反应磁控溅射法制备的氮掺杂TiO2光催化膜的氮化学态和光催化活性

 采用中频交流磁控溅射法,以O2/N2混和气为反应气体,在铝片上沉积了氮掺杂TiO2膜. 利用原子力显微镜、紫外-可见光谱、X射线衍射和X射线光电子能谱等手段研究了掺杂膜的表面形貌、光吸收性能、物相组成以及膜样品中氮的化学态,并通过苯甲酰胺的光催化降解实验对光催化剂活性进行了评价. 结果表明,所得掺杂膜仅能够被紫外光所激发,反应气的配比对膜的形貌和TiO2的锐钛矿/金红石相比率均有影响,而氮在膜中以掺杂N3-、表面吸附N2和固溶N2的形式存在. 随着N3-掺入量的增加,掺杂膜的光催化活性显著提高,在反应气体组成为N2/(O2+N2)=80%(体积分数)时,掺杂N3-量为0.594%,苯甲酰胺光催化降解效果最好,其活性约为纯TiO2膜的1.5倍.

Nitrogen States and Photocatalytic Activity of Nitrogen-Doped TiO2 Films Prepared by Reactive Magnetron Sputtering

Photocatalytic TiO2 film is a very promising material for the removal of organic pollutants in water and air1,2]. Many efforts have been made to improve the photocatalytic activity of TiO2 by doping3,4], and the effects of the cations of transition metals as dopants have been researched widely, while studies on the doping of anions such as F-5] are quite few. In recent years, doping with the anions of carbon6] and nitrogen7] has been reported. Asahi and coworkers7] prepared nitrogen-doped TiO2 and reported that it can work as a photocatalyst under visible light, while having a similar photocatalytic activity to pure TiO2 under UV light. In this report, we deposit N-doped TiO2 films on aluminum sheets by reactive magnetron sputtering with an O2/N2 mixture as the reactive gas.