Large-format fabrication by two-photon polymerization in SU-8

Microporous structures are central to many fields of science and engineering, but many of these systems are complex with little or no symmetry and are difficult to fabricate. We applied two-photon polymerization (2PP) and femtosecond laser direct-writing techniques to fabricate broad-area large-format 3D microporous structures (450 μm × 450 μm × 40 μm) in the epoxy-based photoresist SU-8. The appropriate exposure was determined by controlling average pulse energies and stage speeds to generate the exposure curves. Mechanical distortion exhibited in suspended walls fabricated by 2PP laser writing was studied by controlling wall lengths and widths. A simple thermal-expansion model is presented to explain the distortion caused by axial loadings of the walls.     

Cost-effective SU-8 micro-structures by DUV excimer laser lithography for label-free biosensing

Cost-effective SU-8 micro-structures on a silicon substrate were developed using 248 nm excimer laser KrF projection, studying the influence of the different variables on the final pattern geometry, finding out that the most critical are exposure dose and post-bake condition. Also a novel and cost effective type of photomask based on commercial polyimide Kapton produced by 355 nm DPSS laser microprocessing was developed, studying the influence of the cutting conditions on the photomask. Finally, as a likely application the biosensing capability with a standard BSA/antiBSA immunoassay over a 10 × 10 micro-plates square lattice of around 10 μm in diameter, 15 μm of spacing and 400 nm in height was demonstrated, finding a limit of detection (LOD) of 33.4 ng/ml which is in the order of magnitude of bioapplications such as detection of cortisol hormone or insulin-like growth factor. Low cost fabrication and vertical interrogation characterization techniques lead to a promising future in the biosensing technology field.     

Direct removal of SU-8 using focused laser writing

SU-8 photoresist is an important material used in the development of micro-devices [1]. Cross-linked SU-8 structures have been known for their thermal stability and their strong resistance to standard solvent, acid and base. Due to the inert properties of this polymer, it is difficult to further modify or remove SU-8 once it is completely cured. We report an effective process to pattern cured SU-8 photoresist on glass using focused laser beam. Laser fabrication has been an important tool in various fields of research [2]. We made use of this laser cutting method to create interesting and useful two-dimensional SU-8 structures. The shapes and sizes of the structures created can be controlled by varying the power of the laser, angle of incident of the focused laser beam, the relative speed with which the laser beam traverse through the SU-8 film and the magnification of objective lens used. Besides two-dimensional structures, we can also create three-dimensional structures. In this case, we made use of a combination of controlled depth cutting and undercutting where focused laser beam is transmitted through the transparent substrate. Some possible applications of the laser patterned SU-8 film are also demonstrated in this work. PACS 42.62-b; 42.82.Cr; 79.60.Fr; 79.20.Ds; 78.66.-w     

SU-8光栅结构中的液晶激光特性

设计制作了SU-8光栅结构的染料掺杂手性向列相液晶激光器件,在器件正面和侧面均实现了随机激光辐射。将激光染料PM597、手性剂S-811、向列性液晶TEB30A按一定比例均匀混合,注入反平行摩擦处理的液晶盒中,器件的下基板通过光掩模法刻蚀出周期为15μm的光栅。利用532 nm的Nd∶YAG固体脉冲激光器作为泵浦源,器件的侧面既在580～590 nm范围内出现了多个离散分立的随机激光辐射峰,FWHM约0.19 nm,又在579～585 nm范围内出现独立的两个激光辐射峰,FWHM约0.19 nm;在器件正面获得了584～590 nm范围的随机激光辐射谱,FWHM约0.17 nm。加热器件至61℃,液晶相变为各向同性态,器件侧面仍出现了波长约590.60 nm、FWHM约0.24 nm的激光辐射峰。分析得出,液晶盒中引入SU-8光栅结构后,光子同时在液晶分子间多重散射和SU-8光栅中布拉格反射获得反馈放大,两种机制相辅相成。器件侧面出现的独立激光辐射峰主要由SU-8光栅布拉格反射提供反馈放大形成,而器件侧面和正面的随机激光辐射峰主要由液晶分子间多重散射提供反馈放大形成。     

