High performance analytical characterization of refractory metals |
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| Authors: | Hugo M Ortner Wilhelm Blödorn Gernot Friedbacher Manfred Grasserbauer Viliam Krivan Alois Virag Peter Wilhartitz Gerold Wünsch |
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| Institution: | (1) Metallwerk Plansee GmbH, A-6600 Reutte, Tyrol, Austria;(2) Instituto for Analytical Chemistry, Laboratory for Physical Analysis, Technical University Vienna, Getreidemarkt 9, A-1060 Wien, Austria;(3) Instituto for Inorganic Chemistry, University Hannover, Callinstrasse 9, D-3000 Hannover 1, Federal Republic of Germany;(4) Section for Analytical Chemistry and Ultrapurification, University Ulm, Oberer Eselsberg 26, D-7900 Ulm, Federal Republic of Germany |
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| Abstract: | It is first shown what effects trace impurities generally exert on metal properties and why trace analysis is essential to modern applications of refractory metals in today's high technology. The effect of trace impurities in metals on complex systems like microelectronic components is also discussed.It is then shown, what principal analytical requirements are mandatory for trace characterization of refractory metals at levels of rising purity (4 N to 6 N). A survey of analytical methods for trace and ultratrace characterization of refractory metals is given including the following methods: flame and graphite furnace atomic absorption spectrometry, ICP and DCP-atomic emission spectrometry, X-ray fluorescence spectrometry, activation analysis, mass spectrometric methods, especially SIMS and GDMS. |
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| Keywords: | refractory metals ultratrace bulk analysis flame and graphite furnace atomic absorption spectrometry ICP-atomic emission spectrometry activation analysis mass spectrometric methods effect of trace impurities on metal properties |
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