| 光化学反应中的磁场效应——吸附在硅胶表面上的芳砜的光解 |
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| 引用本文： | 佟振合,陈申. 光化学反应中的磁场效应——吸附在硅胶表面上的芳砜的光解[J]. 影像科学与光化学, 1985, 3(3): 44-49. DOI: 10.7517/j.issn.1674-0475.1985.03.44 |
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| 作者姓名： | 佟振合 陈申 |
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| 作者单位： | 中国科学院感光化学研究所 |
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| 摘 要： | 本文研究了吸附在硅胶表面上的芳砜的光化学,发现硅胶表面限制光解产生的自由基的移动,外加约150高斯的磁场显著地改变产物的分配比例,对这种磁场效应的机理进行了讨论。
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| 收稿时间： | 1984-07-03 |
MAGNETIC FIELD EFFECT ON PHOTOCHEMISTRY PHOTOLYSIS OF ARYL SULFONES ABSORBED ON SILICA GEL SURFACE |
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| TONG ZHEN-HE. MAGNETIC FIELD EFFECT ON PHOTOCHEMISTRY PHOTOLYSIS OF ARYL SULFONES ABSORBED ON SILICA GEL SURFACE[J]. Imaging Science and Photochemistry, 1985, 3(3): 44-49. DOI: 10.7517/j.issn.1674-0475.1985.03.44 |
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| Authors: | TONG ZHEN-HE |
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| Affiliation: | Institute of Photographic Chemistry, Academia Sinica |
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| Abstract: | The photochemistry of aryl sulfones absorbed on the surface of silica gel has been investigated. It is observed that silica surface provides a cage environment which restricts the translational motion of the radical pair produced by photolysis of sulfones. A weak exteral magnetic field (-150G) may remarkably change the product distribution. The mechanism of the magnetic field effect on radical pair reactions is discussed. |
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