Thermally Induced Silane Dehydrocoupling on Silicon Nanostructures |
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| Authors: | Dr. Dokyoung Kim Dr. Jinmyoung Joo Dr. Youlin Pan Alice Boarino Yong Woong Jun Prof. Dr. Kyo Han Ahn Dr. Barry Arkles Prof. Dr. Michael J. Sailor |
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| Affiliation: | 1. Department of Chemistry and Biochemistry, University of California, San Diego, La Jolla, CA, USA;2. Gelest Inc., Morrisville, PA, USA;3. Department of Chemistry, Pohang University of Science and Technology (POSTECH), Pohang, Rep. of Korea |
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| Abstract: | Organic trihydridosilanes can be grafted to hydrogen‐terminated porous Si nanostructures with no catalyst. The reaction proceeds efficiently at 80 °C, and it shows little sensitivity to air or water impurities. The modified surfaces are stable to corrosive aqueous solutions and common organic solvents. Octadecylsilane H3Si(CH2)17CH3, and functional silanes H3Si(CH2)11Br, H3Si(CH2)9CH=CH2, and H3Si(CH2)2(CF2)5CF3 are readily grafted. When performed on a mesoporous Si wafer, the perfluoro reagent yields a superhydrophobic surface (contact angle 151°). The bromo‐derivative is converted to azide, amine, or alkyne functional surfaces via standard transformations, and the utility of the method is demonstrated by loading of the antibiotic ciprofloxaxin (35 % by mass). When intrinsically photoluminescent porous Si films or nanoparticles are used, photoluminescence is retained in the grafted products, indicating that the chemistry does not introduce substantial nonradiative surface traps. |
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| Keywords: | mesoporous materials photoluminescence porous silicon quantum dots surface chemistry |
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