| Pd在p型单晶硅(100)表面自催化化学沉积 |
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| 引用本文： | 陈扬,景粉宁,叶为春,王春明.Pd在p型单晶硅(100)表面自催化化学沉积[J].物理化学学报,2007,23(11):1743-1746. |
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| 作者姓名： | 陈扬 景粉宁 叶为春 王春明 |
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| 作者单位： | College of Chemistry and Chemical Engineering, Lanzhou University, Lanzhou 730000, P. R. China |
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| 基金项目： | 高等学校博士学科点专项科研项目 |
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| 摘 要： | 研究了Pd在氢终止的p型单晶硅(100)表面的自催化化学沉积(AED). 在室温下将刻蚀过的硅片浸入常规的HF-PdCl2-HCl溶液制备了Pd膜. 将沉积了Pd的基底作为工作电极, 用循环伏安法(CV)、原子力显微镜(AFM)和X射线光电子能谱(XPS)研究了Pd膜的阳极溶出行为和形貌. 结果表明, Pd的生长遵循Volmer-Weber (VW)生长模式, Pd膜给出了很好的支持.
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| 关 键 词： | 自催化化学沉积 阳极溶出 Pd 原子力显微镜 p型单晶硅(100) |
| 收稿时间： | 2007-04-18 |
| 修稿时间： | 2007-04-18 |
Autocatalytic Electroless Deposition of Palladium onto p-Silicon (100) |
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| CHEN Yang,JING Fen-Ning,YE Wei-Chun,WANG Chun-Ming.Autocatalytic Electroless Deposition of Palladium onto p-Silicon (100)[J].Acta Physico-Chimica Sinica,2007,23(11):1743-1746. |
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| Authors: | CHEN Yang JING Fen-Ning YE Wei-Chun WANG Chun-Ming |
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| Institution: | College of Chemistry and Chemical Engineering, Lanzhou University, Lanzhou 730000, P. R. China |
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| Abstract: | The autocatalytic electroless deposition (AED) of palladium ontop-silicon (100) with hydrogen termination was studied.Pd films were prepared by immersing the hydrogen-terminated silicon wafers into conventional HF-PdCl_2- HCl solution at room temperature.The anodic stripping behaviors and morphologies of the Pd deposits were studied using cyclic voltammetry (CV),atomic force microscopy (AFM),and X-ray photoelectron spectroscopy (XPS).The results showed that the Pd growth was in Volmer-Weber (VW) mode and the Pd film had good adhesion. |
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| Keywords: | Pd Autocatalytic electroless deposition Anodic stripping Palladium Atomic force microscopy p-Silicon (100) |
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