| 氧负离子解吸附过程HPM大气击穿弛豫时间分析 |
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| 引用本文： | 蔡北兵, 余道杰, 周东方, 等. 氧负离子解吸附过程HPM大气击穿弛豫时间分析[J]. 强激光与粒子束, 2017, 29: 113004. doi: 10.11884/HPLPB201729.170265 |
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| 作者姓名： | 蔡北兵 余道杰 周东方 周长林 魏进进 柴梦娟 胡俊杰 |
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| 作者单位： | 1.解放军信息工程大学 信息系统工程学院, 郑州 450001 |
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| 摘 要： | 基于全局模型，引入氧负离子解吸附过程，完善了重复频率高功率微波脉冲弛豫模型，理论研究了重复频率高功率微波脉冲大气击穿弛豫过程，数值模拟了不同附着频率、解吸附频率以及初始电子浓度条件下，弛豫过程电子浓度随时间的变化规律。结果表明：弛豫过程电子浓度变化分为快衰减和慢衰减两个阶段；发现氧负离子的引入明显延缓了弛豫过程后期电子的衰减；解吸附频率与附着频率对弛豫过程有着相反的影响，解吸附频率越高，慢衰减阶段的电子浓度越高，快衰减阶段电子浓度变化不明显；附着频率越高，快衰减阶段电子浓度变化越剧烈，慢衰减阶段的电子浓度越低；初始电子浓度越大，慢衰减阶段电子浓度变化越剧烈。
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| 关 键 词： | 高功率微波 重复频率 弛豫过程 附着 解吸附 氧负离子 |
| 收稿时间： | 2017-06-28 |
| 修稿时间： | 2017-07-21 |
Analysis of air breakdown relaxation time of high power microwave based on O- detachment |
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| Cai Beibing, Yu Daojie, Zhou Dongfang, et al. Analysis of air breakdown relaxation time of high power microwave based on O- detachment[J]. High Power Laser and Particle Beams, 2017, 29: 113004. doi: 10.11884/HPLPB201729.170265 |
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| Authors: | Cai Beibing Yu Daojie Zhou Dongfang Zhou Changlin Wei Jinjin Chai Mengjuan Hu Junjie |
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| Affiliation: | 1. Information System Engineering Institute,PLA Information Engineering University,Zhengzhou 450001,China |
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| Abstract: | Based on the global model, within O- detachment process, the repetition frequency pulse relaxation model of high power microwave is rebuilt, and the relaxation process characteristics are analyzed. The relationship between electron density with time is simulated on different attachment frequency, detachment frequency and initial electron density. The results show that the electron density relaxation process is divided into the rapid-decay process and slow-decay process; electron density is significantly improved at the later stage of relaxation process. Detachment frequency and attachment frequency have opposite effects on the relaxation process. The higher the detachment frequency is, the higher electron density of the slow-decay process is, but electron density of the rapid-decay process doesnt change significantly. The higher the attachment frequency is, the sharper the change of the electron density on the rapid-decay process and the lower electron density in the slow-decay process is. |
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| Keywords: | high power microwave repetition frequency relaxation process attachment detachment O- ions |
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