| Abstract: | We use a three‐dimensional self‐consistent field model to study the adsorption of A‐B copolymers from A‐B copolymer/A homopolymer blends on planar substrates comprising two chemically distinct regions C and D. The interplay between the spatial distribution of the surface chemical heterogeneities and the monomer sequence distribution in the copolymer is examined for diblock (A‐B), triblock (A‐B‐A), inverted triblock (B‐A‐B), and alternating (A‐alt‐B) copolymers. Our results demonstrate that when the chemically heterogeneous motifs on the substrate are detected by the copolymer adsorbing segments, the copolymers can transcribe them with high fidelity into three dimensions. The way the surface pattern gets transferred is dictated by the monomer sequence distribution. We show that relative to alternating copolymers, block copolymers are generally better at capturing the chemical pattern shape and transcribing it into the polymer mixture. Moreover, block copolymers with shorter adsorbing blocks are capable of better recognizing the substrate motifs. In order to address the interplay between the monomer sequence distribution in the copolymer and the interaction energies, we systematically vary the repulsion between A and B, and the attraction between B and D. Our calculations reveal that increasing i) the interaction between the copolymer adsorbing segments (B) and the “sticky” points at the substrate (D), and/or ii) the repulsion between the copolymer segments (A and B) increases the total amount of the copolymer adsorbed at the mixture/substrate interface, and decreases (increases) the fidelity of the substrate chemical pattern recognition by compositionally symmetric (asymmetric) copolymers. |
