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A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5)
Authors:Dezelah Charles L  Wiedmann Monika K  Mizohata Kenichiro  Baird Ronald J  Niinistö Lauri  Winter Charles H
Institution:Laboratory of Inorganic and Analytical Chemistry, Department of Chemical Technology, Helsinki University of Technology, P.O. Box 6100, FI-02015 Espoo, Finland.
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