太阳电池中CdS多晶薄膜的微结构及性能

采用化学水浴法制备了CdS多晶薄膜,通过XRD,AFM,XPS和光学透过率谱等测试手段研究了CdS多晶薄膜生长过程中的结构和性能.结果表明,随着沉积的进行,薄膜更加均匀、致密,与衬底粘附力增强,其光学能隙逐渐增大,薄膜由无定形结构向六方(002)方向优化生长,同时出现了Cd(OH)2相.在此基础上,通过建立薄膜的生长机制与性能的联系,沉积出优质CdS多晶薄膜,获得了转化效率为13.38%的CdS/CdTe小面积电池.     

不同柔性衬底上CdS薄膜退火前后的性能比较

采用磁控溅射法分别在柔性PI衬底、柔性AZO衬底和柔性ITO衬底上制备CdS薄膜,并在干燥空气中以CdCl2为源380℃退火,分别研究了不同柔性衬底及退火工艺对CdS薄膜形貌、结构和光学性能的影响。研究结果表明:退火前在不同柔性衬底上的CdS薄膜形貌依赖于衬底类型,退火后CdS薄膜的晶粒再结晶,晶粒度增大明显,且不再依赖于衬底类型。不同柔性衬底上CdS薄膜均为立方相和六角相的混相结构,退火后,六角相比例增大,薄膜的结晶质量提高。透过率退火后改善明显,其中,在柔性AZO衬底上的CdS薄膜透过率超过80%。     

掺杂对CdS多晶薄膜电学性能的影响

利用近空间升华法制备CdS多晶薄膜,同时将薄膜在400℃下进行Cl-掺杂。利用光-电阻、暗电阻-温度关系等测试手段分析不同波长光照及温度对掺杂前后薄膜电学性能的影响。结果显示:在不同波长的光照下,薄膜显示出不同的电阻值,最小电阻出现在500 nm波长附近;在光、暗态转换过程中发现,掺杂对电阻弛豫时间影响较大,掺杂后最短响应时间由原来对应的青光向蓝光移动;掺杂后,薄膜光、暗电导增加,电导激活能减少。     

CdS薄膜的真空热蒸发制备及在CIGS薄膜太阳电池中的应用

采用真空热蒸发(VTE)的方法制备了CdS多晶薄膜,研究了不同衬底温度对其微观结构与光电性能的影响。结果显示,不同衬底温度下制备的CdS薄膜均属于六方相多晶结构且具有(002)择优取向;随着衬底温度的升高,(002)特征衍射峰强度增加,半高宽变小,相应薄膜结晶度增大;由CdS薄膜的透射光谱可知,在500~1 000nm波段平均透过率均超过80%,光学带隙随着衬底温度的升高而增大(2.44~2.56eV),表明真空热蒸发方法制备的CdS薄膜可以作为CIGS薄膜太阳电池的缓冲层。将真空热蒸发法制备CdS薄膜与磁控溅射法制备CIGS薄膜太阳电池相结合,在同一真空室内得到了CIGS薄膜太阳电池器件,为CIGS薄膜太阳电池的工业化推广提供了新途径。     

不同退火条件对磁控溅射CdS薄膜性能的影响

采用磁控溅射法,在衬底温度300 ℃制备CdS薄膜,并选取370 ℃、380 ℃、390℃三个温度退火,获得在干燥空气和CdCl2源+干燥空气两种气氛下退火的CdS薄膜.通过研究热处理前后CdS薄膜的形貌、结构和光学性能表明,CdS薄膜在干燥空气中退火,晶粒度、表面粗糙度和可见光透过率变化不明显,光学带隙随退火温度的升高而增大; 在CdCl2源+干燥空气中退火,随退火温度的升高发生明显的再结晶和晶粒长大,表面粗糙度增大,可见光透过率和光学带隙随退火温度的升高而减小.分析得出: 上述性能的改变是由于不同的退火条件对CdS薄膜的再结晶温度和带尾态掺杂浓度改变的结果.     

