity value compared with results in other works. Solar cell efficiency is increased to 15.4% with PS formed on both sides compared with the unetched sample and other results. Using empirical models, the optical properties of the refractive index and the optical dielectric constant are investigated. The porous surface texturing properties could enhance and increase the conversion efficiency of porous Si solar cells. The obtained results are in agreement with experimental and other data.     

Porous silicon templates for electrodeposition of nanostructures

We report the fabrication and characterization of porous silicon templates for electrodeposition of high aspect ratio one-dimensional metallic nanostructures (nanowires/nanoparticles) in them. Even though nanostructures/nanowires in the past have been fabricated in alumina, polymer or silica templates, the advantages of this approach are the possibility for seamless integration of nanostructures with other silicon components, and silicon based sensors because of better physical and electrical interconnection between the nanostructure and the silicon substrate. In this work, fabrication and characterization of nanowires/nanostructures such as single-segment Ni–Fe and Au and two-segment Ni–Fe/Au electrodeposited in the porous silicon template are presented. The templates with ordered and controlled nanometer-sized pores, 40 nm and 290 nm in diameter, were created through porous Si etching. The morphology, composition and structural characteristics of the template and of the single-segment Ni–Fe and Au and two-segment Ni–Fe/Au nanostructures of diameter 275±25 nm, length up to 100 μm and pitch of 1 μm were analyzed using scanning electron microscopy and X-ray diffraction techniques. The micrographs confirm that the plating parameters have a strong influence on morphology and composition of the structures. Further, the Ni–Fe images show the formation of both vertical and branched nanowires along with nanoparticles, from breakage/discontinuous growth of nanowires. Ni–Fe nanostructures were further analyzed for temperature-dependent magnetization and magnetization vs. magnetic field measurements using a commercial physical property measurement system. They reveal no magnetic anisotropy of the nanostructures probably due to a balance between ‘reduced’ shape anisotropy from branched and rough pore surfaces and magnetocrystalline anisotropy. PACS 61.46.+w; 75.75.+a; 81.07.-b; 81.16.Be