Bridge-free fabrication process for Al/AlO_x/Al Josephson junctions |
| |
| Affiliation: | 1.National Laboratory of Solid State Microstructures, School of Physics, Nanjing University, Nanjing 210093, China;2.Synergetic Innovation Center of Quantum Information & Quantum Physics, University of Science and Technology of China, Hefei 230026, China |
| |
| Abstract: | We fabricate different-sized Al/AlO_x/Al Josephson junctions by using a simple bridge-free technique, in which only single-layer E-beam resist polymethyl methacrylate(PMMA) is exposed at low accelerate voltage(below 30 kV) and the size of junction can be varied in a large range. Compared with the bridge technique, this fabrication process is very robust because it can avoid collapsing the bridge during fabrication. This makes the bridge-free technique more popular to meet different requirements for Josephson junction devices especially for superconducting quantum bits. |
| |
| Keywords: | Josephson junction bridge-free technique e-beam lithography superconducting qubit |
| 本文献已被 CNKI 等数据库收录！ |
| 点击此处可从《中国物理 B》浏览原始摘要信息 |
|
点击此处可从《中国物理 B》下载免费的PDF全文 |
|
