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Investigation of chlorine-based etchants in wet and dry etching technology for an InP planar Gunn diode |
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| Authors: | Wu De-Ql BaiYang JiaRui Jin Zhi Liu Xin-Yu Lin Mei-Yu |
| Affiliation: | a) Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China b) China Academy of Telecommunication Research of Ministry of Industry and Information Technology of the People＇s Republic of China (MIIT), Beijing 100191, China |
| Abstract: | InP etching, InP Gunn device, ICE wet chemical etching |
| Keywords: | InP etching InP Gunn device ICE wet chemical etching |
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