基于NOA73微球与SU-8微柱的微探针制作

集成紫外固化胶NOA73微球与SU-8微柱制造的亚毫米探针,可以作为关键部件应用于三坐标测量机。NOA73微球通过NOA73对其他溶液的界面张力形成,柱子由深紫外光穿过微球曝光SU-8形成。这种新技术利用甘油补偿NOA73与空气折射率差,使得紫外光透过NOA73微球后保持接近平行。最终得到高深宽比的探针结构,高度超过1 200 m,微柱侧壁与基底呈89。     

基于NOA73微球与SU-8微柱的微探针制作

集成紫外固化胶NOA73微球与SU-8微柱制造的亚毫米探针,可以作为关键部件应用于三坐标测量机。NOA73微球通过NOA73对其他溶液的界面张力形成,柱子由深紫外光穿过微球曝光SU-8形成。这种新技术利用甘油补偿NOA73与空气折射率差,使得紫外光透过NOA73微球后保持接近平行。最终得到高深宽比的探针结构,高度超过1 200 m,微柱侧壁与基底呈89。     

表面镀金SU-8微柱的低频电动旋转特征

依据传统Maxwell-Wagner界面极化理论, 金属微纳米粒子由于具有极高电导率, 在旋转电场作用下无明显电旋转运动. 然而, 本文针对镀金SU-8微柱开展实验研究, 发现镀金微柱在低频条件下的快速旋转运动现象. 据此, 通过考虑镀金微柱表面双电层效应, 理论分析并实验验证镀金微柱的低频电旋转特征. 首先, 建立电场中微柱的近似椭球模型, 分析固-液接触面双电层作用下的金属粒子极化机理, 推导旋转电场作用下镀金微柱的转矩公式及电旋转角速度公式. 其次, 搭建实验平台, 分别对镀金微柱在三种不同电导率溶液、100 Hz–30 MHz频率范围内的电旋转特征进行对比实验研究. 最后, 对实验结果进行分析和讨论, 并通过考虑镀金微柱与基底之间摩擦作用等因素, 验证实验研究与理论研究的一致性. 关键词： 表面镀金微柱 电旋转 双电层 微流控     

Efficient and mild room temperature reduction of benzophenones under ultrasound irradiation

Benzophenones without strong electron-releasing substituents were reduced into the corresponding benzhydrols at room temperature in moderate to good yields with Zn-NaOH-95% ethanol under ultrasound irradiation. This method is also propitious to the synthesis of 3-phenylphthalide and its derivates.     

Physico-chemical behavior of carbon materials under high temperature and ion irradiation

Carbon/carbon (C/C) composites have been chosen for the conception of the thermal shield of the “Solar Probe” space mission. To understand their behavior under solar aggressions (high temperature and ion irradiation) and know the possible interactions with the shipped-in instruments, these materials are tested in a facility that allows to partially simulate the solar environment and to carry out in situ measurements. The mass loss rate of the materials is recorded and the composition and distribution of the ejected species are followed using an opened source mass spectrometer and a post-treatment XPS analysis of the condensed species on a gold-plated copper target is also performed. Besides this, the sputtering processes of graphite at high temperature and ion irradiation have been theoretically investigated in order to understand the main parameters that can influence the erosion of the material and predict accurately the physico-chemical behavior of the C/C composites.     

Room temperature photoluminescence of BCT prepared by Complex Polymerization Method

It was used the Complex Polymerization Method to synthesize barium calcium titanate powders (BCT). Crystalline Ba_0.8Ca_0.2TiO₃ perovskite-type phase could be identified by X-ray diffraction and confirmed by Raman spectroscopy in the powders heat treated at 600 °C. Inherent defects, linked to structural disorder, facilitate the photoluminescence emission. The photoluminescent emission peak maximum was around of 533 nm (2.33 eV) for the Ba_0.8Ca_0.2TiO₃. The photoluminescence process and the band emission energy photon showed dependence of both the structural order–disorder and the thermal treatment history. The results revealed that Ba_0.8Ca_0.2TiO₃ (BCT20) is a highly promising candidate material for optical applications.     

