CI在Si和Ge(111)面上的化学吸附

考虑了Si(111)和Ge(111)面吸附Cl的几何构形,本文采用集团模型,用电荷自洽的EHMO方法,对Si(111)和Ge(111)面,分别用能量极小的原则,确定了Cl的化学吸附位置。计算结果表明,对于Si(111)面,Cl是在顶位被吸附,形成共价结合,与实验结果一致。对于Ge(111)面,计算表明在顶位和三度开位上都能吸附Cl,与以前结论有一些不同,但本文认为偏振光电子谱的实验结果并不能完全排除Cl在Ge(111)面上顶位吸附的可能性。希望有其他实验能对Cl在Ge(111)面上的吸附作进一步的观察。此外,还计算了Cl在Si(111)面顶位上的吸附和它在Ge(111)面三度开位上的吸附时的状态密度,和实验结果进行了比较,相符甚好。 关键词：     

NH_x(x=1～3)在金属Ir表面吸附与解离的第一性原理研究

采用密度泛函理论,在slab模型下,研究了NH_x(x=1~3)在Ir(100)、Ir(111)和Ir(110)表面上的最稳定吸附位置、几何构型以及逐步脱氢分解过程,计算了相应的吸附能和活化能.计算结果表明,在Ir(100)、Ir(111)面上,NH_3是以C_3轴垂直吸附在顶位,在Ir(110)上,NH_3是以N-Ir键与表面成68.6°吸附在顶位,且吸附能依赖于表面的结构而不同,相比而言,NH_3更容易吸附在开放表面Ir(100)、Ir(110)面上,说明NH_3在这些表面的吸附具有结构敏感性.NH_(x(x=1~3))的分解,在Ir(100),NH_3的吸附与分解存在竞争,在Ir(110)面NH_3最容易分解,在Ir(111)面NH_3是分子性吸附,不能分解.NH_2、NH在三个表面均能够分解,在Ir(110)面活化能均较高.     

AI在GaAs(110)面上的吸附

用电荷自洽的EHMO方法研究了Al在GaAs(110)面上的吸附问题。比较了两种吸附构型,从能量极小的观点定出了稳定的吸附应为Al取代表面Ga原子,使Ga落在表面As的悬挂键上。还计算了电荷转移、成键情况和状态密度。 关键词：     

Al吸附在Pt,Ir和Au的(111)面的低覆盖度研究

应用密度泛函理论,系统研究了Al原子在Pt(111),Ir(111)和Au(111)表面的桥位、顶位、三重面心立方(fcc)洞位和六角密排(hcp)洞位这四个典型位置的吸附情况. 主要计算了三吸附体系的几何结构、平均结合能和差分电荷密度,并系统讨论了相关原子的密立根电荷布居数和投影态密度.研究发现,对于Pt(111)和Ir(111)表面,Al原子在hcp洞位最稳定,但是对于Au(111)表面,Al原子在fcc洞位最稳定. 关键词： 吸附 密度泛函理论 结合能 电子结构     

Si,GaAs和LiNbO_3单晶的堵塞效应

我们利用背散射方法得到Si,GaAs和LiNbO_3单晶堵塞图,以及GaAs单晶{110},{100}和{112}面堵塞半角ψ_(1/2)值.并得到因离子注入受损伤Si片{110}面堵塞坑深度随注入剂量增加而变浅的结果。作为对实验装置和方法的检验,我们也得到了Si单晶堵塞图和测量了Si单晶{110},{111}和{100}晶面堵塞半角ψ_(1/2)值。     

吸附Al,Sn后Si(111)面的电子结构及其比较

通过对吸附原子和衬底Si原子由于相互作用而产生的轨道交叠占有几率(OOP)和集团态密度的分析发现吸附Al和吸附Sn的Si(111)面能带中电子的占据状态很不一样,Si(111)3^1/2×3^1/2-Sn中有一个半充满的表面带,从而使体系具有表面金属性。而Si(111)3^1/2×3^1/2-Al中电子填满吸附原子和表面Si原子成键的表面态,反键的表面态全空,因此吸Al后的Si(111)面可能出现半导体特性。计算结果与实验结果 关键词：     

硫在Fe(111)面吸附的密度泛函研究

采用基于密度泛函理论的第一性原理方法,系统研究了不同覆盖度下硫在Fe(111)表面的吸附构型和吸附特性,计算并分析了硫在Fe(111)表面的吸附能、电荷密度、分波态密度、电荷布局、电子局域化函数等数据.研究结果表明:S在Fe(111)面的H位吸附最稳定,并且吸附能随着覆盖度的增加而增加.另外,电子态密度、电子局域化函数和布局分析表明Fe、S之间呈较弱的共价键,这种作用力主要是Fe的3d轨道和S的3p轨道杂化所贡献,而随着覆盖度的增加,Fe、S之间的作用力逐渐减弱,这可能是由于S原子之间的排斥力减弱了Fe、S之间的作用.S在Fe(111)、Fe(110)和Fe(100)这三个晶面上吸附情况的对比分析发现,S与Fe(111)表面的相互作用最强,Fe(100)面次之,而Fe(110)面最弱.     

