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Quantitative surface analysis by Auger and x-ray photoelectron spectroscopy
Authors:IS Tilinin  A Jablonski  WSM Werner
Institution:

* Institute of Physical Chemistry, Polish Academy of Sciences, ul. Kasprzaka 44/52, 01-224, Warsaw, Poland

** Institute for Applied and Technical Physics, Vienna University of Technology, Wiedner Hauptstrasse, 8-10, Vienna A-1040, Austria

Abstract:Recent developments in quantitative surface analysis by Auger (AES) and x-ray photoelectron (XPS) spectroscopies are reviewed and problems relating to a more accurate quantitative interpretation of AES/XPS experimental data are discussed. Special attention is paid to consideration of elementary physical processes involved and influence of multiple scattering effects on signal line intensities. In particular, the major features of core-shell ionization by electron impact, Auger transitions and photoionization are considered qualitatively and rigorous approaches used to calculate the respective transition probabilities are analysed. It is shown that, in amorphous and polycrystalline targets, incoherent scattering of primary and signal Auger and photoelectrons can be described by solving analytically a kinetic equation with appropriate boundary conditions. The analytical results for the angular and energy distribution, the mean escape depth, and the escape probability as a function of depth of origin of signal electrons as well as that for the backscattering factor in AES are in good agreement with the corresponding Mote Carlo simulation data. Methods for inelastic background subtraction, surface composition determination and depth-profile reconstructions by angle-resolved AES/XPS are discussed. Examples of novel techniques based on x-ray induced photoemission are considered.
Keywords:Abbreviations: AED  Auger electron diffraction  AES  Auger electron spectroscopy  AL  attenuation length  APECS  Auger photoelectron coincidence spectroscopy  ARAES  angle-resolved Auger electron spectroscopy  ARXPS  angle-resolved x-ray photoelectron spectroscopy  CMA  cylindrical mirror analyser  CWBA  Coulomb-wave Born approximation  DDF  depth distribution function  DWBA  distorted-wave Born approximation  EPMA  electron probe microanalysis  FWHM  full width at half maximum  IMFP  inelastic mean free path  LEED  low-energy electron diffraction  MAXIMUM  multiple-application x-ray imaging undulator microscope  MC  Monte Carlo  PWBA  plane-wave Born approximation  QUEST  quantitation of electron spectroscopy techniques  REELS  reflection electron energy-loss spectroscopy  SEXAFS  surface extended x-ray absorption fine structure  SIMS  secondary-ion mass spectroscopy  SLA  straight-line approximation  SPEM  scanning photoelectron microscope  TA  transport approximation  XPS  x-ray photoelectron spectroscopy  XSW  x-ray standing wave
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