First-Principles Study of Intrinsic Point Defects of Monolayer GeS

The properties of six kinds of intrinsic point defects in monolayer GeS are systematically investigated using the“transfer to real state”model,based on density functional theory.We find that Ge vacancy is the dominant intrinsic acceptor defect,due to its shallow acceptor transition energy level and lowest formation energy,which is primarily responsible for the intrinsic p-type conductivity of monolayer GeS,and effectively explains the native p-type conductivity of GeS observed in experiment.The shallow acceptor transition level derives from the local structural distortion induced by Coulomb repulsion between the charged vacancy center and its surrounding anions.Furthermore,with respect to growth conditions,Ge vacancies will be compensated by fewer n-type intrinsic defects under Ge-poor growth conditions.Our results have established the physical origin of the intrinsic p-type conductivity in monolayer GeS,as well as expanding the understanding of defect properties in lowdimensional semiconductor materials.     

Defect properties of CuCrO₂:A density functional theory calculation

Using the first-principles methods,we study the formation energetics properties of intrinsic defects,and the charge doping properties of extrinsic defects in transparent conducting oxides CuCrO2.Intrinsic defects,some typical acceptortype,and donor-type extrinsic defects in their relevant charge state are considered.By systematically calculating the formation energies and transition energy,the results of calculation show that,V Cu,O i,and O Cu are the relevant intrinsic defects in CuCrO2 ;among these intrinsic defects,V Cu is the most efficient acceptor in CuCrO2.It is found that all the donor-type extrinsic defects have difficulty in inducing n-conductivity in CuCrO2 because of their deep transition energy level.For all the acceptor-type extrinsic defects,substituting Mg for Cr is the most prominent doping acceptor with relative shallow transition energy levels in CuCrO2.Our calculation results are expected to be a guide for preparing promising n-type and p-type materials in CuCrO2.     

Defect properties of CuCrO2: A density functional theory calculation

Using the first-principles methods,we study the formation energetics properties of intrinsic defects,and the charge doping properties of extrinsic defects in transparent conducting oxides CuCrO2.Intrinsic defects,some typical acceptortype,and donor-type extrinsic defects in their relevant charge state are considered.By systematically calculating the formation energies and transition energy,the results of calculation show that,V Cu,O i,and O Cu are the relevant intrinsic defects in CuCrO2 ;among these intrinsic defects,V Cu is the most efficient acceptor in CuCrO2.It is found that all the donor-type extrinsic defects have difficulty in inducing n-conductivity in CuCrO2 because of their deep transition energy level.For all the acceptor-type extrinsic defects,substituting Mg for Cr is the most prominent doping acceptor with relative shallow transition energy levels in CuCrO2.Our calculation results are expected to be a guide for preparing promising n-type and p-type materials in CuCrO2.     

基于密度泛函理论下O和Na掺杂单层h-BN的电子结构性质和光学效应的分析

基于密度泛函理论的第一性原理方法研究了O、Na单掺杂及O和Na共掺杂单层h-BN的形成能、电子结构和光学性质.结果表明:单掺杂体系中,O掺杂N位置、Na掺杂B位置时,掺杂形成能最低;共掺杂体系中,O和Na邻位掺杂,掺杂形成能最低.与单层h-BN相比,引入杂质原子后的体系禁带宽度均减小,其中O掺杂为n型掺杂,Na掺杂为p型掺杂,而O和Na共掺h-BN体系为直接带隙材料,有利于提高载流子的迁移率.在光学性质方面,Na掺杂h-BN体系与O和Na共掺h-BN的静介电常数均增大,在低能区介电虚部和光吸收峰均发生红移,其中Na掺杂体系红移最为显著,极化能力最强.因此Na单掺和O和Na共掺有望增强单层h-BN的光催化能力,可扩展其在催化材料、光电器件等领域的应用.     

Characterization of thermal, optical and carrier transport properties of porous silicon using the photoacoustic technique

In this work, the porous silicon layer was prepared by the electrochemical anodization etching process on n-type and p-type silicon wafers. The formation of the porous layer has been identified by photoluminescence and SEM measurements. The optical absorption, energy gap, carrier transport and thermal properties of n-type and p-type porous silicon layers were investigated by analyzing the experimental data from photoacoustic measurements. The values of thermal diffusivity, energy gap and carrier transport properties have been found to be porosity-dependent. The energy band gap of n-type and p-type porous silicon layers was higher than the energy band gap obtained for silicon substrate (1.11 eV). In the range of porosity (50-76%) of the studies, our results found that the optical band-gap energy of p-type porous silicon (1.80-2.00 eV) was higher than that of the n-type porous silicon layer (1.70-1.86 eV). The thermal diffusivity value of the n-type porous layer was found to be higher than that of the p-type and both were observed to increase linearly with increasing layer porosity.     

