| Reduction of Ordering Temperature of FePt-Al2O3 Thin Films by N2 Addition During Sputtering |
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| 引用本文： | 曹江伟 N．Katayama 杨正 魏福林 M．Matsumoto A．Morisako 刘小晰 S．Takei. Reduction of Ordering Temperature of FePt-Al2O3 Thin Films by N2 Addition During Sputtering[J]. 中国物理快报, 2005, 22(11): 2899-2902 |
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| 作者姓名： | 曹江伟 N．Katayama 杨正 魏福林 M．Matsumoto A．Morisako 刘小晰 S．Takei |
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| 作者单位： | [1]Research Institute of Magnetic Materials, Lanzhou University, Lanzhou 730000 [2]Department of Information Engineering, Shinshu University, 4-17-I Wakasato, Nagano 380-8553, Japan |
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| 摘 要： | We investigate the effect of N2 addition during sputtering on the microstructure and magnetic properties of FePt-Al2O3 thin films. The texture of FePt phase in FePt-Al2O3 thin films changes from （111） to a more random orientation by N2 addition during sputtering. The ordering temperature of FePt phase reduces about 100℃ with appropriate N2 partial pressure. A larger coercivity of 6.0 × 10^5 Aim is obtained with N2 partial pressure about 15%. Structural analysis reveals that a small quantity of Fe3N phase forms during sputtering and the release of N atoms during the post annealing induces a large number of vacancies in the films, which benefits to the transformation of FePt phase from fcc to fct.
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| 关 键 词： | 薄膜 电子喷射 微观结构 磁性质 三氧化二铝 |
| 收稿时间： | 2005-07-03 |
| 修稿时间： | 2005-07-03 |
Reduction of Ordering Temperature of FePt-Al2O3 Thin Films by N2 Addition During Sputtering |
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| CAO Jiang-Wei, N. Katayama, YANG Zheng, WEI Fu-Lin, M. Matsumoto, A. Morisako, LIU Xiao-Xi, S. Takei. Reduction of Ordering Temperature of FePt-Al2O3 Thin Films by N2 Addition During Sputtering[J]. Chinese Physics Letters, 2005, 22(11): 2899-2902 |
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| Authors: | CAO Jiang-Wei N. Katayama YANG Zheng WEI Fu-Lin M. Matsumoto A. Morisako LIU Xiao-Xi S. Takei |
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