首页 | 本学科首页   官方微博 | 高级检索  
     检索      

SiH_4与Na、Mg和Be等金属氢化物分子间反向氢键相互作用
引用本文:袁焜,左国防,刘艳芝,朱元成,刘新文,张俊彦.SiH_4与Na、Mg和Be等金属氢化物分子间反向氢键相互作用[J].中国科学:化学,2010(12):1837-1845.
作者姓名:袁焜  左国防  刘艳芝  朱元成  刘新文  张俊彦
作者单位:[1]甘肃高校新型分子材料设计与功能省级重点实验室天水师范学院生命科学与化学学院,天水741001 [2]固体润滑国家重点实验室中国科学院兰州化学物理研究所,兰州730000
基金项目:国家自然基金(50975273); 天水师范学院“青蓝”人才工程项目资助
摘    要:在B3LYP/6-311++g**、MP2/6-311++g(3df,3pd)及MP2/aug-cc-pvtz水平上分别求得H3SiH…MeHn(Me=Na,Mg,Be;n=1或2)复合物势能面上的3个稳定构型,探讨了以Si-H为电子供体的红移反向氢键相互作用(IHB).经MP2/6-311++g(3df,3pd)水平的计算,在3个复合物中,含基组重叠误差(BSSE)校正的单体间相互作用能分别为-5.98、-8.65和-3.96kJ.mol-1,与MP2/aug-cc-pvtz水平下计算得到的-6.18、-9.12和-4.28kJ·mol-1接近,可见3个反向氢键复合物的相对稳定性顺序为:SiH4...MgH2SiH4...NaHSiH4...BeH2.NBO分析及对相关原子化学位移的计算表明,在复合物中,电子流向总体表现为SiH4→MeHn(n=1或2),且直接参与反向氢键形成的H3的化学位移向低场移动.与传统氢键相比,这里Si1-H3既是氢键供体,又是电子供体,从而形成反向氢键相互作用.另外,采用分子中原子理论(AIM)分别对各复合物中相关键鞍点处的电子密度拓扑性质进行了分析,结果表明3个复合物中均存在以静电性质为主的分子间反向氢键弱相互作用.

关 键 词:甲硅烷  金属氢化物  反向氢键  电子密度拓扑性质

Inverse hydrogen bonds between SiH_4 and hydride of Na,Mg and Be
YUAN Kun,ZUO GuoFang,LIU YanZhi,ZHU YuanCheng,LIU XinWen,& ZHANG JunYan.Inverse hydrogen bonds between SiH_4 and hydride of Na,Mg and Be[J].Scientia Sinica Chimica,2010(12):1837-1845.
Authors:YUAN Kun  ZUO GuoFang  LIU YanZhi  ZHU YuanCheng  LIU XinWen  & ZHANG JunYan
Institution:1 Laboratory for New Molecule Materials Design and Function of Gansu Education Department;College of Life-Science and Chemistry,Tianshui Normal University,Tianshui 741001,China 2 State Key Laboratory of Solid Lubrication;Lanzhou Institute of Chemical Physics,Chinese Academy of Sciences,Lanzhou 730000,China
Abstract:The optimized geometries of the three complexes between MeHn(Me=Na,Mg,Be;n=1 or 2) and SiH4 have been calculated at the B3LYP/6-311++g**,MP2/6-311++g(3df,3pd) and MP2/aug-cc-pvtz levels,respectively.The red-shift inverse hydrogen bonds based on Si-H,electron donor,were reported.The calculated binding energies with basis set super-position error(BSSE) correction of the three complexes are-5.98,-8.65 and-3.96 kJ.mol-1(MP2/6-311++g(3df,3pd)),respectively,which agree with the results obtained via MP2/aug-cc-pvtz(-6.18,-9.12 and-4.28 kJ.mol-1,respectively).The relative stabilities of the three complexes in the order:SiH4...MgH2 SiH4...NaH SiH4...BeH2.Natural bond orbital theory(NBO) analysis and the chemical shifts calculation of the related atoms revealed that the charges flow from SiH4 to MeHn and the chemical shifts of the interacting H shift to down field.Here,the Si1-H3 of SiH4 acts as bond hydrogen donor and electron donor simultaneously.So,compared to conventional hydrogen bonds,they formed inverse hydrogen bond(IHB) complexes.Atom in molecule(AIM) theory has also been used to investigate the topological properties of the critical points in the three IHB structures.
Keywords:SiH4  metal hydride  inverse hydrogen bond  electron density topological property
本文献已被 CNKI 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号