太阳电池中CdS多晶薄膜的微结构及性能

采用化学水浴法制备了CdS多晶薄膜，通过XRD，AFM，XPS和光学透过率谱等测试手段研究了CdS多晶薄膜生长过程中的结构和性能.结果表明，随着沉积的进行，薄膜更加均匀、致密，与衬底粘附力增强，其光学能隙逐渐增大，薄膜由无定形结构向六方(002)方向优化生长，同时出现了Cd(OH)2相.在此基础上，通过建立薄膜的生长机制与性能的联系，沉积出优质CdS多晶薄膜，获得了转化效率为13.38%的CdS/CdTe小面积电池.     

多晶薄膜CdS／CdTe太阳电池

报道了转换效率为１４．６％～１５．８％的多晶薄膜ＣｄＳ／ＣｄＴｅ太阳电池的研制。用ＭＯＣＶＤ法，在玻璃衬底上制备ＳｎＯ＿２和ＳｎＯ＿２：Ｆ薄膜，水溶液化学淀积法获得８０～１００ｎｍ厚的ＣｄＳ薄膜和密堆积升华法制备５μｍ厚ＣｄＴｅ薄膜，ＣｄＳ／ＣｄＴｅ太阳电池的短路电流密度高达２４～２５ｍＡ／ｃｍ￣２。同时，对各层薄膜晶形和微观结构进行了分析研究。     

CdS纳米薄膜的水浴法制备与表征

CdS是一种直接能隙半导体，其带隙约为2．42eV，是一种良好的太阳能电池窗口层材料和过渡层材料。化学水浴法沉积CdS薄膜具有工艺简单，成本低廉，成膜均匀、致密以及可大面积生产等优点。本文通过对化学水浴法沉积CdS薄膜的研究，阐述了CdS膜的生成和生长过程及其机理，并不断优化此方法中的各种工艺参数，得到了适合做铜铟镓硒薄膜太阳能电池过渡层的CdS薄膜，并对该薄膜的形貌、结构和性能进行了分析。     

化学水浴沉积CdS薄膜晶相结构及性质

采用CBD法在醋酸镉溶液体系中制备CdS半导体薄膜,研究了溶液组份的浓度对CdS结晶结构的影响.增加乙酸胺的浓度、提高溶液的pH值有利于生成立方晶CdS,反之则易于生成六方晶CdS.无论立方相还是六方相CdS薄膜,电阻率均在104～105Ω·cm范围,结晶均匀细致.用六方晶为主和立方晶为主的CdS制备的CIGS太阳电池最高效率分别达到12.10%和12.17%.     

化学水浴沉积CdS薄膜晶相结构及性质

采用CBD法在醋酸镉溶液体系中制备CdS半导体薄膜，研究了溶液组份的浓度对CdS结晶结构的影响．增加乙酸胺的浓度、提高溶液的pH值有利于生成立方晶CdS，反之则易于生成六方晶CdS．无论立方相还是六方相CdS薄膜，电阻率均在10~4～10~5Ω·cm范围，结晶均匀细致．用六方晶为主和立方晶为主的CdS制备的CIGS太阳电池最高效率分别达到12.10%和12.17%．     

Optical properties of chemical bath deposited CdS thin films

CdS thin films have been prepared by chemical bath deposition. As-deposited films are cubic and show a sulfur deficiency. From the transmittance and reflectance data analysis direct band gaps (E_g) ranging from 2.180 to 2.448 eV have been obtained. Air and vacuum annealed samples show a decrease in the band gap. The refractive index (n) lies in the range 1.61–2.34. A dependence of band gap on composition has been observed and the possible reasons are discussed.     

太阳电池中CdS薄膜的制备及其性能的研究

分别采用化学池沉积(CBD)和真空蒸发法,在三种衬底(玻片、ITO玻片、SnO2玻片)上沉积CdS薄膜,并利用扫描电镜(SEM)、透射光谱、X射线衍射(XRD)等方法对沉积膜进行了测试分析,同时阐述了两种不同方法下CdS膜的生长沉积机制。     

低温磁控溅射制备CdS薄膜的结构和光学特性

用磁控溅射的方法在透明导电氧化物衬底上制备了CdS薄膜,制备时的衬底温度为30~200℃.X射线衍射测试结果表明在这一条件下制备的CdS薄膜是六角纤锌矿的多晶结构.扫描电子显微镜结果显示薄膜具有较好的晶体质量,这一结论也和拉曼光谱、紫外-可见吸收光谱、光致发光光谱的结果一致.拉曼光谱显示CdS薄膜内部的压应力随着制备温度的提高而增大.     