A first principle calculation of electronic and dielectric properties of electrically gated low-buckled mono and bilayer silicene

The structural, electronic and dielectric properties of mono and bilayer buckled silicene sheets are investigated using density functional theory. A comparison of stabilities, electronic structure and effect of external electric field are investigated for AA and AB-stacked bilayer silicene. It has been found that there are no excitations of electrons i.e. plasmons at low energies for out-of-plane polarization. While for AB-stacked bilayer silicene 1.48 eV plasmons for in-plane polarization is found, a lower value compared to 2.16 eV plasmons for monolayer silicene. Inter-band transitions and plasmons in both bilayer and monolayer silicene are found relatively at lower energies than graphene. The calculations suggest that the band gap can be opened up and varied over a wide range by applying external electric field for bilayer silicene. In infra-red region imaginary part of dielectric function for AB-stacked buckled bilayer silicene shows a broad structure peak in the range of 75–270 meV compared to a short structure peak at 70 meV for monolayer silicene and no structure peaks for AA-stacked bilayer silicene. On application of external electric field the peaks are found to be blue-shifted in infra-red region. With the help of imaginary part of dielectric function and electron energy loss function effort has been made to understand possible interband transitions in both buckled bilayer silicene and monolayer silicene.     

Optical investigation of ferromagnetic Ga1−xMnxN layers grown on sapphire (0 0 0 1) substrates

We have investigated the temperature-dependent photoluminescence (PL) spectra in Ga_1−xMn_xN layers (where x≈0.1–0.8%) grown on sapphire (0 0 0 1) substrates using the plasma-enhanced molecular beam epitaxy technique. All the layers doped with manganese exhibited n-type conductivity with Curie temperature over 350 K. The efficient PL are peaked in the red (1.86 eV), yellow (2.34 eV), and blue (3.29 eV) spectral range. It was found that the blue band at 3.29 eV is mostly associated with the formation complexes between donors (e.g., N vacancy) and Mn acceptors, which results in forming donor levels at 0.23 eV below the conduction band edge. The yellow band is attributed to intrinsic gallium defects. The broad band at 1.86 eV is attributed to inner ⁵D state transition (T₂ to E) of Mn ions.     

Selectively strong molecular adsorption on boron nitride monolayer induced by transition metal substrate

We studied adsorption of several molecules (CO, CO₂, H₂O, N₂O, NO, NO₂, and O₂) on hexagonal boron nitride (h-BN) monolayers supported on transition metal (TM) surfaces, using density functional calculations. We observed that all the molecules bind very weakly on the pristine h-BN, with binding energies in the range of 0.02–0.03 eV. Interestingly, however, when h-BN is supported on the TM surface, NO₂ and O₂ become strongly chemisorbed on h-BN, with binding energies of >1 eV, whereas other molecules still physisorbed, with binding energies of ～0.1 eV at most. The electron transfer from TM to p_z states of h-BN played a substantial role in such strong bindings of NO₂ and O₂ on h-BN, as these molecules possess unpaired electrons that can interact with p_z states of h-BN. Such selective molecular binding on h-BN/TM originates from the peculiar distribution of the spin-polarized highest occupied and lowest unoccupied molecular orbitals of NO₂ and O₂. Strong molecular adsorption and high selectivity would make the h-BN/TM system possible for a variety of applications such as catalysts and gas sensors.     

二维GeSe纳米片五族和七族原子掺杂的受主和施主杂质态

采用第一性原理的计算方法研究GeSe纳米片结构掺杂V和VII族元素对其电子结构、形成能和跃迁能级的影响.结果表明：无论是掺杂V族还是VII族元素,体系的形成能均随杂质半径的增加而增加.V族元素掺杂体系的跃迁能级随杂质原子半径的增加而降低,而VII元素掺杂的体系却随杂质原子半径的增加而增加.其中,F、Cl、Br和I的掺杂为n型施主浅能级杂质,而N、P和As掺杂为p型受体深能级杂质.为相关的实验研究提供了理论参考.     