SU-8光刻胶应变分布光学全场检测方法

由于SU-8光刻胶的内应力将会影响高深宽比结构的全金属光栅的制作质量,本文针对近年来SU-8光刻胶应力测量困难的情况,提出了一种基于激光剪切散斑干涉技术的SU-8光刻胶应变分布测量的新方法。该方法通过对被测胶体加载前后两幅干涉图像的处理,直接得到被测胶体结构的全场应变分布情况,由胶体的应变变形数据即可反映出内应力的变化和分布趋势。同时使用ANSYS有限元分析软件对同一被测胶体进行应变仿真模拟研究,获得胶体结构的变形场仿真数据。组建了实验系统,进行了实验验证,结果表明:实际测量变形量约为1.189μm,仿真的最大变形量为1.088μm,测量误差在允许范围内,且测量的形变趋势与仿真模拟结果相一致,表明激光剪切散斑干涉技术可应用于SU-8光刻胶的应变分布全场无损检测。     

SU-8去胶工艺对电铸Ni材料力学性能的影响（英）

SU-8负胶具有优异的力学性能、抗化学腐蚀性、热稳定性和生物兼容性,在MEMS工艺和器件中得到广泛应用。镍金属具有良好的力学性能和抗腐蚀性,因此常用来制作MEMS器件。在MEMS执行器中,弹性元件常采用电铸镍制作。SU-8经过经曝光显影后形成致密的交联网络结构是一种高分子聚合物,这种聚合物非常稳定,不溶于强酸强碱及常见的有机溶剂,尤其是在电铸金属结构后的SU-8胶的去除更为困难。目前的SU-8去胶技术,按去胶原理可分：机械物理去胶技术和氧化去胶技术。氧化去胶技术可以有效去除SU-8胶,但氧化去胶方法不同程度地损坏电铸金属,使其力学性能与去胶前相比发生显著的变化。因此需要研究去胶对Ni金属弹性模量的影响,从而为执行机构设计提供准确的基本数据。针对目前运用比较普遍的两种去除SU-8胶方式：微波等离子下游化学刻蚀和强碱熔盐浴,分别进行了去胶实验,对去胶前后的电铸Ni金属进行了弹性模量和硬度测试。实验结果表明,电铸镍的杨氏模量在经过微波等离子下游化学刻蚀后下降18%,而经过强碱熔盐浴后下降36%,但硬度下降不明显。     

SU-8去胶工艺对电铸Ni材料力学性能的影响（英文）北大核心CSCD

SU-8负胶具有优异的力学性能、抗化学腐蚀性、热稳定性和生物兼容性,在MEMS工艺和器件中得到广泛应用。镍金属具有良好的力学性能和抗腐蚀性,因此常用来制作MEMS器件。在MEMS执行器中,弹性元件常采用电铸镍制作。SU-8经过经曝光显影后形成致密的交联网络结构是一种高分子聚合物,这种聚合物非常稳定,不溶于强酸强碱及常见的有机溶剂,尤其是在电铸金属结构后的SU-8胶的去除更为困难。目前的SU-8去胶技术,按去胶原理可分:机械物理去胶技术和氧化去胶技术。氧化去胶技术可以有效去除SU-8胶,但氧化去胶方法不同程度地损坏电铸金属,使其力学性能与去胶前相比发生显著的变化。因此需要研究去胶对Ni金属弹性模量的影响,从而为执行机构设计提供准确的基本数据。针对目前运用比较普遍的两种去除SU-8胶方式:微波等离子下游化学刻蚀和强碱熔盐浴,分别进行了去胶实验,对去胶前后的电铸Ni金属进行了弹性模量和硬度测试。实验结果表明,电铸镍的杨氏模量在经过微波等离子下游化学刻蚀后下降18%,而经过强碱熔盐浴后下降36%,但硬度下降不明显。     

Simulation of temperature distribution in skin under laser irradiation with different wavelengths

With the help of numerical calculations of the finite element method, we simulate the distributions of the temperature in skin after laser irradiation with four wavelengths, 532 nm, 694 nm, 755 nm, and 800 nm, respectively. Combined metabolism of the organism with the traditional Pennes equation, the induced thermal effect in tissue is expressed. The simulated results show that the temperature in the irradiation center decreases as the increase of the wavelength for the same irradiation duration, and the relationships of the distribution of temperature and the wavelength along the radial and longitudinal directions are different.     

