直流磁控溅射磁性γ′-Fe4N膜生长机理研究

采用直流磁控溅射法研究了磁控溅射沉积氮化铁薄膜的生长机制,并归属了其生长普适类型.结果表明,磁控溅射法生长的薄膜表面具有自仿射分形特性,而且表面存在一定数量的空位或孔洞,粒子呈现悬臂沉积生长现象.γ′-Fe4N单相薄膜的生长指数β≈0.61±0.02,静态标度指数α≈0.57±0.20,各指数之间的关系为α+α/β≈2,薄膜生长属于KPZ普适类型.

Growth Mechanism of Magnetic γ′-Fe4N Thin Films Deposited by D.C.Magnetron Sputtering

A variety of natural and industrial dynamical processes, such as vapor deposition, spray painting, and chemical dissolution, lead to the formation of rough surfaces. In the light of dynamical scaling, the growth and formation of such rough interfaces can be researched. In this paper, we deposited Fe-N thin films on glass substrates at different temperatures and different time by DC magnetron sputtering in N 2/Ar atmosphere. The composition, structure and saturation magnetization of the films were investigated. The growth of the γ′-Fe4N phase was also analyzed by using dynamic scaling. It is found that the surfaces of the Fe-N films typically exhibits self-affine structures both in space and time, and the 2-dependent nontrivial exponents are α≈0.57±0.20 and β≈0.61±0.02, respectively. The scaling relationship α+α/β≈2 is obeyed, which is in agreement with KPZ universality. The growth process allowed the formation of overhangs or voids, and desorption was the dominant relaxation process.