Theoretical Studies on Defects of Kaolinite in Clays

Using the first-principles methods, we study the formation energeties and charge doping properties of the extrinsic substitutional defects in kaolinite. Especially, we choose Be, Mg, Ca, Fe, Cr, Mn, Cu, Zn as extrinsic defects to substitute for Al atoms. By systematically calculating the impurity formation energies and transition energy levels, we find that all group-Ⅱ defects introduce the relative shallow transition energy levels in kaolinite. Among them, MgAl has the shallowest transition energy level at 0.08 eV above the valence band maximum. The transition- elemental defects FeAl, CrAl, and MnAl are found to have relative low formation energies, suggesting their easy formation in kaolinite under natural surrounding conditions. Our calculations show that the defects CuAl and ZnAl have the high formation energies and deep transition energy levels, which exclude the possibility of their formation in natural kaolinite.     

ZnO中Li相关缺陷结构性质

采用第一性原理量子力学分子动力学方法,基于32个原子的超原胞模型,计算了ZnO中各种Li相关缺陷的有关几何和电子结构。通过不同模型的计算分析表明,ZnO中Li杂质在间隙位上的总能比替位Zn格位的能量更低,但却形成施主能级。进一步通过构造Li替Zn位Li_Zn与不同本征缺陷所构成的复合体结构,并对模拟计算的结果进行分析比较得出,O反位O_Zn可与Li_Zn形成比Li间隙位更稳定的复合体,可高溶解度地稳定存在于ZnO中,并在禁带中产生受主能级,是较好的p型导电性候选缺陷。     

Tuning the Schottky barrier in the arsenene/graphene van der Waals heterostructures by electric field

Using density functional theory calculations, we investigate the electronic properties of arsenene/graphene van der Waals (vdW) heterostructures by applying external electric field perpendicular to the layers. It is demonstrated that weak vdW interactions dominate between arsenene and graphene with their intrinsic electronic properties preserved. We find that an n-type Schottky contact is formed at the arsenene/graphene interface with a Schottky barrier of 0.54 eV. Moreover, the vertical electric field can not only control the Schottky barrier height but also the Schottky contacts (n-type and p-type) and Ohmic contacts (n-type) at the interface. Tunable p-type doping in graphene is achieved under the negative electric field because electrons can transfer from the Dirac point of graphene to the conduction band of arsenene. The present study would open a new avenue for application of ultrathin arsenene/graphene heterostructures in future nano- and optoelectronics.     

Structural,electronic properties and stability of Ag-doped GaAs nanowires: First-principles study

First-principles computations have been addressed to determine the effects of Ag substitution to the structural, electronic properties and stability of Ag-doped GaAs NW. Our results show that the substitutional Ag energetically prefers to substitute the surface Ga (E_f=−0.529 eV) under As-rich conditions and introduces a much shallow (0.19 eV above the Fermi) acceptor level, which is of typical p-type behavior. With the increase in the Ag concentration, the p-type character gradually weakens and n-type character arises. Thus, one can expect to synthesize Ag-doped GaAs NWs for p-type or n-type applications with the control of Ag concentration and its microarrangement.     

调控硼硫掺杂比实现金刚石n型转变的研究

金刚石半导体由于其特殊的机械性能使其在极端环境下有较广的应用前景. 虽然通过硼(B)元素掺杂较易得到p型金刚石半导体,但具有优异电学性能的n型半导体却鲜见报道. 硼、硫（S）原子因半径及外层电子互补,其协同掺杂易合成p型或n型半导体,但其物理机理尚不清晰.在课题组已有实验报道基础上,借助第一性原理探究了B-S不同比例单掺杂及共掺杂金刚石的形成能、晶体内的存在形式及电子结构,从原子尺度揭示了金刚石由p型向n型半导体转变的阈值掺杂比例. 通过实验与理论的对比发现B在晶格内趋向团聚,而过量的S掺杂则发生析出.     

Be,Mg,Mn掺杂CuInO_2形成能的第一性原理研究

研制开发新型的光电材料对促进社会经济发展具有重要的科学意义和实用价值.利用宽禁带CuInO_2铟基材料实现全透明光电材料是目前深入研究的热点.通过基于密度泛函的第一性原理计算方法,本文计算出掺杂元素Mg, Be, Mn在CuInO_2的形成能.计算结果表明,施主类缺陷(如掺杂元素替代Cu原子或进入间隙位置)由于较高的形成能和较深的跃迁能级,很难在CuInO_2材料中出现N型导电;而受主缺陷中,在氧原子化学势极大的情况下, Mg原子替代In能成为CuInO_2理想的受主缺陷.计算结果可为制备性能优异的CuInO_2材料提供指导.     

