Absorption cross-sections and lifetimes as a function of size in Si nanocrystals embedded in SiO2

The photoluminescence (PL) emission yield of Si nanocrystals embedded in SiO₂ depends on their size and on Si–SiO₂ interface passivation. In this work we aim at clarifying the relative importance of both contributions by studying lifetimes and absorption cross-sections as a function of size, for samples with and without passivation in forming gas. We find that while the PL lifetime increases steadily (quasi-linear dependence), the radiative lifetime increases exponentially with the nanocrystal size. Thus, as expected, radiative oscillator strengths are much smaller for large nanocrystals, but this reduction is partially compensated by a less effective quenching at interfacial non-radiative states. The absorption cross-section per nanocrystal rises as the nanocrystal size decreases, for all excitation wavelengths, implying that the variation of oscillator strength dominates over the reduction of the density of states. Passivation processes do not affect the emission mechanism and increase the emission yield while reducing the density of non-radiative recombination centers at the Si–SiO₂ interface (P_b centers).     

Electron-phonon interaction in non-polar quantum dots induced by the amorphous polar environment

We propose a Fröhlich-type electron-phonon interaction mechanism for carriers confined in a non-polar quantum dot surrounded by an amorphous polar environment. Carrier transitions under this mechanism are due to their interaction with the oscillating electric field induced by the local vibrations in the surrounding amorphous medium. We estimate the corresponding energy relaxation rate for electrons in Si nanocrystals embedded in a SiO₂ matrix as an example. When the nanocrystal diameter is larger than 4 nm then the gaps between the electron energy levels of size quantization are narrow enough to allow for transitions accompanied by emission of a single local phonon having the energy about 140 meV. In such Si/SiO₂ nanocrystals the relaxation time is in nanosecond range.     

Interfacial reaction during dewetting of ultrathin silicon on insulator

We have studied the Si/SiO₂ interfacial reaction during solid-state dewetting of 7-nm-thick Si(001) ultrathin films on SiO₂ substrates. Immediately after formation of Si nanocrystals at the dewetting front, Si/SiO₂ interface depression occurs at the edge of the nanocrystal because of the interfacial reaction. By examining the Si/SiO₂ interface morphology for nanocrystals at different distances from the dewetting front, we found that the interface depth increases linearly with time. We also estimated that the effective activation energy for the interfacial depression is about 3.9 eV. Furthermore, we explain the effect of the interfacial reaction on the active morphological change involved in dewetting front propagation.     

Size control of Si nanocrystals by two-step rapid thermal annealing of sputtered Si-rich oxide/SiO2 superlattice

Controllable size of silicon (Si) nanocrystals can be achieved by a two-step rapid thermal annealing technique consisting of rapid annealing at 1000°C in nitrogen ambient and rapid oxidation at 600–800°C of a radio frequency magnetron co-sputtered Si-rich oxide/SiO₂ superlattice structure. The photoluminescence (PL) spectra related to Si nanocrystals were observed in the visible range (600–900 nm). After rapid oxidation, the size of the nanocrystals was reduced and the quality of the Si nanocrystal/SiO₂ interface was improved, resulting in a blue shift and an increase of the PL peak intensity. Finally, annealing in air increases the PL intensity further.     

Model of photoluminescence from ion-synthesized silicon nanocrystal arrays embedded in a silicon dioxide matrix

A four-level model of photoluminescence from Si nanocrystal arrays embedded in a SiO₂ matrix is suggested. The model allows for thermally activated transitions between singlet and triplet levels in the exchange-split energy state of an exciton in an excited silicon nanocrystal. An expression is derived for the temperature dependence of the intensity of photoluminescence monochromatic components. A correlation is found between the amount of splitting and the emitted photon energy by comparing model data with our experimental data for ion-synthesized Si nanocrystals in a SiO₂ matrix. The model explains the finiteness of the photoluminescence intensity at temperatures close to 0 K and the nonmonotonicity of the temperature run of the intensity.     

Formation of epitaxial SiC nanocrystals

Epitaxial 3C-SiC grains are formed at 1190 °C in the top region of silicon, when Si wafers coated by SiO₂ are annealed in CO atmosphere. The formed SiC grains are 40-50 nm high and 100 nm wide in cross-section and contain only few defects. Main advantage of the method is that the final structure is free of voids.The above method is further developed for the generation of SiC nanocrystals, embedded in SiO₂ on Si, and aligned parallel with the interface. The nanometer-sized SiC grains were grown into SiO₂ close to the Si/SiO₂ interface by a two-step annealing of oxide covered Si: first in a CO, than in a pure O₂ atmosphere. The first (carbonization) step created epitaxial SiC crystallites grown into the Si surface, while the second (oxidation) step moved the interface beyond them. Conventional and high resolution cross-sectional electron microscopy showed pyramidal Si protrusions at the Si/SiO₂ interface under the grains. The size of the grains, as well as their distance from the Si/SiO₂ interface (peak of pyramids) can be controlled by the annealing process parameters. The process can be repeated and SiC nanocrystals (oriented in the same way) can be produced in a multilevel structure.     

