| 硅基分子印迹技术制备铜离子选择电极 |
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| 引用本文： | 刘亚强,刘艳,黄西潮.硅基分子印迹技术制备铜离子选择电极[J].化学研究,2008,19(3):70-73. |
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| 作者姓名： | 刘亚强 刘艳 黄西潮 |
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| 作者单位： | 渭南师范学院,化学传感器研究所,陕西,渭南,714000 |
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| 基金项目： | 陕西省教育厅资助项目，渭南师范学院专项资助项目 |
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| 摘 要： | 以3-（2-氧基乙基氨基）丽基三甲氧基硅烷作为功能分子，铜离子为模板，将分子印迹技术与溶胶凝胶技术相结合，制备了铜离子选择电极，探讨了电极的响应机理．该电极对铜离子有较好的能斯特响应特性，其线性响应范围为5．00×10^-2～3．98×10^-6mol·L^-1，斜率为31．5mV／pC（-logc），检出限为1．00×10^-6mol·L^-1．同时该电极显示了较好的选择性，重现性和稳定性．
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| 关 键 词： | 分子印迹 溶胶凝胶 铜离子 离子选择电极 |
Preparation of Cu2+ Selective Electrode by Silica Matrix Molecular Imprinting Technology |
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| LIU Ya-qiang,LIU Yan,HUANG Xi-chao.Preparation of Cu2+ Selective Electrode by Silica Matrix Molecular Imprinting Technology[J].Chemical Research,2008,19(3):70-73. |
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| Authors: | LIU Ya-qiang LIU Yan HUANG Xi-chao |
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| Institution: | (Institute of Chemical Sensors, Weinan Teachers＇ College, Weinan 714000, Shaanxi, China) |
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| Abstract: | By using 3-(2-aminoethylamino)propyltrimethoxysilane as functional molecule,and copper ion as template,copper ion selective electrode is prepared.The process includes the combination of two technologies of sol-gel and molecular imprinting.The mechanism of responding of the electrode is also discussed.Its linear responding scope is 5.00×10-2～3.98×10-6 mol · L-1,with the slope of 31.5 mV/pC to copper ion,and the detect limiting is 1.00×10-6 mol · L-1.Besides,the electrode shows better selectivity,reproducibility and stability. |
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| Keywords: | molecular imprinting sol-gel copper ion ion-selective electrode |
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