Contribution of Surface Defects to the Interface Conductivity of SrTiO_3/LaAlO_3

Based on the first-principles method,the structural stability and the contribution of point defects such as O,Sr or Ti vacancies on two-dimensional electron gas of n-and p-type LaAlO_3/SrTiO_3 interfaces are investigated.The results show that O vacancies at p-type interfaces have much lower formation energies,and Sr or Ti vacancies at n-type interfaces are more stable than the ones at p-type interfaces under O-rich conditions.The calculated densities of states indicate that O vacancies act as donors and give a significant compensation to hole carriers,resulting in insulating behavior at p-type interfaces.In contrast,Sr or Ti vacancies tend to trap electrons and behave as acceptors.Sr vacancies are the most stable defects at high oxygen partial pressures,and the Sr vacancies rather than Ti vacancies are responsible for the insulator-metal transition of n-type interface.The calculated results can be helpful to understand the tuned electronic properties of LaAlO_2/SrTiO_3 heterointerfaces.     

Surface photovoltage for real n- and p-type in the visible and near spectroscopy (110) CdTe surfaces infra-red spectral range

Surface photovoltage spectroscopy has been carried out on real n- and p-type (110) CdTe surfaces in the wavelength range 0.36-1 μm at room temperature (300 K), and at atmospheric pressure. The measurements show the existence of surface states at 1.3; 1.48, and 1.2; 1.46 eV within the energy gap of n- and p-type CdTe, respectively. Surface states greater than the energy gap at 2.24, 2.38, 2.68, and 3.1 eV have also been detected in n-type samples and at 1.66, 2.12, 2.69 eV in p-type samples.     

Theoretical and experimental investigation on structural and electronic properties of Al/O/Al,O-doped WS2

Effects of the doping atom (O, Al, and (Al, O)) on structural and electronic properties of the monolayer WS₂ have been studied by using first-principles calculations. Results show that the covalent character of W–S bonding has been enhanced after doping. Meanwhile, W–O, Al–S and W–S bonds of (Al, O) co-doped WS₂ monolayer have higher covalent character compared with O-doped and Al-doped WS₂ monolayer of this work. After doping with Al (or Al, O) atoms, Fermi level moves close to the valence band and the dopant atoms produce the defect energy levels, indicating that Al doped and (Al, O) co-doped WS₂ monolayer both have p-type conductivity. O-doped and (Al, O) co-doped WS₂ ultrathin films was prepared on Si substrates. Results of Raman spectra show the formation of the O-doped and (Al, O) co-doped WS₂ films. Moreover, compared with the pure WS₂, the approximate reduction of 0.43 eV and 0.46 eV for W 4f and S 2p in binding energy after (Al, O) co-doped shows that p-type doping of (Al, O) co-doped WS₂ has been verified.     

Efficient above-band-gap light emission in germanium Invited Paper

We report an above-band-gap radiative transition in the photoluminescence spectra of single crystalline Ge in the temperature range of 20-296 K. The temperature-independence of the peak position at ～0.74 eV is remarkably different from the behavior of direct and indirect gap transitions in Ge. This transition is observed in n-type, p-type, and intrinsic single crystal Ge alike, and its intensity decreases with the increase of temperature with a small activation energy of 56 meV. Some aspects of the transition are analogous to Ⅲ-Ⅴ semiconductors with dilute nitrogen doping, which suggests that the origin could be related to an isoelectronic defect.     

Influence of background carriers on magnetic properties of Mn-doped dilute magnetic Si

Using hybrid exchange density functional calculations we show that the type of background carriers has profound effects on magnetic interactions in Mn doped dilute magnetic Si. The p- and n-type Si were simulated by introducing an extra hole and an extra electron, respectively in the 64 atoms Si supercell. In case of p-type Si compensated by a homogeneous background potential and 1.6% Mn, the ground state is ferromagnetic, whereas other conditions remaining the same, the ground state becomes antiferromagnetic for the n-type Si. The exchange energies in Mn-doped extrinsic Si are higher by about 1 eV/Mn atom compared to the Mn doped intrinsic Si. Calculated electronic structures reveal that in p-type Si:Mn the hole localises over Mn and the short range magnetic coupling increases. Our calculations indicate that localisation of magnetic polarons at the Mn site is likely, which in turn enhances long range magnetic interaction between Mn ions and responsible for FM stabilisation. On the other hand, in the n-type host electron–electron repulsion increases within Mn–Si impurity band and the short range coupling decreases, which destroys the long range spin polarisation. These calculations explain the observed ferromagnetism in the p-type Si:Mn at higher temperatures than in the n-type Si:Mn and the magnetic moments of the systems compare well with experiments.