Quenching of Si nanocrystal photoluminescence by doping with gold or phosphorous

Si nanocrystals embedded in SiO₂ doped with P and Au at concentrations in the range of 1×10¹⁸-3×10²⁰ cm⁻³ exhibit photoluminescence quenching. Upon increasing the Au concentration, a gradual decrease in nanocrystal photoluminescence intensity is observed. Using a statistical model for luminescence quenching, we derive a typical radius of ∼3 nm for nanocrystals luminescing around 800 nm. Au doping also leads to a luminescence lifetime reduction, which is attributed to energy transfer between adjacent Si nanocrystals, possibly mediated by the presence of Au in the form of ions or nanocrystals. Doping with P at concentrations up to 3×10¹⁹ cm⁻³ leads to a luminescence enhancement, most likely due to passivation of the nanocrystal-SiO₂ interfaces. Upon further P doping the nanocrystal luminescence gradually decreases, with little change in luminescence lifetime.     

Substrate-induced stress in silicon nanocrystal/SiO2 multilayer structure

A Raman frequency upshift of nc-Si phonon mode is observed at room temperature, which is attributed to a strong compressive stress in Si nanocrystals. The 10-period amorphous-Si(3 nm)/amorphous-SiO₂ (3 nm) layers are deposited by high vacuum radio-frequency magnetron sputtering on quartz and sapphire substrates at different temperatures. The samples are then annealed in N₂ atmosphere at 1100 ℃ for 1 h for Si crystallization. It is demonstrated that the presence of a supporting substrate at the high grown temperature can induce different types of stresses in the Si nanocrystal layers. The strain is attributed to the difference in thermal expansion coefficient between the substrate and the Si/SiO₂ SL film. Such a substrate-induced stress indicates a new method to tune the optical and the electronic properties of Si nanocrystals for strained engineering.     

Ab-initio calculations of luminescence and optical gain properties in silicon nanostructures

Density-functional and many body perturbation theory calculations have been carried out in order to study the optical properties both in the ground and excited state configurations, of silicon nanocrystals in different conditions of surface passivation. Starting from hydrogenated clusters, we have considered different Si/O bonding geometries at the interface. We provide strong evidence that not only the quantum confinement effect but also the chemistry at the interface has to be taken into account in order to understand the physical properties of these systems. In particular, we show that only the presence of a surface Si–O–Si bridge bond induces an excitonic peak in the emission-related spectra, redshifted with respect to the absorption onset, able to provide an explanation for both the observed Stokes shift and the near-visible PL experimentally observed in Si-nc. For the silicon nanocrystals embedded in a SiO₂ matrix, the optical properties are discussed in detail. The strong interplay between the nanocrystal and the surrounding host environment and the active role of the interface region between them is pointed out, in very good agreement with the experimental results. For each system considered, optical gain calculations have been carried out giving some insights on the system characteristics necessary to optimize the gain performance of Si-nc. To cite this article: E. Degoli et al., C. R. Physique 10 (2009).     

Design of a nanoscale silicon laser

The recent observation of optical gain from silicon nanocrystals embedded in SiO₂ opens an opportunity to develop a nanoscale silicon-based laser. However, the challenge remains to design and develop a laser architecture using CMOS-compatible materials. In this paper we present two designs for a waveguide laser in which silicon nanocrystals embedded in SiO₂ are used as the optical gain media. One design employs a SiO₂ membrane containing encapsulated Si nanocrystals. Preliminary calculations given here show that a highly resonant laser cavity can be produced in a SiO₂ membrane using sub-wavelength structures. This photonic crystal architecture, used to guide and contain the light, can be combined with a gain medium of optically active Si nanocrystals synthesized in the SiO₂ membrane using ion implantation/thermal annealing to produce a Si-based laser. The laser cavity dimensions can be matched to the near-infrared wavelengths where optical gain has been observed from Si nanocrystals. The second design utilizes silicon nanocrystals embedded in a distributed-feedback laser cavity fabricated in SiO₂. Lasing action over a broad wavelength range centered at ∼770 nm should be possible in both of these configurations. Received: 20 December 2002 / Accepted: 7 January 2003 / Published online: 11 April 2003 RID="*" ID="*"Corresponding author. Fax: +1-434/982-2037, E-mail: supriya@virginia.edu     

