Influence of the degree of surface oxidation of polycrystalline Rh electrodes on the underpotential deposition of Cu |
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Authors: | Leonardo Salgado Yunny Meas Gabriel Trejo |
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Institution: | (1) Area de Electroquímica, Universidad Autónoma Metropolitana – Iztapalapa, Apdo. Postal 55-534, México DF 09340, Mexico,;(2) Centro de Investigación y Desarrollo Tecnológico en Electroquímica, Sanfandila Pedro Escobedo, Apdo. Postal 064, Querétaro 76700, Mexico, |
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Abstract: | The underpotential deposition of copper onto polycrystalline rhodium was studied as a function of the degree of oxidation
of the electrode surface in acidic media using potentiodynamic techniques. Surface oxidation of the rhodium electrode was
carried out using a triangular sweep potential between E
L (lower limit) and E
U (upper limit: 0.94≤E
U≤1.4 V). Cu electrodeposition was performed at the same time as the total or partial reduction of the oxidized species. The
surface oxides produced at E
U≤1.09 V were completely reduced during Cu electrodeposition. In this case, the potentiodynamic I-E patterns for oxidative dissolution of Cu were characterized by three anodic peaks located at 0.41 V (peak I), 0.47 V (peak
II) and 0.59 V (peak III) and the coverage degree by Cu, θCu, was on the order of a monolayer. Surface oxides produced at E
U>1.09 V were partially reduced during the copper electrodeposition. In this case, the I-E profiles exhibited only two anodic peaks (II and III) and θCu was <1. The Rh-oxygen species that remain on the electrode surface block the active sites of lower energy and modify the
binding energy of strongly adsorbed Cu.
Electronic Publication |
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Keywords: | Underpotential deposition Copper Rhodium |
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