Strain measurement of SU-8 photoresist by a digital image correlation method with a hybrid genetic algorithm

Digital image correlation (DIC) is a whole-field and non-contact strain measuring method. It could provide deformation information of a specimen by processing two digital images that are captured before and after the deformation. To search the deformed images, a hybrid genetic algorithm, in which a simulated annealing mutation process and adaptive mechanisms are added to the real-parameter genetic algorithm, is proposed in this work. To increase the accuracy and reliability of this method, some key parameters of this method are suggested. Then, this method is used to measure the strain during the micro tensile testing of SU-8 photoresist. In addition to the conventional single region, a double region is proposed to calculate the strain by DIC. The results indicate that while the strains obtained by single region are reasonable, those obtained by double region are accurate. Also the mechanical properties of SU-8 could be accurately obtained.     

Evaluation of nanoscale roughness measurements on a plasma treated SU-8 polymer surface by atomic force microscopy

A comparison between roughness data obtained with an atomic force microscope (AFM) on different surfaces requires reliable roughness parameters. In order to specify the appropriate parameters for nanoscale roughness measurements, we compared the root mean square (rms) roughness and the relative surface area (sdr) as function of varying scan size, speed and pixel size. By using oxygen plasma (24 kJ) treated SU-8 with an average rms roughness of 2.6 ± 0.5 nm as reference surface, the repeatability of the method was evaluated for dynamic (tapping) and contact mode. The evaluation of AFM images indicated a decrease of the effective tip radius after a few measurements. This degradation of the tip lowers the resolution of the image and can affect roughness measurements.     

Ultrafast temperature relaxation evolution in Au film under femtosecond laser pulses irradiation

Ultrafast temperature relaxation processes in Au film including two temperature relaxation and thermal diffusion relaxation with femtosecond laser pulse excitation were investigated numerically by Finite Element Method (FEM). With the temperature dependent thermal parameters, the full 2D temperature field evolution in picosecond and nanosecond domains were obtained. It is proposed that the heat transfer depth can be alternatively localized or enhanced by the distinct temperature relaxation mechanisms. Moreover, the effect of laser parameters and Au film thickness and surface reflectivity on the two temperature relaxation time were analysed.     

激光辐照下红外测温的误差补偿方法研究

为了提高激光辐照下加热点处红外测温精度,建立了多变量测温补偿模型,研究了测量距离、测量角度与测量精度的关系。采用单一变量与正交变量结合的方法,建立关于测量距离与测量角度的二元变量补偿模型,并进行误差补偿模型验证实验。结果表明:补偿模型与实际测量结果可以较好地匹配,补偿后测量误差为±1.25%,与补偿之前相比测量精度提高64.25%,验证了补偿模型的正确性,为激光辐照下加热点温度红外测量提供理论指导。     

Fabrication of single-mode ridge SU-8 waveguides based on inductively coupled plasma etching

In this paper, a systematic study has been performed for the etching of negative photoresist SU-8 2005 using inductively coupled plasma. The etching rate, vertical profile, surface and sidewall roughness of the waveguide were investigated as a function of the chamber pressure, the bias power, the antenna power, the ratio of flow rate of Ar to O₂, and the etching time. The etching parameters were studied in detail and optimized to minimize the surface roughness in etched areas. Ridge MZI waveguides with SU-8 2005 were fabricated under the optimized etching conditions, resulting in smooth and almost vertical patterns. The waveguides showed single-mode propagation at 1550 nm wavelength and low propagation loss of less than 1.565 dB/cm, which was similar to the waveguides fabricated by the wet-etching technique.