Quick X‐ray reflectivity using monochromatic synchrotron radiation for time‐resolved applications |
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| Authors: | H. Joress J. D. Brock A. R. Woll |
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| Affiliation: | 1. Cornell High Energy Synchrotron Source, Cornell University, Ithaca, NY, USA;2. Materials Science and Engineering Department, Cornell University, Ithaca, NY, USA;3. School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA |
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| Abstract: | A new technique for the parallel collection of X‐ray reflectivity (XRR) data, compatible with monochromatic synchrotron radiation and flat substrates, is described and applied to the in situ observation of thin‐film growth. The method employs a polycapillary X‐ray optic to produce a converging fan of radiation, incident onto a sample surface, and an area detector to simultaneously collect the XRR signal over an angular range matching that of the incident fan. Factors determining the range and instrumental resolution of the technique in reciprocal space, in addition to the signal‐to‐background ratio, are described in detail. This particular implementation records ～5° in 2gθ and resolves Kiessig fringes from samples with layer thicknesses ranging from 3 to 76 nm. The value of this approach is illustrated by showing in situ XRR data obtained with 100 ms time resolution during the growth of epitaxial La0.7Sr0.3MnO3 on SrTiO3 by pulsed laser deposition at the Cornell High Energy Synchrotron Source (CHESS). Compared with prior methods for parallel XRR data collection, this is the first method that is both sample‐independent and compatible with the highly collimated, monochromatic radiation typical of third‐generation synchrotron sources. Further, this technique can be readily adapted for use with laboratory‐based sources. |
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| Keywords: | X‐ray reflectivity time‐resolved in situ quick XRR film growth |
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