不同晶向SrTiO3上外延GaAs薄膜的光谱研究

利用MBE生长技术,成功地在不同晶向SrTiO3(100)(111)(110)衬底上生长了GaAs薄膜,利用显微Raman和荧光光谱（PL）对此进行了研究。实验结果表明,在不同晶向SrTiO3上生长的GaAs薄膜有不同的晶向和应力状态。荧光光谱（PL）研究表明在SrTiO3(100)(111)晶面上生长的GaAs薄膜的PL峰发生明显的蓝移。研究表明在SrTiO3(110)面上生长的GaAs薄膜和体单晶基本上一致,有更好的光学质量。     

碳化硅表面氢气吸附机理研究

在CVD沉积SiC过程中,载气体H2与沉积SiC基体表面的反应影响沉积速率和沉积产物品质,因此研究这些微观反应机理具有十分重要的科学意义和工程价值。本文基于第一性原理研究了H2在3C-SiC(111)（硅原子暴露面）和3C-SiC(-1-1-1)（碳原子暴露面）面的吸附位置、吸附能、电子结构和覆盖率等吸附情况。发现H2倾向于吸附在3C-SiC(111)面,H原子的最稳定吸附位为OT位（顶位）且属于化学吸附。H2在吸附时会自发解离为两个H原子,以双顶位形式吸附在两个相邻的Si原子上。该过程中基体表面Si原子的电子向H偏移,此时两者的主要相互作用源于Si原子的p轨道和H的s轨道的重叠杂化。通过计算氢气在表面的覆盖率,发现吸附能随着覆盖率的增大而增大,在低H覆盖率(θH≤4/9 ML)下,H原子之间存在着较强的吸引力,随着H覆盖率的增加(θH＞4/9 ML),H原子之间排斥力逐渐增大,吸附能增加趋缓,整体结构更加稳定。     

H原子在Al(111)和Ag(111)面上的吸附

本文用电荷自洽的EHT方法,研究了H原子在Al(111)和Ag(111)面上的吸附,结果指出:在Al(111)面上,H以原子状态吸附在某些对称位置上,它也能渗透到表面层中去,成为填隙原子;H₂分子在表面处发生解离吸附。在Ag(111)表面上,H原子有可能以分子状态吸附,H—H键平行于表面,这与高分辨率电子能量损失谱所得到的实验结果一致;但H₂分子在Ag(111)表面也可能发生解离吸附。 关键词：     

A CLUSTER MODEL METHOD AND ITS APPLICATIONS TO CHEMISORPTIONS ON SEMICONDUCTOR SURFACES

In the present paper the cluster model and charge self-consistent method are used to study the chemisorpti on Si(lll1), Ge(111), and GaAs(110) surfaces. The parameters in the calculations are selected to fit the respective bulk energy bands of Si, Ge, and GaAs. Some general rules of chemisorpti on Si(ll1) and Ge(ll1) are investigated and speculated. The three-fold hollow site geometry is favorable for group iii metals on Si(lll), whereas the one-fold top site is more stable for group vii elements, the reason being probably one of the favorable charge distribution. However, the situation for chemisorpti on Ge(ll1) is somewhat different. The adsorptions of group iii and v elements on GaAs(110) are also considered. The possible chemisorption geometries and the related electronic states for these systems are calculated and discussed.     

Cluster model approach for electronic structure of Si and Ge(111) and GaAs(110) surfaces

For the purpose of exploring how realistic a cluster model can be for semiconductor surfaces, extended Huckel theory calculations are performed on clusters modeling Si and Ge(111) and GaAs(110) surfaces as prototypes. Boundary conditions of the clusters are devised to be reduced. The ideal, relaxed, and reconstructed Si and Ge(111) surfaces are dealt with. Hydrogen chemisorbed (111) clusters of Si and Ge are also investigated as prototypes of chemisorption systems. Some comparison of the results with finite slab calculations and experiments is presented. The cluster-size dependence of the calculated energy levels, local densities of states, and charge distributions is examined for Si and Ge(111) clusters. It is found that a 45-atom cluster which has seven layers along the [111] direction is large enough to identify basic surface states and study the hydrogen chemisorption on Si and Ge(111) surfaces. Also, it is presented that surface states on the clean Si and Ge(111) clusters exist independent of relaxation. Further, the calculation for the relaxed GaAs(110) cluster gives the empty and filled dangling-orbital surface states comparable to experimental data and results of finite slab calculations. The cluster approach is concluded to be a highly useful and economical one for semiconductor surface problems.     

