| Abstract: | Three-dimensional(3 D) topological insulators(TIs) are candidate materials for various electronic and spintronic devices due to their strong spin-orbit coupling and unique surface electronic structure.Rapid,low-cost preparation of large-area TI thin films compatible with conventional semiconductor technology is the key to the practical applications of TIs.Here we show that wafer-sized Bi_2 Te_3 family TI and magnetic TI films with decent quality and well-controlled composition and properties can be prepared on amorphous SiO_2/Si substrates by magnetron cosputtering.The SiO_2/Si substrates enable us to electrically tune(Bi_(1-x)Sb_x)_2 Te_3 and Cr-doped(Bi_(1-x)Sb_x)_2 Te_3 TI films between p-type and n-type behavior and thus study the phenomena associated with topological surface states,such as the quantum anomalous Hall effect(QAHE).This work significantly facilitates the fabrication of TI-based devices for electronic and spintronic applications. |
