| 光泽精与钨（Ⅲ）的流动注射－胶束增敏化学发光反应 |
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| 引用本文： | 朱智甲,吕九如.光泽精与钨（Ⅲ）的流动注射－胶束增敏化学发光反应[J].分析测试学报,2000,19(2). |
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| 作者姓名： | 朱智甲 吕九如 |
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| 摘 要： | 采用了Jones柱在线还原钨（Ⅵ）为钨（Ⅲ），详细研究了钨（Ⅲ）与光泽精的化学发光反应，加入乳化剂OP能明显提高发光的信噪比，基于此建立了痕量钨的流动注射化学发光分析法。该法线性范围为1×10－6～1×10－2 g·L－1, 检出限为5×10－7 g·L－1 , 相对标准偏差为2.0％（5×10－5 g·L－1, n=11）。文中还探讨了反应机理。
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| 关 键 词： | 流动注射分析 胶束增敏 光泽精 化学发光分析 钨 |
Chemiluminescence Reaction between Lucigenin and Tungsten(Ⅲ) in Flow injection Analysis with Micelle Sensitization |
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| ZHU Zhi jia,LU Jiu ru.Chemiluminescence Reaction between Lucigenin and Tungsten(Ⅲ) in Flow injection Analysis with Micelle Sensitization[J].Journal of Instrumental Analysis,2000,19(2). |
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| Authors: | ZHU Zhi jia LU Jiu ru |
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| Abstract: | A new flow injection chemiluminescence method for the determination of tungsten is described. It is based on the chemiluminescence reaction of tungsten(Ⅲ)lucigenin system with Jones reductor. The chemiluminescence signal _ to _ noise ratio can be apparently improved by the addition of emulsor OP. The present method has a wide linear range of 1×10－6～1×10－2 g·L－1 for W(Ⅲ). The relative standard deviation is 2.0％(5×10－5 g·L－1 , n=11）. The mechanism of this reaction was also discussed in detail. |
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| Keywords: | Flow injection analysis Chemiluminescence analysis Micelle sensitization Lucigenin Tungsten |
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