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Synthesis and Structural Characterization of β‐Ketoiminate‐Stabilized Gallium Hydrides for Chemical Vapor Deposition Applications
Authors:Dr Peter Marchand  Dr David Pugh  Prof Ivan P Parkin  Prof Claire J Carmalt
Institution:1. Materials Chemistry Centre, Department of Chemistry, University College London, 20 Gordon Street, London, WC1H 0AJ (UK), Fax: (+44)?020‐7679‐7463;2. Department of Chemistry, University of Southampton, Highfield, Southampton, SO17 1BJ (UK)
Abstract:Bis‐β‐ketoimine ligands of the form (CH2)n{N(H)C(Me)?CHC(Me)?O}2] (LnH2, n=2, 3 and 4) were employed in the formation of a range of gallium complexes Ga(Ln)X] (X=Cl, Me, H), which were characterised by NMR spectroscopy, mass spectrometry and single‐crystal X‐ray diffraction analysis. The β‐ketoimine ligands have also been used for the stabilisation of rare gallium hydride species Ga(Ln)H] (n=2 ( 7 ); n=3 ( 8 )), which have been structurally characterised for the first time, confirming the formation of five‐coordinate, monomeric species. The stability of these hydrides has been probed through thermal analysis, revealing stability at temperatures in excess of 200 °C. The efficacy of all the gallium β‐ketoiminate complexes as molecular precursors for the deposition of gallium oxide thin films by chemical vapour deposition (CVD) has been investigated through thermogravimetric analysis and deposition studies, with the best results being found for a bimetallic gallium methyl complex L3{GaMe2}2] ( 5 ) and the hydride Ga(L3)H] ( 8 ). The resulting films ( F5 and F8 , respectively) were amorphous as‐deposited and thus were characterised primarily by XPS, EDXA and SEM techniques, which showed the formation of stoichiometric ( F5 ) and oxygen‐deficient ( F8 ) Ga2O3 thin films.
Keywords:chelates  chemical vapour deposition  gallium oxides  hydrides  thin films
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