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Optimized growth and dielectric properties of barium titanate thin films on polycrystalline Ni foils
Authors:Liang Wei-Zheng  Ji Yan-Da  Nan Tian-Xiang  Huang Jiang  Zeng Hui-Zhong  Du Hui  Chen Chong-Lin  Lin Yuan
Affiliation:a. State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China, Chengdu 610054, China;b. Department of Physics and Astronomy, University of Texas at San Antonio, San Antonio, Texas 78249, USA;c. Department of Physics and the Texas Center for Superconductivity, University of Houston, Houston, Texas 77204, USA
Abstract:Barium titanate (BTO) thin films were deposited on polycrystalline Ni foils by using the polymer assisted deposition (PAD) technique. The growth conditions including ambient and annealing temperatures were carefully optimized based on thermal dynamic analysis to control the oxidation processing and interdiffusion. Crystal structures, surface morphologies, and dielectric performance were examined and compared for BTO thin films annealed under different temperatures. Correlations between the fabrication conditions, microstructures, and dielectric properties were discussed. BTO thin films fabricated under the optimized conditions show good crystalline structure and promising dielectric properties with εr ~ 400 and tanδ <0.025 at 100 kHz. The data demonstrate that BTO films grown on polycrystalline Ni substrates by PAD are promising in device applications.
Keywords:polymer assisted deposition  barium titanate  nickel foils  thin films  thermodynamics  dielectric properties
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