| O(3P)原子和硅烷化学反应动力学研究 |
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| 引用本文： | 陈从香,高义德,朱梦霞,孔繁敖,S. Koda.O(3P)原子和硅烷化学反应动力学研究[J].物理化学学报,1990,6(6):660-665. |
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| 作者姓名： | 陈从香 高义德 朱梦霞 孔繁敖 S. Koda |
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| 作者单位： | Department of Modern Chemistry; University of Science and Technology Department of Reaction Chemistry; Faculty of Engineering; The University of Tokyo; Tokyo; Japan |
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| 摘 要： | 本文报道了用流动放电-化学发光技术测定O(~3P)和硅烷化学反应速率常数.在293—413K范围内, 结果为k=(1.05±0.36)×10~(-10)exp(-3.06±0.10) kcal·mol~(-1) /RT] cm~3·molecule~(-1)·s~(-1)并用过渡态理论将上述实验结果外推到200—2000 K范围内. 计算结果以三参数公式表示为: k=7.67×10~(-19) T~(2.59) exp(-720 cal·mol~(-1)/RT) cm~3·molecule~(-1)·s~(-1).
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| 关 键 词： | O（^3P）原子 硅烷 反应动力学 |
| 收稿时间： | 1989-05-09 |
| 修稿时间： | 1989-11-30 |
THE KINETIC STUDY OF REACTION O(3P) AND SILANE |
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| Chen Cong-Xiang,Gao Yi-De,Zhu Meng-Xia,Kong Fan-Ao,Koda S..THE KINETIC STUDY OF REACTION O(3P) AND SILANE[J].Acta Physico-Chimica Sinica,1990,6(6):660-665. |
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| Authors: | Chen Cong-Xiang Gao Yi-De Zhu Meng-Xia Kong Fan-Ao Koda S |
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| Institution: | Department of Modern Chemistry; University of Science and Technology Department of Reaction Chemistry; Faculty of Engineering; The University of Tokyo; Tokyo; Japan |
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| Abstract: | The measurement of rate constant of reaction O~3(P) + SiH_4 with discharge flow-chemiluminescence technique is presented. The Arrhenius form of the rate constant over temperature range 293--413 K is k=(1.05±0.36)×10~(-10)exp(-3.06±0.10)kcal·mol~(-1)/RT]cm~3·molecule~(-1)·s~(-1)Using transition-state theory, the result was extrapolated to temperature range of 200--2000 K. The calculated dependence of the rate constant on temperature with three parameters isk=7.67×10~(-19)T~(2.59)exp (-720 cal·mol~(-1)/RT)cm~3·molecule~(-1)·s~(-1). |
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