TOF-SIMS depth profiling and element mapping on oxidized AlCrVN hard coatings |
| |
Authors: | J Schnöller R Franz C Mitterer H Hutter |
| |
Institution: | (1) Department of Chemical Technologies and Analytics, Vienna University of Technology, Getreidemarkt 9, 1060 Vienna, Austria;(2) Christian Doppler Laboratory for Advanced Hard Coatings at the Department of Physical Metallurgy and Materials Testing, University of Leoben, Franz-Josef-Straβe 18, 8700 Leoben, Austria |
| |
Abstract: | V-alloyed AlCrN hard coatings were deposited on silicon wafers (Si (100)) by reactive arc evaporation in a commercial coating
system at 500 °C for 10 min, resulting in a coating thickness of ∼500 nm. The chemical composition of the stoichiometric coatings
is constant at approximately Al0.70Cr0.05V0.25N regardless of the applied bias voltage during deposition. Coatings synthesized at a low bias of −40 V show a dual-phase
structure (hexagonal close-packed and face-centered cubic (fcc)), whereas coatings deposited at a high bias of −150 V have
a metastable single-phase structure (face-centered cubic). All samples were oxidized for 15 min under 20 mbar O2 atmosphere and at four different temperatures (550, 600, 650, and 700 °C). The oxidized coatings were subject to depth profiling
and element mapping by a time of flight secondary ion mass spectrometry instrument, equipped with a Bi-cluster analysis gun
and Cs+-sputter gun. The evaluation of the in-depth distribution of several elements and species points out distinctive differences
in the oxidation behavior of the two different coatings, whereas element mapping shows the formation of islands made of oxidized
vanadium and aluminum species as the top-most layer of the single-phase (fcc) coating at temperatures above 650 °C. |
| |
Keywords: | TOF-SIMS Depth profiling Element mapping AlCrVN Hard coatings Vanadium oxides |
本文献已被 SpringerLink 等数据库收录! |
|