Underpotential deposition studies of copper on glassy carbon |
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Authors: | S Jaya T Prasada Rao and G Prabhakara Rao |
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Institution: | (1) Central Electrochemical Research Institute, 623 006 Karaikudi, India |
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Abstract: | Studies on the deposition and dissolution of copper from 0·5 M sulphuric acid solutions onto glassy carbon (GC) using potential
sweep techniques indicated that an additional peak occurs at higher positive potentials than the bulk stripping peak. This
peak is identified as due to the stripping of underpotential deposited (UPD) copper. Results of investigations on the effect
of sweep rate, deposition potential and time of deposition on the peak characteristics of UPD and bulk deposited copper are
also reported. |
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Keywords: | Underpotential deposition of copper glassy carbon potential sweep technique bulk stripping peak deposition potential |
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