首页 | 本学科首页   官方微博 | 高级检索  
     检索      

添加剂对双子表面活性剂DYNOL-604浊点的影响
引用本文:陈文君,顾强,姚发业,李干佐.添加剂对双子表面活性剂DYNOL-604浊点的影响[J].化学学报,2002,60(5):810-814.
作者姓名:陈文君  顾强  姚发业  李干佐
作者单位:山东大学,济南(250100)
基金项目:国家自然科学基金 (No .2 990 30 0 6 ),山东大学青年科学基金 (Y340 2 9)资助项目
摘    要:对双子表面活性剂DYNOL-604的浊点开展研究,考察了添加剂对其浊点的影响 。离子表面活性剂的加入,使其浊点升高,而加入醇时出现了一种双浊点的现象, 我们称之为“下限浊点”和“上限浊点”。即温度低于“下限浊点”和高于“上限 浊点”,体系由浑浊变为澄清。采用NMR手段测定“上限浊点”以上温度体系的自 扩散系数,证明为双连续微乳液结构,并从R比值理论进行分析。

关 键 词:表面活性剂  扩散系数  微乳  核磁共振谱法  
修稿时间:2001年9月12日

Effect of Alcohol and Ion-Surfactant on the Cloud Point Dynol-604
CHEN,Wen-Jun GU,Qiang YAO,Fa-Ye LI,Gan-Zuo.Effect of Alcohol and Ion-Surfactant on the Cloud Point Dynol-604[J].Acta Chimica Sinica,2002,60(5):810-814.
Authors:CHEN  Wen-Jun GU  Qiang YAO  Fa-Ye LI  Gan-Zuo
Institution:Key Lab for Colloid and interface Chemistry of State Education Ministry, Shandong University,Jinan(250100);Key Lab for Colloid and interface Chemistry of State Education Ministry, Shandong University, Jinan(250100anzuo)
Abstract:The effect of a series of alcohols and ionic surfactants on the cloud point (CP) of nonionic surfactant Dynol-604 has been investigated. The result shows that the addition of SDS and CTAB makes the cloud point of Dynol-604 increases greatly and the influence of alcohols on the cloud point of Dynol-604 is complex. When the alcohol is added into the Dynol-604 solution, the system appears double cloud points which are named "upper limit CP" and "lower limit CP" respectively. The phenomenon is discussed using the theory of Cohesion Energy Ratio. The system becomes transparent from turbidity when the temperature is above the upper limit CP. The measurement of the self-diffusion coefficients by the Pulse Field Gradient Spin-Echo Method (PFGSE-NMR) for the upper limit CP solution is carried out and we can conclude that the system is a bicontinuous microemulsion.
Keywords:Dynol-604  double cloud point  upper limit CP  lower limit CP  self-diffusion coefficient
本文献已被 CNKI 维普 万方数据 等数据库收录!
点击此处可从《化学学报》浏览原始摘要信息
点击此处可从《化学学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号