CdS薄膜的制备及其性能

采用化学池沉积(CBD)法,在三种衬底(玻片、ITO玻片、SnO2 玻片)上沉积CdS薄膜,并利用扫描电镜(SEM)、透射光谱、X射线衍射(XRD)和微电流高阻计等方法对沉积膜进行了测试分析,计算出CdS薄膜的能隙宽度和电导激活能,阐述了CBD法中CdS薄膜的生长沉积机制以及不同衬底对沉积效果的影响.结果表明:不同衬底的成膜效果差异较大,其中以SnO2 玻片效果最佳     

有源层溅射温度对非晶铟镓锌氧薄膜晶体管电学特性的影响

The effect of active layer deposition temperature on the electrical performance of amorphous InGaZnO （a-IGZO） thin film transistors （TFTs） is investigated. With increasing annealing temperature, TFT performance is firstly improved and then degraded generally. Here TFTs with best performance defined as ＂optimized-annealed＂ are selected to study the effect of active layer deposition temperature. The field effect mobility reaches maximum at deposition temperature of 150℃ while the room-temperature fabricated device shows the best subthreshold swing and off-current. From Hall measurement results, the carrier concentration is much higher for intentional heated a-IGZO films, which may account for the high off-current in the corresponding TFT devices. XPS characterization results also reveal that deposition temperature affects the atomic ratio and Ols spectra apparently. Importantly, the variation of field effect mobility of a-IGZO TFTs with deposition temperature does not coincide with the tendencies in Hall mobility of a-IGZO thin films, Based on the further analysis of the experimental results on a-IGZO thin films and the corresponding TFT devices, the trap states at front channel interface rather than IGZO bulk layer properties may be mainly responsible for the variations of field effect mobility and subthreshold swing with IGZO deposition temperature.     

Effect of barrier layers on BaTiO3 thin film capacitors on Si substrates

The choice of the bottom electrode or barrier layer plays an important role in determining the electrical and structural properties of metal/ferroelectric/metal thin film capacitors. A substantial improvement of the electrical and structural properties of the capacitors was found by using RuO₂ as a bottom electrode. Electrical measurement on a capacitor with a structure of BaTiO₃(246 nm)/RuO₂ (200 nm)/SiO₂/Si, where the BaTiO₃ thin film was deposited at room temperature, showed a dielectric constant of around 15, leakage current density of 1.6 × 10⁻⁷A/cm² at 4 V, a dc conductivity of 9.8 × 10¹⁴S/cm, and a capacitance per unit area of 5.6 × 10⁴pF/cm². A similar structure but with polycrystalline BaTiO³ (273 nm) as the dielectric deposited at 680°C showed a dielectric constant of 290, leakage current density of 1.7 × 10⁻³A/cm² at 4 V, a dc conductivity of 1.2 × 10⁻⁸ S/cm, and a capacitance per unit area of 9.4 × 10⁵ pF/cm². Scanning electron microscopy analysis on the films showed differences in the microstructure due to the use of different bottom electrode materials, such as RuO₂ or Pd.     

Structural and optical properties of polycrystalline CdS thin films deposited by electron beam evaporation

Highly crystalline and transparent cadmium sulphide(CdS) films were deposited on glass substrate by electron beam evaporation technique.The structural and optical properties of the films were investigated.The X-ray diffraction analysis revealed that the CdS films have a hexagonal structure and exhibit preferred orientation along the(002) plane.Meanwhile,the crystalline quality of samples increased first and then decreased as the substrate temperature improved,which is attributed to the variation in film thickness.UV-vis spectra of CdS films indicate that the absorption edge becomes steeper and the band gap present fluctuation changes in the range of 2.389-2.448 eV as the substrate temperature increased.The photoluminescence peak of the CdS films was found to be broadened seriously and there only emerges a red emission band at 1.60 eV.The above results were analyzed and discussed.