| 微/纳米多层金刚石自支撑膜的制备及生长特性的研究 |
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| 引用本文： | 兰昊,陈广超,戴风伟,李彬,唐伟忠,李成明,宋建华,J.Askari,黑立富,佟玉梅. 微/纳米多层金刚石自支撑膜的制备及生长特性的研究[J]. 人工晶体学报, 2007, 36(1): 166-169 |
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| 作者姓名： | 兰昊 陈广超 戴风伟 李彬 唐伟忠 李成明 宋建华 J.Askari 黑立富 佟玉梅 |
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| 作者单位： | 北京科技大学材料科学与工程学院,北京,100083;北京科技大学冶金生态学院,北京,100083 |
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| 基金项目： | 国家高技术研究发展计划(863计划);国家自然科学基金;教育部留学回国人员科研启动基金;北京市科技新星计划项目;北京市自然科学基金 |
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| 摘 要： | 在30kW级直流电弧等离子喷射化学气相沉积装置下,采用Ar-H2-CH4混合气体,通过控制工艺参数,在钼衬底上分别制备了普通微米自支撑膜及多层金刚石自支撑膜并对其进行研究.结果显示,同普通微米膜相比,多层膜体是由微米晶金刚石层和纳米晶金刚石层组成,表面光滑,微米层与纳米层间具有相互嵌套式的界面;多层膜中各层膜体的内应力沿生长方向有明显变化,出现一个从压应力到拉应力变化的过程;在沉积过程中,随着层数变化,膜体的生长速率也发生相应的变化.
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| 关 键 词： | 直流电弧等离子喷射化学气相沉积 自支撑金刚石膜 多层结构 内应力 生长速率 |
| 文章编号： | 1000-985X（2007）01-0166-04 |
| 修稿时间： | 2006-10-08 |
Deposition of Microcrystalline/Nanocrystalline Multilayered Free-standing Diamond Film and Investigation of Growth Peculiarities |
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| LAN Hao,CHEN Guang-chao,DAI Feng-wei,LI Bin,TANG Wei-zhong,LI Cheng-ming,SONG Jian-hua,J.Askari,HEI Li-fu,TONG Yu-mei. Deposition of Microcrystalline/Nanocrystalline Multilayered Free-standing Diamond Film and Investigation of Growth Peculiarities[J]. Journal of Synthetic Crystals, 2007, 36(1): 166-169 |
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| Authors: | LAN Hao CHEN Guang-chao DAI Feng-wei LI Bin TANG Wei-zhong LI Cheng-ming SONG Jian-hua J.Askari HEI Li-fu TONG Yu-mei |
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| Affiliation: | 1. School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China ; 2. School of Echological Metallurgy, University of Science and Technology Beijing, Beijing 100083, China |
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| Abstract: | The conventional microcrystalline free-standing diamond film and multilayer free-standing diamond film were prepared by controlling deposition parameters and using 30kW power DC arc plasma jet chemical vapor deposition equipment.The fed gases were a mixture of Ar,H2 and CH4.The results show that the multilayer diamond film with smooth surface consists of micro-crystal layers and nano-crystal layers,comparing with the conventional microcrystalline diamond film.The boundary between micro-crystal layer and nano-crystal layer is nested by each other.The internal stress in multilayer diamond film varies along the film growth direction,indicating a change of compressive to tensile stress in the film. Finally,we also find that the growth rate of the multilayer films varies with the number of layers. |
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| Keywords: | DC arc plasma jet CVD free-standing diamond films multilayer structure internal stress growth rate |
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