Electron field emission of iron and cobalt‐doped DLC films fabricated by electrochemical deposition |
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| Authors: | Xiaoming Ling Peizeng Zhang Ruishan Li Duowang Fan Xiaoming Yao |
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| Institution: | 1. Key Laboratory of Opto‐Electronic Technology and Intelligent Control (Ministry of Education), Lanzhou Jiaotong University, , Lanzhou, China, 730070;2. Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, , Lanzhou, China, 730000;3. School of Science, Lanzhou University of Science and Technology, , Lanzhou, China, 730050 |
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| Abstract: | Using a simple electrochemical depositing process, iron and cobalt‐doped diamond‐like carbon (DLC) films were deposited on Si (100) substrates. The results showed that metallic elements were inhomogeneously doped into highly cross‐linking amorphous carbon matrix, forming the typical nanocrystalline/amorphous nanocomposite structure, and simultaneously the microsturcture of amorphous carbon was changed by the doping of metals. Field emission performance showed that the incorporation of iron and cobalt effectively decreases the threshold field from 13.5 V/µm to 8.0 V/µm and 6.5 V/µm, respectively, and a highest current density of the Co‐DLC film was about 1.2 mA/cm2 at the electric field of 23.5 V/µm. Copyright © 2012 John Wiley & Sons, Ltd. |
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| Keywords: | electrochemical deposition diamond‐like carbon field emission performance nanocrystalline/amorphous structure |
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