| 溅射参数对ZnO薄膜物性的影响 |
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| 引用本文： | 张丽明,王莹.溅射参数对ZnO薄膜物性的影响[J].化学研究,2007,18(4):83-85. |
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| 作者姓名： | 张丽明 王莹 |
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| 作者单位： | 商丘职业技术学院,河南,商丘,476000 |
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| 摘 要： | 采用磁控溅射方法分别在ITO玻璃和硅片上成功制备了具有良好C轴取向的ZnO薄膜.并研究了溅射气压,基底温度,以及氧偏压对ZnO薄膜物性的影响,从而确定了制备ZnO薄膜的最佳溅射条件.
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| 关 键 词： | ZnO薄膜 溅射气压 基底温度 磁控溅射 |
| 文章编号： | 1008-1011（2007）04-0083-03 |
| 收稿时间： | 2007-06-22 |
| 修稿时间： | 2007年6月22日 |
Effects of Sputtering Parameters on the Physical Properties of ZnO Thin Films |
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| ZHANG Li-ming,WANG Ying.Effects of Sputtering Parameters on the Physical Properties of ZnO Thin Films[J].Chemical Research,2007,18(4):83-85. |
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| Authors: | ZHANG Li-ming WANG Ying |
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| Abstract: | ZnO thin film on ITO glass and Si substrate with good C axis orientation was prepared by magnetron sputtering. The effects of sputtering parameters on the physicals properties of ZnO thin film were investigated, and thus the optimal sputtering parameters were obtained. |
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| Keywords: | ZnO thin film sputtering pressure substrate temperature magnetron sputtering |
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