| Ordered InAs Quantum Dots with Controllable Periods Grown on Stripe-Patterned GaAs Substrates |
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| 引用本文： | 任芸芸 徐波 王占国 刘明 龙世兵. Ordered InAs Quantum Dots with Controllable Periods Grown on Stripe-Patterned GaAs Substrates[J]. 中国物理快报, 2007, 24(9): 2689-2691 |
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| 作者姓名： | 任芸芸 徐波 王占国 刘明 龙世兵 |
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| 作者单位： | [1]Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083 [2]Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 |
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| 摘 要： | GaAs （001） substrates are patterned by electron beam lithography and wet chemical etching to control the nucleation of lnAs quantum dots （QDs）. InAs dots are grown on the stripe-patterned substrates by solid source molecular beam epitaxy. A thick buffer layer is deposited on the strip pattern before the deposition of InAs. To enhance the surface diffusion length of the In atoms, InAs is deposited with low growth rate and low As pressure. The AFM images show that distinct one-dimensionally ordered InAs QDs with homogeneous size distribution are created, and the QDs preferentiMly nucleate along the trench. With the increasing amount of deposited InAs and the spacing of the trenches, a number of QDs are formed beside the trenches. The distribution of additional QDs is long-range ordered, always along the trenchs rather than across the spacing regions.
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| 关 键 词： | InAs 量子点 可操纵性 周期生长 |
| 收稿时间： | 2007-04-12 |
| 修稿时间： | 2007-04-12 |
Ordered InAs Quantum Dots with Controllable Periods Grown on Stripe-Patterned GaAs Substrates |
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| REN Yun-Yun,XU Bo,WANG Zhan-Guo,LIU-Ming,LONG Shi-Bing. Ordered InAs Quantum Dots with Controllable Periods Grown on Stripe-Patterned GaAs Substrates[J]. Chinese Physics Letters, 2007, 24(9): 2689-2691 |
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| Authors: | REN Yun-Yun XU Bo WANG Zhan-Guo LIU-Ming LONG Shi-Bing |
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| Affiliation: | 1.Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083 ;2 Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 |
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| Abstract: | GaAs (001) substrates are patterned by electron beam lithography and wet chemical etching to control the nucleation of InAs quantum dots (QDs). InAs dots are grown on the stripe-patterned substrates by solid source molecular beam epitaxy. A thick buffer layer is deposited on the strip pattern before the deposition of InAs. To enhance the surface diffusion length of the In atoms, InAs is deposited with low growth rate and low As pressure. The AFM images show that distinct one-dimensionally ordered InAs QDs with homogeneous size distribution are created, and the QDs preferentially nucleate along the trench. With the increasing amount of deposited InAs and the spacing of the trenches, a number of QDs are formed beside the trenches. The distribution of additional QDs is long-range ordered, always along the trenchs rather than across the spacing regions. |
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| Keywords: | 81.15.Hi 68.55.Jk 81.05.Ea |
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