氧化铝/氮化硅双层膜晶硅钝化的开尔文探针力显微镜研究

对晶体硅(c-Si)太阳能电池而言, 氧化铝(AlOx)是一种广泛使用的钝化材料, 因为它具有优异的沉积保形性和良好的钝化质量. 为了确保AlOx发挥其良好的钝化效果, 在沉积后退火并氢化处理是必不可少的. 通过在AlOx薄膜上沉积氢化氮化硅(SiNx:H)来实现氢化, 利用开尔文探针力显微镜研究了在不同热处理和氢化作用下, AlOx/SiNx:H双层薄膜功函数的变化, 并基于沉积薄膜所含氢与固定电荷展开了讨论. 发现钝化质量和功函数之间有相关性, 影响因素包括薄膜厚度、氢化与热处理顺序.

Kelvin probe force microscopy study on the passivation of aluminum oxide/silicon nitride bilayer for crystalline silicon

Aluminium oxide (AlOx) is a widely used passivation material as far as the crystalline silicon (c-Si) solar cells are concerned because of its perfect deposition conformality and good passivation quality. To ensure a good passivation quality, a post-deposition treatment of AlOx layers including hydrogenation is considered indispensable. In this study, hydrogenation is realized by depositing a hydrogenated silicon nitride (SiNx:H) on AlOx layer. The variant function of AlOx/SiNx:H bilayers under different thermal treatments and hydrogenation is investigated. Discussion based on layer contented hydrogen and fixed charge is conducted. A strong correlation between passivation quality and work function is identified, where the correlation is found to be influenced by layer thickness, thermal treatment sequence and hydrogenation.