Cooling dynamics of self‐assembled monolayer coating for integrated gold nanocrystals on a glass substrate

Picosecond time‐resolved X‐ray diffraction has been used to study the nanoscale thermal transportation dynamics of bare gold nanocrystals and thiol‐based self‐assembled monolayer (SAM)‐coated integrated gold nanocrystals on a SiO₂ glass substrate. A temporal lattice expansion of 0.30–0.33% was observed in the bare and SAM‐coated nanocrystals on the glass substrate; the thermal energy inside the gold nanocrystals was transported to the contacted substrate through the gold–SiO₂ interface. The interfacial thermal conductivity between the single‐layered gold nanocrystal film and the SiO₂ substrate is estimated to be 45 MW m^?2 K^?1 from the decay of the Au 111 peak shift, which was linearly dependent on the transient temperature. For the SAM‐coated gold nanocrystals, the thermal dissipation was faster than that of the bare gold nanocrystal film. The thermal flow from the nanocrystals to the SAM‐coated molecules promotes heat dissipation from the laser‐heated SAM‐coated gold nanocrystals. The thermal transportation of the laser‐heated SAM‐coated gold nanocrystal film was analyzed using the bidirectional thermal dissipation model.     

Finite Element Analysis of CoSi2 Nanocrystals on Si(001)

In this work we present a finite element analysis of pyramidal and hut-shaped CoSi₂ nanocrystals reactively deposited onto Si(001) substrates. These dots have been observed by us, as well as by other groups. Our analyses have yielded four major conclusions: (1) Elastic relaxation of CoSi₂/Si mismatch strain by three-dimensional islands drives their nucleation, rendering flat, two-dimensional, layer energetically unfavourable. (2) The effect of the nanocrystal surface and interface energies for the observed vertical aspect ratios is negligible at small nanocrystal volumes. (3) Pyramids and huts with identical vertical aspect ratios are energetically degenerate. (4) Nanocrystal growth is only energetically favourable if accompanied by an increase in vertical aspect ratio. Most of these conclusions are consistent with those found in compressively strained layers, such as Si_1?x Ge _x layers on Si.     

Temperature programmed desorption studies of deuterium passivated silicon nanocrystals

As grown silicon (Si) surfaces are known to reconstruct in order to reduce the number of dangling bonds. Surface reconstructions of hydride-terminated Si(1 0 0) and Si(1 1 1) surfaces have already been extensively studied using temperature programmed desorption (TPD). The surfaces of nanocrystals, are yet to be probed using TPD. Si nanocrystals less than 8 nm and ranging from 50 to 200 nm in diameter are grown on SiO₂ surfaces in an ultra high vacuum chamber and the as grown surfaces are exposed to atomic deuterium. Desorption spectra are interpreted using analogies to Si(1 0 0). TPD spectra show that that the nanocrystals surfaces are covered by a mix of monodeuteride, dideuteride and trideuteride species. Monodeuteride species can be isolated by selectively annealing away the dideuteride and trideuteride, monodeuteride and dideuteride species can be isolated by annealing away the trideuteride. The relative populations of the deuterides depend on particle size, and their manner of filling on nanoparticles differs from that for extended surfaces. Etching of the nanocrystal surface is observed during TPD, which is a confirmation of the presence of trideuteride species on the nanocrystal surface.     

Preparation of size controllable copper nanocrystals for nonvolatile memory applications

A method of fabricating Cu nanocrystals embedded in SiO2 dielectric film for nonvolatile memory applications by magnetron sputtering is introduced in this paper. The average size and distribution density of Cu nanocrystal grains are controlled by adjusting experimental parameters. The relationship between nanocrystal floating gate micro-structure and its charge storage capability is also discussed theoretically.     

Photoluminescence and charge storage characteristics of silica nanocrystals: The role of stress-induced interface defects

SiO₂ nanocrystals embedded in Lu₂O₃ thin film were fabricated using pulsed-laser deposition method. Two dimensional finite element calculations clearly reveal that SiO₂ nanocrystals certainly experienced great compressive stress in Lu₂O₃ thin film. This may lead to a great deal of stress-induced defects at the interface of SiO₂ nanocrystals embedded in Lu₂O₃ thin film and thus induced the observed photoluminescence peak and charge storage properties. The findings presented here indicate that the matrix environment of the nanocrystals plays a significant role in determining their electrical and optical properties.     

