TiO2介孔薄膜的制备及紫外光电响应性质

采用蒸发诱导自组装法制备了高度有序的TiO2介孔薄膜. 利用X射线衍射(XRD)、扫描电子显微镜(SEM)和透射电子显微镜(TEM)等分析手段对其进行了表征. 结果表明, 所得样品的孔径约为5 nm, 孔道规则, 且骨架为纯锐钛矿结构. 紫外-可见光谱(UV-Vis)的表征结果表明, 制备的TiO2介孔薄膜对波长小于380 nm的紫外线有很强的吸收. 对TiO2介孔薄膜的I-V(电流-电压)特性进行了表征, 发现加光后其I-V曲线由暗态时的肖特基特性转变为欧姆特性, 表明TiO2介孔薄膜对紫外光有很敏感的光电响应.

Preparation and Ultraviolet Photoelectric Response of TiO_2 Mesoporous Thin Films

Highly orderded TiO_2 mesoporous thin films were synthesized through evaporation induced selfassembly(EISA). The as-synthesized samples were characterized by X-ray diffraction( XRD), scanning electron microscope(SEM), and transmission electron microscope(TEM). The results show that the mesoporous sample has a highly organized and nanocrystaline anatase framework with pore size of about 5 nm. The UV-Vis spectra reveal that TiO_2 mesoporous thin films have strong absorbance to UV light( λ < 380 nm). The I-V( current-voltage) properties of TiO_2 mesoporous thin films were characterized. The results show that the I-V characteristics have changed when UV light is on and off, which indicate that TiO_2 mesoporous thin films have sensitive ultraviolet photoelectric response.