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Underpotential deposition studies of copper on glassy carbon
Authors:S Jaya  T Prasada Rao and G Prabhakara Rao
Institution:(1) Central Electrochemical Research Institute, 623 006 Karaikudi, India
Abstract:Studies on the deposition and dissolution of copper from 0·5 M sulphuric acid solutions onto glassy carbon (GC) using potential sweep techniques indicated that an additional peak occurs at higher positive potentials than the bulk stripping peak. This peak is identified as due to the stripping of underpotential deposited (UPD) copper. Results of investigations on the effect of sweep rate, deposition potential and time of deposition on the peak characteristics of UPD and bulk deposited copper are also reported.
Keywords:Underpotential deposition of copper  glassy carbon  potential sweep technique  bulk stripping peak  deposition potential
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