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高功率激光装置中的气载分子污染物测量和分析
引用本文:余颖, 赵峰, 李文博, 等. 高功率激光装置中的气载分子污染物测量和分析[J]. 强激光与粒子束, 2009, 21(08).
作者姓名:余颖  赵峰  李文博  张林  袁晓东
作者单位:1.四川大学 建筑与环境学院, 成都 61 0065;;;2.金开利环境工程有限公司, 广东 深圳 51 81 09;;;3.中国工程物理研究院 激光聚变研究中心, 四川 绵阳 621 900
摘    要:研究了高功率激光装置光路中的分子级污染程度。采用专用空气采样动力设备及吸附管,在一定时间内对光路中的空气进行采样并作痕量分析后,得出了卤素、含硫化合物、可溶性胺类和氨、碳氢化合物 (C6~C16有机物) 4类物质在打靶前后的数密度变化。结果显示:除含硫化合物外,其余3种物质数密度超过了美国NIF标准的上限,其中氨和可溶性胺类、碳氢化合物的数密度超过较多;卤素、含硫化合物、氨和可溶性胺类的数密度在打靶后比打靶前有所降低,而碳氢化合物的数密度在打靶后比打靶前有所升高。结果表明在该装置中存在比较严重的气载分子污染物污染。分析了气载分子污染物数密度变化的原因以及可能的产生源,并对如何去除这些气载分子污染物提出了建议。

关 键 词:高功率激光装置   光学元件损伤   分子级污染物   痕量分析

Measurement and analysis of airborne molecular contaminants in high power laser facility
yu ying, zhao feng, li wenbo, et al. Measurement and analysis of airborne molecular contaminants in high power laser facility[J]. High Power Laser and Particle Beams, 2009, 21.
Authors:yu ying  zhao feng  li wenbo  zhang lin  yuan xiaodong
Affiliation:1. College of Architecture and Environment,Sichuan University,Chengdu 610065,China;;;2. Kingcarrier Environment Engineering Co Ltd,Shenzhen 518109,China;;;3. Research Center of Laser Fusion,CAEP,P.O.Box 919-988,Mianyang 621900,China
Abstract:Airborne molecular contaminations inside a high power laser facility are studied. Air samples of suspected locations are collected by special air-sampling facilities before and after laser launch. Extraction and concentration measurement of the main airborne molecules, including halogens, sulphur compounds, ammonia and soluble amines and hydrocarbons (C6~C16) are made during the sampling progress. The trace analysis suggests that the concentrations of most species except sulphur compounds, especially ammonia, soluble amines and hydrocarbons,exceed the suggested upper control limit of US NIF reference. The concentrations of halogens, sulphur compounds, ammonia and soluble amines after laser launch are lower than that before launch while the concentrations of hydrocar
Keywords:high power laser facility  optical component damage  airborne molecular contaminants  trace analysis
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