| 半导体光催化剂的表面修饰 |
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| 引用本文： | 王传义,刘春艳,沈涛.半导体光催化剂的表面修饰[J].高等学校化学学报,1998,19(12):2013-2019. |
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| 作者姓名： | 王传义 刘春艳 沈涛 |
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| 作者单位： | 中国科学院感光化学研究所,北京,100101 |
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| 基金项目： | 国家自然科学基金,美国柯达公司及中国科学院感光化学研究所光化学开放实验室资助 |
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| 摘 要： | 从半导体光催化剂表面修饰的类型、机理及效果出发，对其研究进展作了综合评述。
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| 关 键 词： | 半导体 表面修饰 光催化剂 |
Surface Modification of Semiconductor Photocatalyst |
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| WANG Chuan-Yi,LIU Chun-Yan,SHEN Tao.Surface Modification of Semiconductor Photocatalyst[J].Chemical Research In Chinese Universities,1998,19(12):2013-2019. |
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| Authors: | WANG Chuan-Yi LIU Chun-Yan SHEN Tao |
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| Institution: | WANG Chuan Yi,LIU Chun Yan *,SHEN Tao |
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| Abstract: | The progresses in the surface modification of semiconductor photocatalyst, concerning the types, mechanisms and effects, are reviewed. The modification methods are followed into: (1) dye sensitization, (2) composite of semiconductors, (3) metal deposition and (4) ions modifying. They are compared, and the improvements are proposed. |
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| Keywords: | Semiconductor Photocalysis Surface modification |
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