化学蒸气发生-四通道原子荧光光谱法同时测定高纯金中的痕量As,Sb,Bi,Te

采用化学蒸气发生-四通道原子荧光光谱法测定了高纯金中的痕量砷、锑、铋和碲。用乙酸乙脂萃取分离金,水相还原后采用化学蒸气发生-四通道原子荧光光谱法测定高纯金中的痕量砷、锑、铋和碲。在最佳条件下,方法对As,Sb,Bi,Te的检出限分别为0.04,0.05,0.04,0.03 ng/mL(3σ);测定精密度分别为0.98,0.89,0.94,0.99%(对10 ng/mL As,Sb,Bi和Te混合标准,n=7)。方法对实际样品中的As,Sb,Bi,Te进行了同时测定,测定结果与标准方法无明显差异,各元素的加标回收率为95%～105%。

Simultaneous determination of arsenic,antimony,bismuth and tellurium in high-purity gold by chemical vapor generation-four-channel non-dispersive atomic fluorescence spectrometry

A method for the simultaneous determination of arsenic,antimony,bismuth and tellurium in high-purity gold sample using chemical vapor generation-four-channel non-dispersive atomic fluorescence spectrometry has been developed.The conditions of instrumentation and vapor generation of arsenic,antimony,bismuth and tellurium were optimized.Trace amount of arsenic,antimony,bismuth and tellurium were separated from the gold matrix by ethyl acetate extraction.Under optimal conditions,the detection limits for As,Sb,Bi and Te were determined to be 0.04,0.05,0.04 and 0.03 ng/mL(3σ),respectively.The precisions for 7 replicate determinations at the 10 ng/mL of As,Sb,Bi and Te were 0.98,0.89,0.94 and 0.99%(RSD),respectively.The proposed method was successfully applied to the simultaneous determination of As,Sb,Bi and Te in high-purity gold samples and the determination results have no significant difference compared with theose by the standard mothods.Recoveries were in the range from 95% to 105%.