镶嵌在SiO2薄膜中InAs纳米颗粒的Raman散射

对镶嵌在SiO₂薄膜中纳米InAs颗粒的Raman散射谱进行了研究.与大块InAs晶体相比,InAs纳米颗粒的Raman散射谱具有相似的特征,即由纵光学声子模和横光学声子模组成,但是散射峰宽化并红移.用声子限域效应解释了散射峰的红移现象,并结合InAs纳米颗粒的应力效应解释了红移量与理论值的差异. 关键词： 2薄膜')" href="#">SiO₂薄膜 InAs量子点 Raman散射     

Correlation of size and oxygen bonding at the interface of Si nanocrystal in Si–SiO2 nanocomposite: A Raman mapping study

Raman spectroscopy/mapping is used to investigate the variation of Si phonon wavenumbers, i.e., lower wavenumber (LW ~ 495–510 cm⁻¹) and higher wavenumber (HW ~ 515–519 cm⁻¹) phonons, observed in Si–SiO₂ multilayer nanocomposite (NCp) grown using pulsed laser deposition. Sensitivity of Raman spectroscopy as a local probe to surface/interface is effectively used to show that LW and HW phonons originate at surface (Si–SiO₂ interface) and core of Si nanocrystals, respectively. The consistent picture of this understanding is developed using Raman spectroscopy monitored laser heating/annealing and cooling experiment at the site of the desired wavenumber, chosen with the help of Raman mapping. Raman spectra calculations for Si₄₁ cluster with oxygen and hydrogen termination show strong mode at 512 cm⁻¹ for oxygen terminated cluster corresponding to the vibration of surface Si atoms. This supports our attribution of LW phonons to be originating at the Si–SiO₂ surface/interface. These results along with XPS show that nature of interface (oxygen bonding) in turn depends on the size of nanocrystals and LW phonons originate at the surface of smaller Si nanocrystals. The understanding developed can conclude the ongoing debate on large variation in Si phonon wavenumbers of Si–SiO₂ NCps in the literature. Copyright © 2015 John Wiley & Sons, Ltd.     

Si-based solid blue emitters from 3C-SiC nanocrystals

A procedure for preparing 3C-SiC/SiO₂ composite nanocrystals embedded in Si matrix that emit blue light is reported. Through electrochemical etching of polycrystalline 3C-SiC wafers followed by ultrasonic treatment in water bath, we fabricated luminescent colloidal 3C-SiC nanocrystals. Porous Si samples that have been naturally oxidized in air for 12 h were immersed in agitated aqueous suspension of 3C-SiC nanocrystals for 10 min and then dried in air, followed by annealing in argon atmosphere to form core-shell structured 3C-SiC/SiO₂ nanocrystals embedded in Si matrix. Our result shows that the luminescence of 3C-SiC/SiO₂ composite nanocrystals is very stable over time or under high temperature. As robust and stable Si-based solid blue-emitters, they have important implications for engineering photonic components in optoelectronics and photonics. PACS 78.67.Bf; 78.55.Hx; 78.66.Sq     

Electrical behavior of size-controlled Si nanocrystals arranged as single layers

A metal–oxide–semiconductor structure containing a single layer of size-controlled silicon nanocrystals embedded into gate oxide was fabricated. Size control for the silicon nanocrystals was realized by using a SiO₂/SiO/SiO₂ layer structure with the embedded SiO layer having the thickness of the desired Si nanocrystals and using a high-temperature annealing for forming the silicon nanocrystals. Current–voltage, capacitance–voltage, and conductance–voltage characteristics were measured for a sample containing 4-nm-sized crystals. From the Fowler–Nordheim plot an effective barrier height of 1.6 eV is estimated for our silicon nanocrystals. Electron trapping, storing, and de-trapping in silicon nanocrystals were observed by capacitance–voltage and conductance–voltage measurements. The charge density was measured to be 1.6×10¹² /cm², which is nearly identical to the silicon-nanocrystal density measured approximately via a transmission electron microscopy image. Conductance measurements reveal a very low interface charge of our structure. PACS 72.80.Sk; 73.63.Bd; 73.40.Qv     

Soft X-ray fluorescence and photoluminescence of Si nanocrystals embedded in SiO2

We have used ion-beam mixing to form Si nano-crystals in SiO₂ and SiO₂/Si multilayers, and applied photoluminescence and soft-X-ray emission spectroscopy to study the nanoparticles. Ion-beam mixing followed by heat treatment at 1100 °C for 2 h forms the Si nanocrystals. The ion-beam-mixed sample shows higher PL intensity than that of a Si-implanted SiO₂ film. Photon and electron-excited Si L_2,3 X-ray emission measurements were carried out to confirm the formation of Si nanocrystal in SiO₂ matrix after ion-beam mixing and heat treatment. It is found that Si L_2,3 X-ray emission spectra of ion-beam-mixed Si monolayers in heat-treated SiO₂ films lead to noticeable changes in the spectroscopic fine structure. Received: 20 November 1999 / Accepted: 17 April 2000 / Published online: 5 October 2000