High temperature characteristics of bilayer epitaxial graphene field-effect transistors on SiC Substrate |
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| Affiliation: | 1.School of Electronic and Information Engineering, Hebei University of Technology, Tianjin 300130, China;2.National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China |
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| Abstract: | In this paper, high temperature direct current (DC) performance of bilayer epitaxial graphene device on SiC substrate is studied in a temperature range from 25℃ to 200℃. At a gate voltage of -8 V (far from Dirac point), the drain-source current decreases obviously with increasing temperature, but it has little change at a gate bias of +8 V (near Dirac point). The competing interactions between scattering and thermal activation are responsible for the different reduction tendencies. Four different kinds of scatterings are taken into account to qualitatively analyze the carrier mobility under different temperatures. The devices exhibit almost unchanged DC performances after high temperature measurements at 200℃ for 5 hours in air ambience, demonstrating the high thermal stabilities of the bilayer epitaxial graphene devices. |
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| Keywords: | epitaxial graphene field-effect transistor high temperature characteristics |
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