| 大口径光学元件薄膜厚度均匀性修正 |
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| 引用本文： | 王长军, 熊胜明. 大口径光学元件薄膜厚度均匀性修正[J]. 强激光与粒子束, 2007, 19(07). |
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| 作者姓名： | 王长军 熊胜明 |
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| 作者单位： | 1.中国科学院 光电技术研究所, 成都 61 0209;;;2.中国科学院研究生院, 北京 1 00039 |
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| 摘 要： | 研究了2.2 m高真空箱式镀膜机镀膜时的实际膜厚分布情况。对非球面和平面光学元件，分别采用行星夹具和平面公转夹具并利用修正板调节膜厚均匀性。从实验上实现了大口径薄膜均匀性的调节，并获得较为理想的结果。口径在700 mm范围内，对于凹面均匀性可以控制在0.7%以内，平面均匀性在1%以内；口径在1 200 mm范围内凹面元件均匀性可控制在1%以内，平面1 300 mm口径以内窗口均匀性可控制在1%以内。镀制了口径在400~1 300 mm的多种天文观测上使用的反射镜、增透膜等，获得了理想的光谱曲线与较好的使用效果。
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| 关 键 词： | 大口径光学元件 薄膜 均匀性 修正板 修正 |
Correction for film thickness uniformity of large aperture optical components |
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| wang chang-jun, xiong sheng-ming. Correction for film thickness uniformity of large aperture optical components[J]. High Power Laser and Particle Beams, 2007, 19. |
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| Authors: | wang chang-jun xiong sheng-ming |
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| Affiliation: | 1. Institute of Optics and Electronics,Chinese Academy of Sciences,P.O.Box 350,Chengdu 610209,China;;;2. Graduate University of the Chinese Academy of Sciences,Beijing 100039,China |
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| Abstract: | The actual distribution of film thickness of a 2.2 meter coating plant has been studied. The uniformity of film thickness has been adjusted by correction mask in experiments. Utilizing correction mask, preferable uniformity values of optical components using planet jigs and revolution jigs have been acquired respectively by experiment and the results for large aperture optical components are satisfactory. Uniformity value has been controlled within 0.7% for concave mirrors within 700 millimeter aperture. For plane surface mirror with the same aperture, the value was within 1%. And for the aperture beyond one meter, the uniformity value of optical components has been controlled within 1%. By this means, the reflecting mirrors and antireflection mirrors have been coated for astronomical obse |
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| Keywords: | large aperture optical components film uniformity mask correction |
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