Copolymerization of cyclopropyl-substituted dioxolanylmethyl acrylates with styrene and synthesis of photosensitive copolymers

Radical copolymerization of new monomers, cyclopropyl-substituted dioxolanylmethyl acrylates, with styrene in benzene solution was studied at low conversions. The copolymer compositions and the relative activity constants and Alfrey-Price constants of cyclopropane-containing dioxolanylmethyl acrylates were determined. The sensitivity of the copolymers obtained to UV radiation was studied, and the possibility of using them as photoresists was revealed.