Three‐component,negative‐type,alkaline‐developable,thermally stable,and photosensitive polymer based on poly(2,6‐dihydroxy‐1,5‐naphthalene), a crosslinker,and a photoacid generator

A negative working and chemically amplified photosensitive polymer has been developed, which is based on poly(2,6‐dihydroxy‐1,5‐naphthalene) (PDHN), the crosslinker 4,4′‐methylenebis2,6‐bis(hydroxymethyl)]phenol, and the photoacid generator (5‐propylsulfonyloxyimino‐5H‐thiophen‐2‐ylidene)‐(2‐methylphenyl)acetonitrile. PDHN, with a number‐average molecular weight of 25,000, was prepared by the oxidative coupling polymerization of 2,6‐dihydroxynaphthalene with di‐μ‐hydroxo‐bis(N,N,N′,N′‐tetramethylethylenediamine)copper(II)] chloride in 2‐methoxyethanol at room temperature. The resulting PDHN showed a 5% weight loss temperature of 440 °C in nitrogen and a low dielectric constant of 2.82. The resist showed a sensitivity of 8.3 mJ cm^?2 and a contrast of 11 when it was exposed to 436‐nm light, followed by postexposure baking at 100 °C for 5 min and development with a 2.38 wt % aqueous tetramethylammonium hydroxide solution at 25 °C. A fine negative image featuring 10‐μm line‐and‐space patterns was obtained on a film 3 μm thick exposed to 10 mJ cm^?2 of ultraviolet light at 436 nm in the contact‐printed mode. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 2235–2240, 2004