Theoretical investigations of the (110) interface between the full Heusler alloys and GaAs

The ab initio calculations of the electronic structure and magnetic properties of the (110) interface between Co₂YZ (Y = Cr or Mn and Z = Al, Si, or Ge) and GaAs are carried out by means of the density functional theory depending on the contact configuration. It is revealed that two of four possible atomic interface configurations have high spin polarization. For Co₂MnSi/GaAs(110), one of the contacts has almost 100% spin polarization. Calculations of the adhesion energy on the interfaces allow the most stable contacts to be established.     

用总能量密度泛函集团方法研究I/Si(111)及I/Ge(111)表面吸附

本文中用自洽总能量密度泛函集团方法研究了Ⅶ族的Ⅰ在Si(111)和Ge(111)表面的吸附。分别采用了两种集团模型来模拟顶位和三度位构型,用总能量极小原理确定了吸附的最佳构型和吸附能量,得到顶位比三度位吸附更为稳定的结果,与SEXAFS实验结果一致。本文还计算了Ⅶ族元素F,Cl,Br,I在Si(111)顶位吸附的状态密度,讨论了这系列DOS的变化情况,并与实验或其他理论结果进行了比较,最后还讨论了半经验EHT方法的适用性及限制。 关键词：     

Chemisorption of Fe on Au-passivated Si（001） surface

The chemisorption of one monolayer of Fe atoms on a Au-passivated Si(001) surface is studied by using the self-consistent tight-binding linear muffin-tin orbital method. The Fe adatom chemisorption on an ideal Si(001) surface is also considered for comparison. The chemisorption energy and layer projected density of states for a monolayer of Fe atoms on Au-passivated Si(001) surface are calculated and compared with that of the Fe atoms on an ideal Si(001) surface. The charge transfer is investigated. It is found that the most stable position is at the fourfold hollow site for the adsorbed Fe atoms, which might sit below the Au surface. Therefore there will be a Au－Fe mixed layer at the Fe/Au－Si(100) interface. It is found that the adsorbed Fe atoms cannot sit below the Si surface, indicating that a buffer layer of Au atoms may hinder the intermixing of Fe atoms and Si atoms at the Fe/Au－Si(001) interface effectively, which is in agreement with the experimental results.     

Ⅶ族元素在Si(111)和Ge(111)表面上的吸附

本文用原子集团模型和电荷自洽的EHT方法研究了Ⅶ族元素在Si(111)和Ge(111)表面上的化学吸附。利用能量极小的原则确定了各元素的化学吸附构型。对于Cl,在这两个表面均是顶位吸附。对于Ⅰ,都呈三度空位吸附。对Br,顶位及三度空位吸附均能发生,但是在Si(111)表面顶位吸附要优于三度空位,而在Ge(111)表面则三度空位吸附优于顶位。最后对Ⅶ族元素原子在这两种表面的吸附行为作了讨论,并与实验作了比较。 关键词：     

Growth of extra-thin ordered aluminum films on Si(110) surfaces

The formation of surface structures upon Al deposition onto a Si(110) surface was studied by LEED and AES. The “4 × 6”, “1 × 9”, 2 × 1, 1 × 1 ordered Si(110)-Al surface phases and epitaxial Al(110) domains were observed depending on Al coverage and substrate temperature. The formation phase diagram was drawn for the Al/Si(110) system.     

Self-consistent tight-binding total energy calculations: Application to GaAs/Si and ZnSe/GaAs (100) interfaces

Self-consistent tight-binding total energy calculations are performed for various models of GaAs/Si and ZnSe/GaAs (100) interfaces. A graded GaAs/Si interface with the first monolayer on substrate having 1 As atom per 3 Si atoms followed by a second monolayer with 3 Ga atoms per 1 Si atom and continued with 2 bulk-like As and Ga monolayers is found to be structurally more stable than other interfaces. The instability of the abrupt interface is driven by elastic rather than electrostatic forces. Similar results are obtained for the ZnSe/GaAs (100) interface. The graded interface with Ga atoms exchanged against Zn atoms is found to be energetically most stable. Strong macroscopic electric fields are found in the surface and interface regions for both the GaAs/Si and ZnSe/GaAs interfaces.     

Chemisorption of Au on Si（001） surface

The chemisorption of one monolayer of Au atoms on an ideal Si(001) surface is studied by using the self-consistent tight binding linear muffin-tin orbital method. Energies of the adsorption system of a Au atom on different sites are calculated. It is found that the most stable position is A site (top site) for the adsorbed Au atoms above the Si(001) surface. It is possible for the adsorbed Au atoms to sit below the Si(001) surface at the B_1 site(bridge site), resulting in a Au－Si mixed layer. This is in agreement with the experiment results. The layer projected density of states is calculated and compared with that of the clean surface. The charge transfer is also investigated.