首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Anionic polymerization of N,N‐dialkyl‐2‐methylenebut‐3‐enamide: Effect of alkyl substituents on polymerization behavior
Authors:Katsuhiko Takenaka  Natsuyo Shibata  Akihiko Oshikiri  Masamitsu Miya  Hiroki Takeshita  Tomoo Shiomi
Institution:Department of Materials Science and Technology, Nagaoka University of Technology, 1603‐1 Kamitomioka, Nagaoka, Niigata 940‐2188, Japan
Abstract:Anionic polymerizations of three 1,3‐butadiene derivatives containing different N,N‐dialkyl amide functions, N,N‐diisopropylamide (DiPA), piperidineamide (PiA), and cis‐2,6‐dimethylpiperidineamide (DMPA) were performed under various conditions, and their polymerization behavior was compared with that of N,N‐diethylamide analogue (DEA), which was previously reported. When polymerization of DiPA was performed at ?78 °C with potassium counter ion, only trace amounts of oligomers were formed, whereas polymers with a narrow molecular weight distribution were obtained in moderate yield when DiPA was polymerized at 0 °C in the presence of LiCl. Decrease in molecular weight and broadening of molecular weight distribution were observed when polymerization was performed at a higher temperature of 20 °C, presumably because of the effect of ceiling temperature. In the case of DMPA, no polymer was formed at 0 °C and polymers with relatively broad molecular weight distributions (Mw/Mn = 1.2) were obtained at 20 °C. The polymerization rate of PiA was much faster than that of the other monomers, and poly(PiA) was obtained in high yield even at ?78 °C in 24 h. The microstructure of the resulting polymers were exclusively 1,4‐ for poly(DMPA), whereas 20–30% of the 1,2‐structure was contained in poly(DiPA) and poly(PiA). © 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 48: 3714–3721, 2010
Keywords:1‐((2R  6S)‐2  6‐dimethylpiperidin‐1‐yl)‐2‐methylenebut‐3‐en‐1‐one  anionic polymerization  N  N‐diisopropyl‐2‐methylenebut‐3‐enamide  2‐methylene‐1‐(piperidin‐1‐yl)but‐3‐en‐1‐one  microstructure
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号